Fe-pt-bn-based sputtering target and production method therefor

Patent metadata

Field	Value
Publication number	US-2022267892-A1
Application number	US-202017626394-A
Country	US
Kind code	A1
Filing date	May 22, 2020
Priority date	Jul 12, 2019
Publication date	Aug 25, 2022
Grant date	—

Abstract

A problem of particle generation in an Fe-Pt-BN-based sputtering target having a high relative density is resolved by an approach different from conventional methods.An Fe-Pt-BN-based sputtering target having a relative density of 90% or more and a Vickers hardness of 150 or less can reduce the number of particles generated during magnetron sputtering.

First claim

1 . An Fe-Pt-BN-based sputtering target having a Vickers hardness of 150 or less.

2 . The Fe-Pt-BN-based sputtering target according to claim 1 , comprising 20 mol % or more and less than 40 mol % of Pt and 25 mol % or more and 50 mol % or less of BN, with the balance being Fe and incidental impurities.

3 . The Fe-Pt-BN-based sputtering target according to claim 1 , comprising 20 mol % or more and less than 40 mol % of Pt, 10 mol % or more and less than 50 mol % of BN, and more than 0 mol % and 30 mol % or less of C, with the balance being Fe and incidental impurities, wherein a total content of BN and C is 25 mol % or more and 50 mol % or less.

4 . The Fe-Pt-BN-based sputtering target according to claim 1 , comprising 20 mol % or more and less than 40 mol % of Pt and 25 mol % or more and 50 mol % or less of BN, and a total content of 15 mol % or less of one or more elements selected from Au, Ag, B, Cr, Cu, Ge, Ir, Ni, Pd, Rh, and Ru, with the balance being Fe and incidental impurities.

5 . The Fe-Pt-BN-based sputtering target according to claim 1 , comprising 20 mol % or more and less than 40 mol % of Pt, 10 mol % or more and less than 50 mol % of BN, and more than 0 mol % and 30 mol % or less of C, and a total content of 15 mol % or less of one or more elements selected from Au, Ag, B, Cr, Cu, Ge, Ir, Ni, Pd, Rh, and Ru, with the balance being Fe and incidental impurities, wherein a total content of BN and C is 25 mol % or more and 50 mol % or less.

6 . The Fe-Pt-BN-based sputtering target according to claim 1 , having a relative density of 90% or more.

7 . A method of producing the Fe-Pt-BN-based sputtering target according to claim 2 , comprising
feeding Fe powder, Pt powder, and BN powder into a stirred media mill and mixing at 100 rpm or more and 300 rpm or less for 1 hour or more and 6 hours or less to obtain a raw material powder mixture; and sintering the raw material powder mixture, wherein hot isostatic pressing (HIP) is not performed.

8 . A method of producing the Fe-Pt-BN-based sputtering target according to claim 3 , comprising
feeding Fe powder, Pt powder, BN powder, and C powder into a stirred media mill and mixing at 100 rpm or more and 300 rpm or less for 1 hour or more and 6 hours or less to obtain a raw material powder mixture; and sintering the raw material powder mixture, wherein hot isostatic pressing (HIP) is not performed.

9 . The Fe-Pt-BN-based sputtering target according to claim 2 , having a relative density of 90% or more.

10 . The Fe-Pt-BN-based sputtering target according to claim 3 , having a relative density of 90% or more.

11 . The Fe-Pt-BN-based sputtering target according to claim 4 , having a relative density of 90% or more.

12 . The Fe-Pt-BN-based sputtering target according to claim 5 , having a relative density of 90% or more.

Assignees

• Tanaka Precious Metal Ind

Inventors

• Nishiura Masahiro
• Yamamoto Takamichi
• Kurose Kenta
• Kobayashi Hironori
• Miyashita Takanobu

Classifications

• C23C14/3414 Primary

  Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy · CPC title

• B22F3/00 Primary

  Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor {; Presses and furnaces} · CPC title

• B22F2999/00

  Aspects linked to processes or compositions used in powder metallurgy · CPC title

• B22F2998/10

  Processes characterised by the sequence of their steps · CPC title

• C22C33/0292

  with more than 5% preformed carbides, nitrides or borides · CPC title