Patterned film, variable-transmittance device comprising same, and method for producing variable-transmittance device
US-11874564-B2 · Jan 16, 2024 · US
US2023059263A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2023059263-A1 |
| Application number | US-202117792470-A |
| Country | US |
| Kind code | A1 |
| Filing date | Feb 4, 2021 |
| Priority date | Feb 18, 2020 |
| Publication date | Feb 23, 2023 |
| Grant date | — |
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A pattern film, a method for manufacturing a pattern film, and a transmittance variable device comprising the same are disclosed herein. In some embodiments, a pattern film includes a base layer, and a spacer pattern formed on the base layer, the spacer pattern comprises a partition wall spacer comprises a plurality of spacer dots and a spacer line connecting the spacer dots, and a ball spacer, the ball spacer is one of embedded in, partially embedded in, or in contact with the partition wall spacer, when any 3 or more spacer dots are selected, the spacer line forms a closed figure having the selected spacer dots at the vertices thereof, the selected spacer dots are not present inside the closed figure, a length of at least one side of the closed figure is different from lengths of the remaining sides, and each spacer dot has irregularity of 50% or greater.
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1 . A pattern film, comprising: a base layer; and a spacer pattern formed on the base layer, wherein the spacer pattern comprises a partition wall spacer and a ball spacer, wherein the partition wall spacer comprises a plurality of spacer dots and a spacer line connecting the spacer dots, wherein the ball spacer is one of embedded in, partially embedded in, or in contact with the partition wall spacer, wherein, when any 3 or more spacer dots are selected among the plurality of spacer dots, the spacer line forms a closed figure having the selected spacer dots at the vertices thereof, wherein the selected spacer dots are not present inside the closed figure, wherein a length of at least one side of the closed figure is different from the lengths of the remaining sides, and wherein each spacer dot in the plurality has irregularity of 50% or greater. 2 . The pattern film of claim 1 , wherein a line width (T) of the partition wall of the partition wall spacer and an average particle diameter (D) of the ball spacer satisfy the following Equation 1: 1.0≤ T/D≤ 20. [Equation 1] 3 . The pattern film of claim 1 , wherein the base layer is an inorganic base layer or an organic base layer. 4 . The pattern film of claim 1 , wherein the spacer pattern has optical density of 0.4 or greater and 4 or less. 5 . The pattern film of claim 1 , wherein the spacer pattern has a line width of 10 μm or greater and 200 μm or less. 6 . The pattern film of claim 1 , wherein a total area (A) of the base layer and an area (B) of the surface of the base layer in contact with the spacer pattern satisfy the following Equation 2: 5≤[ B/A ]×100(%)≤30. [Equation 2] 7 . The pattern film of claim 1 , wherein an average value of a height of the partition wall spacer is 2 μm or greater and 100 μm or less, and a standard deviation of the height of the partition wall spacer is 0.05 μm or greater and 0.5 μm or less. 8 . The pattern film of claim 1 , wherein a standard deviation of a particle diameter of the ball spacer is 0.8 μm or less. 9 . The pattern film of claim 1 , wherein less than 85% of the sides of the closed figure have the same length. 10 . The pattern film of claim 1 , wherein a rectangular 200×200 pixel area is set based on an area of the pattern film through which light passes from an LED light source, and wherein, using a lower left end corner of the rectangular 200×200 pixel area as x axis, y axis (0,0), the rectangular 200×200 pixel area of (0,0) to (200,200) satisfies the following Equation 3: 2≤ D 1− D 2(%)≤10 [Equation 3] in Equation 3, D1 is a diffraction ratio when the spacer dot of the pattern film has irregularity of 0%; D2 is a diffraction ratio when the spacer dot of the pattern film has irregularity of 70%; and each diffraction ratio satisfies the following Equation 4: [1− Sc/S ]×100(%) [Equation 4] in Equation 4, S is a total amount of light in the rectangular 200×200 pixel area of (0,0) to (200,200); and Sc is an amount of pixel light in an area having pixels employing (100,100) as an origin and having a radius of 50 in the rectangular 200×200 pixel area of (0,0) to (200,200). 11 . A method for manufacturing pattern film, the method comprising: forming an ultraviolet curable resin layer comprising a ball spacer on one surface of a base layer; laminating a film mask on the ultraviolet curable resin layer; irradiating the ultraviolet curable resin layer with ultraviolet light through the film mask; peeling the film mask from the ultraviolet curable resin layer after the irradiation; and peeling an uncured area of the ultraviolet curable resin layer after the irradiation. 12 . A transmittance variable device, comprising: the pattern film of claim 1 ; and a substrate disposed opposite to the pattern film, wherein the base layer of the pattern film and the substrate are separated by a space, and wherein the space is maintained by the spacer pattern of the pattern film. 13 . The transmittance variable device of claim 12 , comprising an adhesive layer disposed between the pattern film and the substrate, wherein the adhesive layer has a vertical alignment force.
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