Gas purge systems for a laser source

Patent metadata

Field	Value
Publication number	US-2022413402-A1
Application number	US-202017784948-A
Country	US
Kind code	A1
Filing date	Dec 8, 2020
Priority date	Dec 20, 2019
Publication date	Dec 29, 2022
Grant date	—

Abstract

A laser source includes a laser chamber configured to generate a first laser beam. The laser source further includes an optical system coupled to the laser chamber and configured to receive the first laser beam and output an output laser beam. The laser source also includes a gas purge system. According to some aspects, the gas purge system is configured to supply a nitrogen gas into the optical system at a pressure less than atmospheric pressure. According to some aspects, the gas purge system is configured to supply a helium gas into the optical system.

First claim

1 - 6 . (canceled)

7 . A laser source, comprising:
a laser chamber configured to generate a first laser beam; and an optical system coupled to the laser chamber and configured to receive the first laser beam and output an output laser beam, wherein the optical system comprises a gas at a pressure less than atmospheric pressure.

8 . The laser source of claim 7 , further comprising:
a gas purge system configured to supply the gas into the optical system at the pressure less than atmospheric pressure.

9 . The laser source of claim 8 , wherein the gas purge system comprises:
a gas supply pump configured to supply the gas into the optical system at the pressure less than atmospheric pressure; and a second pump configured to substantially remove a second gas from the optical system.

10 . The laser source of claim 9 , wherein the gas comprises nitrogen and the second gas comprises oxygen.

11 . The laser source of claim 7 , wherein the gas comprises nitrogen and the pressure is between about 50 Torr and about 700 Torr.

12 . The laser source of claim 7 , further comprising:
a second laser chamber configured to at least indirectly receive the first laser beam and amplify the first laser beam to generate a second laser beam, wherein the optical system is configured to receive the second laser beam and output the output laser beam.

13 . The laser source of claim 7 , further comprising:
an optical module coupled to the laser chamber, wherein the optical module comprises a second gas at a pressure about atmospheric pressure.

14 . A laser source, comprising:
a first laser chamber configured to generate a first laser beam; a second laser chamber configured to at least indirectly receive the first laser beam and amplify the first laser beam to generate a second laser beam; a first optical system configured to direct the first laser beam toward the second laser chamber; a second optical system configured to receive the second laser beam and direct the second laser beam as an output laser beam of the laser source; and a gas purge system configured to pump a gas into the first and second optical systems at a pressure less than atmospheric pressure.

15 . The laser source of claim 14 , wherein the gas purge system comprises:
a gas supply pump configured to supply the gas into the first and second optical systems at the pressure less than atmospheric pressure; and a second pump configured to substantially remove a second gas from the first and second optical systems.

16 . The laser source of claim 14 , wherein the gas comprises nitrogen and the pressure is between about 50 Torr and about 700 Torr.

17 . The laser source of claim 14 , further comprising:
an optical module coupled to the first laser chamber, wherein the optical module comprises a second gas at a pressure about atmospheric pressure.

18 . The laser source of claim 14 , further comprising:
an optical module coupled to the second laser chamber, wherein the gas purge system is configured to pump the gas into the optical module at the pressure less than atmospheric pressure.

19 . A lithographic apparatus, comprising:
an illumination system configured to condition a radiation beam from a laser source; and a projection system configured to project a pattern imparted to the radiation beam onto a substrate, wherein the illumination system comprises the laser source, the laser source comprising:
a laser chamber configured to generate a first laser beam; and
an optical system coupled to the laser chamber and configured to receive the first laser beam and output the radiation beam,
wherein the optical system comprises nitrogen gas at a pressure less than atmospheric pressure.

20 - 37 . (canceled)

38 . The laser source of claim 7 , wherein:
the optical system comprises a first optical module and a second optical module; and the gas purge system comprises:
a first gas supply pump coupled to the first optical module to supply the gas into the first optical module at the pressure less than atmospheric pressure; and
a second gas supply pump coupled to the second optical module to supply the gas into the second optical module at the pressure less than atmospheric pressure.

39 . The laser source of claim 8 , wherein the gas purge system comprises a gas supply pump configured to supply the gas into the optical system at the pressure less than atmospheric pressure.

40 . The laser source of claim 39 , wherein the gas comprises nitrogen.

41 . The laser source of claim 8 , wherein the gas purge system further comprises a second pump configured to substantially remove a second gas from the optical system.

42 . The laser source of claim 41 , wherein the second gas comprises oxygen.

43 . A lithographic apparatus, comprising:
the laser source of claim 7 ; an illumination system configured to condition a laser beam received from the laser source to produce a radiation beam; and a projection system configured to project a pattern imparted to the radiation beam onto a substrate.

44 . A lithographic apparatus, comprising:
the laser source of claim 14 ; an illumination system configured to condition a laser beam received from the laser source to produce a radiation beam; and a projection system configured to project a pattern imparted to the radiation beam onto a substrate.

Assignees

• Cymer LLC

Inventors

• Padmabandu Gamaralalage G

Classifications

• H01S3/036

  Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube {(H01S3/031 takes precedence)} · CPC title

• G03F7/70025

  by lasers · CPC title

• G03F7/70933 Primary

  Purge, e.g. exchanging fluid or gas to remove pollutants · CPC title

• H01S3/03

  of gas laser discharge tubes · CPC title

• H01S3/0071 Primary

  Beam steering, e.g. whereby a mirror outside the cavity is present to change the beam direction · CPC title