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Transparent and antistatic pmma composition
US2022298350A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2022298350-A1 |
| Application number | US-202117453542-A |
| Country | US |
| Kind code | A1 |
| Filing date | Nov 4, 2021 |
| Priority date | Apr 10, 2013 |
| Publication date | Sep 22, 2022 |
| Grant date | — |
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- Title
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- Abstract
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Abstract
Official abstract text for this publication.
A transparent antistatic composition based on polymethyl methacrylate (PMMA), including: 55% to 99.9% by weight of PMMA, and 0.1% to 45% by weight of at least one polyamide (PA) block-containing and polyether (PE) block-containing copolymer (PEBA) comprising polyethylene glycol (PEG), with respect to the total composition weight, the copolymer includes in the range 50% to 80% by weight of PEG with respect to the total weight of copolymer.
First claim
Opening claim text (preview).
1 . A transparent antistatic composition based on polymethyl methacrylate (PMMA), comprising: 55% to 99.9% by weight of PMMA, and 0.1% to 45% by weight of at least one polyamide (PA) block-containing and polyether (PE) block-containing copolymer (PEBA) comprising polyethylene glycol (PEG), with respect to the total composition weight, said copolymer being characterized in that it comprises in the range between 50% to 80% by weight of PEG with respect to the total weight of copolymer. 2 - 19 . (canceled)
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Classifications
Compositions of polyamides obtained by reactions forming a carboxylic amide link in the main chain (of polyhydrazides C08L79/06; of polyamideimides or polyamide acids C08L79/08); Compositions of derivatives of such polymers · CPC title
Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers · CPC title
Compositions of polyethers obtained by reactions forming an ether link in the main chain (of polyacetals C08L59/00; of epoxy resins C08L63/00; of polythioether-ethers C08L81/02; of polyether-sulfones C08L81/06); Compositions of derivatives of such polymers · CPC title
- C08L33/12Primary
Homopolymers or copolymers of methyl methacrylate · CPC title
Anti-static materials · CPC title
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- What does patent US2022298350A1 cover?
- A transparent antistatic composition based on polymethyl methacrylate (PMMA), including: 55% to 99.9% by weight of PMMA, and 0.1% to 45% by weight of at least one polyamide (PA) block-containing and polyether (PE) block-containing copolymer (PEBA) comprising polyethylene glycol (PEG), with respect to the total composition weight, the copolymer includes in the range 50% to 80% by weight of PEG w…
- Who is the assignee on this patent?
- Arkema France
- What technology area does this patent fall under?
- Primary CPC classification C08L33/12. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Thu Sep 22 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).