Optical filter and method for manufacturing same

US2022381962A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2022381962-A1
Application numberUS-202017775412-A
CountryUS
Kind codeA1
Filing dateDec 3, 2020
Priority dateDec 11, 2019
Publication dateDec 1, 2022
Grant date

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

Provided is an optical filter capable of reducing the dependency on the angle of light incidence. An optical filter 1 includes a hydrogenated silicon-containing film 4, wherein in a Raman spectrum of the hydrogenated silicon-containing film 4 measured by Raman spectroscopy a ratio (SiH/SiH2) obtained from a ratio between an area of a peak derived from SiH and an area of a peak derived from SiH2 is 0.7 or more.

First claim

Opening claim text (preview).

1 . An optical filter comprising a hydrogenated silicon-containing film, wherein in a Raman spectrum of the hydrogenated silicon-containing film measured by Raman spectroscopy a ratio (SiH/SiH 2 ) obtained from a ratio between an area of a peak derived from SiH and an area of a peak derived from SiH 2 is 0.7 or more. 2 . An optical filter comprising a hydrogenated silicon-containing film, wherein a ratio (H/Si) between a content of hydrogen atoms in the hydrogenated silicon-containing film measured by hydrogen forward scattering spectroscopy and a content of silicon atoms in the hydrogenated silicon-containing film measured by Rutherford backscattering spectroscopy is 0.4 or less. 3 . The optical filter according to claim 1 , comprising: a transparent substrate; and a filter portion provided on one of both principal surfaces of the transparent substrate and made of a multi-layer including a high-refractive index film with a relatively high refractive index and a low-refractive index film with a relatively low refractive index, wherein the high-refractive index film is the hydrogenated silicon-containing film. 4 . The optical filter according to claim 3 , wherein the low-refractive index film is a silicon oxide-containing film. 5 . The optical filter according to claim 3 , further comprising an antireflection film provided on the other principal surface of the transparent substrate and containing hydrogenated silicon. 6 . A method for manufacturing the optical filter according to claim 1 , the method comprising the steps of: depositing a silicon film by sputtering; and hydrogenating the silicon film after the step of depositing the silicon film.

Assignees

Inventors

Classifications

  • comprising an alternation of high and low refractive indexes · CPC title

  • comprising silicon, hydrogenated silicon or a silicide · CPC title

  • Underside coating of a glass sheet · CPC title

  • C23C14/10Primary

    Glass or silica · CPC title

  • Reactive treatment · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US2022381962A1 cover?
Provided is an optical filter capable of reducing the dependency on the angle of light incidence. An optical filter 1 includes a hydrogenated silicon-containing film 4, wherein in a Raman spectrum of the hydrogenated silicon-containing film 4 measured by Raman spectroscopy a ratio (SiH/SiH2) obtained from a ratio between an area of a peak derived from SiH and an area of a peak derived from SiH2…
Who is the assignee on this patent?
Nippon Electric Glass Co
What technology area does this patent fall under?
Primary CPC classification C23C14/10. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Thu Dec 01 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).