Sample observation device, sample observation method, and computer system

Patent metadata

Field	Value
Publication number	US-2023013887-A1
Application number	US-202217864773-A
Country	US
Kind code	A1
Filing date	Jul 14, 2022
Priority date	Jul 14, 2021
Publication date	Jan 19, 2023
Grant date	—

Abstract

In a learning phase, a processor of a sample observation device: stores design data on a sample in a storage resource; creates a first learning image as a plurality of input images; creates a second learning image as a target image; and learns a model related to image quality conversion with the first and second learning images. In a sample observation phase, the processor obtains, as an observation image, a second captured image output by inputting a first captured image obtained by imaging the sample with an imaging device to the model. The processor creates at least one of the first and second learning images based on the design data.

First claim

What is claimed is:

1 . A sample observation device comprising an imaging device and a processor,
wherein the processor: stores design data on a sample in a storage resource; creates a first learning image as a plurality of input images; creates a second learning image as a target image; learns a model related to image quality conversion with the first and second learning images; acquires, as an observation image, a second captured image output by inputting a first captured image obtained by imaging the sample with the imaging device to the model in observing the sample; and creates at least one of the first and second learning images based on the design data.

2 . The sample observation device according to claim 1 ,
wherein the processor: creates the first learning image based on the design data; and creates the second learning image based on the design data.

3 . The sample observation device according to claim 1 ,
wherein the processor: creates the first learning image based on a captured image obtained by imaging the sample with the imaging device; and creates the second learning image based on the design data.

4 . The sample observation device according to claim 1 ,
wherein the processor: creates the first learning image based on the design data; and creates the second learning image based on a captured image obtained by imaging the sample with the imaging device.

5 . The sample observation device according to claim 1 , wherein
the first learning image includes a plurality of images of a plurality of image qualities, and the plurality of images of the plurality of image qualities are created by a change in at least one element among circuit pattern shading, shape deformation, image resolution, and image noise of the sample.

6 . The sample observation device according to claim 1 , wherein
the second learning image is created using a parameter value designated by a user, and a parameter designatable by the user is a parameter corresponding to at least one element among circuit pattern shading, shape deformation, image resolution, and image noise of the sample.

7 . The sample observation device according to claim 3 ,
wherein the processor collates the captured image with the design data and trims an image of a region of a corresponding position in the captured image from a region of the design data.

8 . The sample observation device according to claim 1 ,
wherein the processor: creates a plurality of images for each same region of the sample as the first learning image; creates a plurality of images for each of the same regions of the sample as the second learning image; at a time of the learning, learns the model with the plurality of images of the first learning image and the plurality of images of the second learning image for each of the same regions of the sample; and in observing the sample, acquires, as the observation image, a plurality of captured images as the second captured image output by inputting, to the model, a plurality of captured images captured for each of the same regions of the sample as the first captured image obtained by imaging the sample with the imaging device.

9 . The sample observation device according to claim 8 ,
wherein the plurality of captured images in the first captured image are a plurality of types of images acquired by a plurality of detectors of the imaging device, in which the amount of scattered electrons different in scattering direction or energy is detected.

10 . The sample observation device according to claim 1 ,
wherein, in creating the second learning image based on the design data, the processor creates an edge image in which a pattern contour line of the sample is drawn from a region of the design data.

11 . The sample observation device according to claim 10 ,
wherein the processor: in creating the edge image, creates a plurality of edge images in which direction-specific pattern contour lines in a plurality of directions are drawn from a region of the design data; and at a time of the learning, learns the model with the first learning image and a plurality of images corresponding to the plurality of edge images as the second learning image.

12 . The sample observation device according to claim 1 ,
wherein the processor measures a circuit pattern dimension of the sample using the observation image in observing the sample.

13 . The sample observation device according to claim 1 ,
wherein the processor specifies an imaging position of the first captured image by performing alignment between the observation image and the design data using the observation image in observing the sample.

14 . The sample observation device according to claim 1 ,
wherein the processor specifies a position of a defect of the sample using the observation image by the second captured image output by inputting the first captured image obtained by imaging defect coordinates indicated by defect position information to the model in observing the sample.

15 . The sample observation device according to claim 1 ,
wherein the processor: at a time of the learning, uses at least one of the first and second learning images as a tilt image obtained by observing a surface of the sample from diagonally above based on the design data; and in observing the sample, acquires, as the observation image, a tilt image as the second captured image output by inputting a tilt image obtained by imaging the surface of the sample from diagonally above with the imaging device to the model as the first captured image.

16 . The sample observation device according to claim 1 ,
wherein the processor causes the first or second learning image created based on the design data to be displayed on a screen.

17 . A sample observation method in a sample observation device including an imaging device and a processor, the method comprising as steps executed by the processor:
a step of storing design data on a sample in a storage resource; a step of creating a first learning image as a plurality of input images; a step of creating a second learning image as a target image; a step of learning a model related to image quality conversion with the first and second learning images; a step of acquiring, as an observation image, a second captured image output by inputting a first captured image obtained by imaging the sample with the imaging device to the model in observing the sample; and a step of creating at least one of the first and second learning images based on the design data.

18 . A computer system in a sample observation device including an imaging device,
wherein the computer system: stores design data on a sample in a storage resource; creates a first learning image as a plurality of input images; creates a second learning image as a target image; learns a model related to image quality conversion with the first and second learning images; acquires, as an observation image, a second captured image output by inputting a first captured image obtained by imaging the sample with the imaging device to the model in observing the sample; and creates at least one of the first and second learning images based on the design data.

19 . The sample observation device according to claim 4 ,
wherein the processor collates the captured image with the design data and trims an image of a region of a corresponding position in the captured image from a region of the design data.

Assignees

• Hitachi High Tech Corp

Inventors

• Ito Akira
• Miyamoto Atsushi
• Kondo Naoaki
• Nakayama Hideki

Classifications

• G06T7/0006

  using a design-rule based approach · CPC title

• G06T2207/20081

  Training; Learning · CPC title

• G06T2207/10061

  from scanning electron microscope · CPC title

• G06T2207/30148

  Semiconductor; IC; Wafer · CPC title

• G06V10/7788 Primary

  the supervisor being a human, e.g. interactive learning with a human teacher · CPC title