Substrate treatment apparatus and substrate treatment method

Patent metadata

Field	Value
Publication number	US-2022208545-A1
Application number	US-202117558595-A
Country	US
Kind code	A1
Filing date	Dec 22, 2021
Priority date	Dec 28, 2020
Publication date	Jun 30, 2022
Grant date	—

Abstract

A substrate treatment method includes a rinsing step of performing treatment of a substrate with a rinse liquid, an immersing step of immersing the substrate in a diluted isopropyl alcohol (dIPA) stored in a treatment tank after the rinsing step, a first isopropyl alcohol treatment step of performing treatment of the substrate with an isopropyl alcohol after the immersing step, and a water-repellent treatment step of performing water-repellent treatment of the substrate after the first isopropyl alcohol treatment step.

First claim

What is claimed is:

1 . A substrate treatment method, comprising:
a rinsing step of performing treatment of a substrate with a rinse liquid; an immersing step of immersing the substrate in a diluted isopropyl alcohol stored in a treatment tank after the rinsing step; a first isopropyl alcohol treatment step of performing treatment of the substrate with an isopropyl alcohol after the immersing step; and a water-repellent treatment step of performing water-repellent treatment of the substrate after the first isopropyl alcohol treatment step.

2 . The substrate treatment method according to claim 1 ,
wherein in the immersing step, a concentration of the diluted isopropyl alcohol increases in accordance with a time of immersion of the substrate.

3 . The substrate treatment method according to claim 1 ,
wherein the rinsing step is performed by a rinse treatment device, wherein the immersing step is performed by a drying treatment device, and wherein the substrate treatment method further comprises a conveying step of conveying the substrate from the rinse treatment device to the drying treatment device after the rinsing step and before the immersing step.

4 . The substrate treatment method according to claim 1 , further comprising:
a step of storing the diluted isopropyl alcohol in the treatment tank in a state in which an inert gas is supplied to a chamber accommodating the treatment tank before the immersing step.

5 . The substrate treatment method according to claim 1 , further comprising:
a second isopropyl alcohol treatment step of performing treatment of the substrate with an isopropyl alcohol after the water-repellent treatment step; and an inert gas supplying step of supplying an inert gas to the substrate after the second isopropyl alcohol treatment step.

6 . The substrate treatment method according to claim 5 , further comprising:
an immersing step of immersing the substrate in the diluted isopropyl alcohol stored in the treatment tank after the water-repellent treatment step and before the second isopropyl alcohol treatment step.

7 . A substrate treatment apparatus, comprising:
a chamber; a treatment tank that is disposed inside the chamber and stores a stored liquid; a substrate holding part that holds a substrate and is able to move such that the substrate is immersed in the stored liquid in the treatment tank; a liquid supply part that supplies a diluted isopropyl alcohol as the stored liquid to the treatment tank; an isopropyl alcohol supply part that supplies vapor of an isopropyl alcohol to the inside of the chamber; a water repellent agent supply part that supplies vapor of a water repellent agent to the inside of the chamber; and a control part that controls the substrate holding part, the liquid supply part, the isopropyl alcohol supply part, and the water repellent agent supply part, wherein the control part controls the substrate holding part, the isopropyl alcohol supply part, and the water repellent agent supply part such that after the substrate which has been treated with the rinse liquid is immersed in the diluted isopropyl alcohol stored in the treatment tank, the vapor of the isopropyl alcohol is supplied to the substrate, and then the vapor of the water repellent agent is supplied to the substrate.

8 . The substrate treatment apparatus according to claim 7 ,
wherein the control part controls the liquid supply part such that a concentration of the diluted isopropyl alcohol increases in accordance with a time of immersion of the substrate in the diluted isopropyl alcohol in the treatment tank.

9 . The substrate treatment apparatus according to claim 7 , further comprising:
a drying treatment device that includes the chamber, the treatment tank, the substrate holding part, the isopropyl alcohol supply part, and the water repellent agent supply part; a rinse treatment device that performs treatment of the substrate with the rinse liquid; and a conveyance device that conveys the substrate which has been treated with the rinse liquid by the rinse treatment device to the drying treatment device.

10 . The substrate treatment apparatus according to claim 7 , further comprising:
an inert gas supply part that supplies vapor of an inert gas to the inside of the chamber, wherein the control part controls the liquid supply part and the inert gas supply part such that the diluted isopropyl alcohol is supplied to the treatment tank in a state in which the inert gas is supplied to the chamber.

11 . The substrate treatment apparatus according to claim 10 ,
wherein the control part controls the isopropyl alcohol supply part and the inert gas supply part such that after the water repellent agent is supplied to the substrate, vapor of an isopropyl alcohol is supplied to the substrate, and then the inert gas is supplied to the substrate.

12 . The substrate treatment apparatus according to claim 11 ,
wherein the control part controls the substrate holding part such that the substrate is immersed in the diluted isopropyl alcohol stored in the treatment tank after the water repellent agent is supplied to the substrate and before the vapor of the isopropyl alcohol is supplied to the substrate.

Assignees

• Screen Holdings Co Ltd

Inventors

• Yamamoto Shigeru
• Fujii Daiki
• Iwata Keiji
• Edamitsu Kenji
• Kawai Yuya
• Ito Kenichi

Classifications

• H10P72/0416 Primary

  with the semiconductor substrates being dipped in baths or vessels · CPC title

• H10P70/20 Primary

  Cleaning during device manufacture · CPC title

• H10P72/3312

  Vertical transfer of a batch of workpieces · CPC title

• H10P72/0406

  for cleaning followed by drying, rinsing, stripping, blasting or the like · CPC title

• H10P72/0402

  Apparatus for fluid treatment (H10P72/0441, H10P72/0448 take precedence) · CPC title