Data processing method, device and system, and electronic device

Patent metadata

Field	Value
Publication number	US-2023004138-A1
Application number	US-202017781127-A
Country	US
Kind code	A1
Filing date	Oct 30, 2020
Priority date	Oct 30, 2020
Publication date	Jan 5, 2023
Grant date	—

Abstract

A data processing method includes: obtaining a defect type of a sample set in response to a first input of a user on a first interface, the sample set including samples, each sample having a first parameter used to represent a defect degree of the sample with regard to the defect type and a second parameter used to represent device informations of sample production devices through which the sample passes; calculating yield purity indexes of sample production devices on the samples based on first parameters and second parameters of the samples, so as to obtain influencing parameters of the sample production devices, an influencing parameter of each sample production device being used to represent an influence degree to which the sample production device affects an occurrence of the defect type on the samples; and displaying the influencing parameters of the sample production devices on a second interface.

First claim

1 . A data processing method, comprising:
obtaining a defect type of a sample set in response to a first input of a user on a first interface, the sample set including a plurality of samples, each sample having a first parameter and a second parameter, the first parameter being used to represent a defect degree of the sample with regard to the defect type, and the second parameter being used to represent device informations of sample production devices through which the sample passes; calculating yield purity indexes of a plurality of sample production devices on the plurality of samples based on first parameters and second parameters of the plurality of samples, so as to obtain influencing parameters of the plurality of sample production devices, an influencing parameter of each sample production device being used to represent an influence degree to which the sample production device affects an occurrence of the defect type on the plurality of samples; and displaying the influencing parameters of the plurality of sample production devices on a second interface.

2 - 4 . (canceled)

5 . The data processing method according to claim 1 , further comprising:
obtaining yield statistical data of the plurality of samples, or yield statistical data of the plurality of samples that pass through the sample production devices, or yield statistical data of the plurality of samples and yield statistical data of the plurality of samples that pass through the sample production devices according to the first parameters and the second parameters of the plurality of samples; and obtaining influencing parameters of the sample production devices according to the yield statistical data of the plurality of samples, or the yield statistical data of the plurality of samples that pass through the sample production devices, or the yield statistical data of the plurality of samples and the yield statistical data of the plurality of samples that pass through the sample production devices.

6 . The data processing method according to claim 5 , wherein obtaining the influencing parameters of the sample production devices according to the yield statistical data of the plurality of samples and the yield statistical data of the plurality of samples that pass through the sample production devices, includes:
for each sample production device, calculating a Gini coefficient of the sample production device, the Gini coefficient of the sample production device satisfying a formula:

G
=

S
1

T
1

×

[

1
-

(

S
2

S
1

)

2

-

(

S
3

S
1

)

2

]

+

T
1

-

S
1

T
1

×

[

1
-

(

T
2

-

S
2

T
1

-

S
1

)

2

-

(

T
3

-

S
3

T
1

-

S
1

)

2

]

,

wherein G represents the Gini coefficient of the sample production device, S 1 represents a total number of samples, which pass through the sample production device, in the plurality of samples, T 1 represents a total number of the plurality of samples, S 2 represents a total number of defective samples, which pass through the sample production device, in the plurality of samples, T 2 represents a total number of defective samples in the plurality of samples, S 3 represents a total number of non-defective samples, which pass through the sample production device, in the plurality of samples, and T 3 represents a total number of non-defective samples in the plurality of samples, wherein
the larger the Gini coefficient of the sample production

Assignees

• Beijing Zhongxiangying Tech Co Ltd
• Boe Technology Group Co Ltd

Inventors

• Wang Yu
• Wang Haijin
• Wu Jianmin
• Wang Hong

Classifications

• G05B2219/32204

  Performance assurance; assure certain level of non-defective products · CPC title

• G05B19/406 Primary

  characterised by monitoring or safety (G05B19/19 takes precedence) · CPC title

• Y02P90/30

  Computing systems specially adapted for manufacturing · CPC title

• G05B2219/32187

  Correlation between controlling parameters for influence on quality parameters · CPC title

• G05B19/41875 Primary

  characterised by quality surveillance of production · CPC title