Fault Detection Using Showerhead Voltage Variation
US-2018350643-A1 · Dec 6, 2018 · US
Diagnosis apparatus, plasma processing apparatus and diagnosis method
US2022157580A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2022157580-A1 |
| Application number | US-201916971255-A |
| Country | US |
| Kind code | A1 |
| Filing date | Jul 30, 2019 |
| Priority date | Jul 30, 2019 |
| Publication date | May 19, 2022 |
| Grant date | — |
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Abstract
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In a diagnosis apparatus for diagnosing a state of a plasma processing apparatus, prior distribution information including a probability distribution function is previously obtained for each of first sensors by using first sensor values obtained by the first sensors in a first plasma processing apparatus, a probability distribution in each of second sensors corresponding to each of the first sensors is estimated based on the previously obtained prior distribution information and second sensor values obtained by the second sensors in a second plasma processing apparatus different from the first plasma processing apparatus, and a state of the second plasma processing apparatus is diagnosed by using the estimated probability distribution.
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1 . A diagnosis apparatus for diagnosing a state of a plasma processing apparatus, wherein prior distribution information including a probability distribution function is previously obtained for each of first sensors by using first sensor values obtained by the first sensors in a first plasma processing apparatus, a probability distribution in each of second sensors corresponding to each of the first sensors is estimated based on the previously obtained prior distribution information and second sensor values obtained by the second sensors in a second plasma processing apparatus different from the first plasma processing apparatus, and a state of the second plasma processing apparatus is diagnosed by using the estimated probability distribution. 2 . The diagnosis apparatus according to claim 1 , wherein there are a plurality of the first plasma processing apparatuses, and the probability distribution function previously obtained in each of the first sensors is a most frequent probability distribution function obtained for the first plasma processing apparatus among probability distribution functions obtained for the first plasma processing apparatuses. 3 . The diagnosis apparatus according to claim 2 , wherein the probability distribution function previously obtained in each of the first sensors is selected from probability distribution function candidates based on a likelihood. 4 . A diagnosis apparatus for diagnosing a state of a plasma processing apparatus, wherein prior distribution information including a probability distribution function is previously obtained for each of first sensors by using first sensor values obtained by the first sensors in a first plasma processing apparatus, a probability distribution in each of second sensors corresponding to each of the first sensors is estimated based on the previously obtained prior distribution information and second sensor values obtained by the second sensors in a second plasma processing apparatus, and a first likelihood that is a likelihood of the estimated probability distribution and a second likelihood that is a likelihood of a normal distribution are compared, when the first likelihood is higher than the second likelihood, a state of the second plasma processing apparatus is diagnosed by using the estimated probability distribution, and when the second likelihood is higher than the first likelihood, the state of the second plasma processing apparatus is diagnosed by using the normal distribution. 5 . The diagnosis apparatus according to claim 1 , wherein the probability distribution is estimated by using a Markov chain Monte Carlo method. 6 . The diagnosis apparatus according to claim 1 , wherein a difference in the probability distribution between the plasma processing apparatuses is output as a diagnosis value of the state of the second plasma processing apparatus, and a transition width over time of the probability distribution is also output. 7 . A plasma processing apparatus comprising: a processing chamber in which a sample is plasma-processed; and a diagnosis apparatus configured to diagnose a state of a self-apparatus, wherein the apparatus diagnosis device previously obtains prior distribution information including a probability distribution function for each of first sensors by using first sensor values obtained by the first sensors in a plasma processing apparatus different from the self-apparatus, estimates a probability distribution in each of second sensors corresponding to each of the first sensors based on the previously obtained prior distribution information and second sensor values obtained by the second sensors in the self-apparatus, and diagnoses the state of the self-apparatus by using the estimated probability distribution. 8 . A diagnosis method for diagnosing a state of a plasma processing apparatus, the apparatus diagnosis method comprising: a step of previously obtaining prior distribution information including a probability distribution function for each of first sensors by using first sensor values obtained by the first sensors in a first plasma processing apparatus; a step of estimating a probability distribution in each of second sensors corresponding to each of the first sensors based on the previously obtained prior distribution information and second sensor values obtained by the second sensors in a second plasma processing apparatus; and a step of diagnosing a state of the second plasma processing apparatus by using the estimated probability distribution.
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Classifications
Probabilistic graphical models, e.g. probabilistic networks · CPC title
of Group IV materials · CPC title
- H01J37/32917Primary
Plasma diagnostics · CPC title
Spatial variables, e.g. position, distance · CPC title
Testing of complete machines, e.g. washing-machines or mobile phones (testing of machine parts G01M13/00; testing of electric apparatus or components G01R31/50) · CPC title
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- What does patent US2022157580A1 cover?
- In a diagnosis apparatus for diagnosing a state of a plasma processing apparatus, prior distribution information including a probability distribution function is previously obtained for each of first sensors by using first sensor values obtained by the first sensors in a first plasma processing apparatus, a probability distribution in each of second sensors corresponding to each of the first se…
- Who is the assignee on this patent?
- Hitachi High Tech Corp
- What technology area does this patent fall under?
- Primary CPC classification H01J37/32917. Mapped technology areas include Electricity.
- When was this patent published?
- Publication date Thu May 19 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 5 related publications on this page (citations in our corpus or others sharing the same primary CPC).