Deposition mask, method of manufacturing the same, and method of manufacturing display panel

Patent metadata

Field	Value
Publication number	US-2022093863-A1
Application number	US-202117326194-A
Country	US
Kind code	A1
Filing date	May 20, 2021
Priority date	Sep 24, 2020
Publication date	Mar 24, 2022
Grant date	—

Abstract

A deposition mask for manufacturing a display panel includes a metallic base having a thickness of about 50 micrometers to about 200 micrometers and a plurality of openings defined therein, wherein at least some of the openings include a first opening having a first width and a second opening having a second width smaller than the first width respectively defined along a thickness direction of the metallic base, and wherein the metallic base includes a first part in which the first opening is defined, and a second part in which the second opening is defined, the second part having a width that increases in a direction downward from a top surface of the metallic base along the thickness direction of the metallic base.

First claim

What is claimed is:

1 . A deposition mask for manufacturing a display panel, the deposition mask comprising:
a metallic base having a thickness of about 50 micrometers to about 200 micrometers and a plurality of openings defined therein; wherein at least some of the plurality of openings include a first opening having a first width and a second opening having a second width smaller than the first width respectively defined along a thickness direction of the metallic base, and wherein the metallic base includes a first part in which the first opening is defined, and a second part in which the second opening is defined, the second part having a width that increases in a direction downward from a top surface of the metallic base along the thickness direction of the metallic base.

2 . The deposition mask of claim 1 , wherein the second part is disposed on the first part, and the first part has a thickness of about 5% to about 50% of a total thickness of the metallic base.

3 . The deposition mask of claim 1 , wherein the first part is disposed on the second part and the first part has a thickness of about 30% to about 80% of a total thickness of the metallic base.

4 . The deposition mask of claim 1 , wherein the first part includes a first sub-part disposed on the second part, and a second sub-part disposed under the second part, and the first and second sub-parts have thicknesses that are each about 5% to about 40% of a total thickness of the metallic base.

5 . The deposition mask of claim 1 , wherein the metallic base comprises a mask body having invar.

6 . The deposition mask of claim 1 , wherein the first part comprises a first side surface defining the first opening and having a rounded shape with a slope that changes in the thickness direction of the metallic base.

7 . The deposition mask of claim 1 , wherein the second part comprises a second side surface defining the second opening, and being inclined at a predetermined taper angle.

8 . The deposition mask of claim 7 , wherein the taper angle is about 30° to about 70°.

9 . The deposition mask of claim 1 , wherein the openings comprise through-parts and the width of each of the plurality of through-parts is about 10 mm to about 400 mm.

10 . A method of manufacturing a deposition mask for a display panel, the method comprising:
preparing a base having a thickness of about 50 micrometers to about 200 micrometers; reducing the thickness of the base by wet-etching at least one surface of the base to form a thickness-reduced section; and forming a plurality of openings by irradiating, with a laser, a portion of the thickness-reduced section.

11 . The method of claim 10 , wherein
the base comprises a base sheet having an upper surface and a lower surface facing the upper surface, the step of reducing of the thickness of the base sheet comprises wet-etching the lower surface, and the step of forming of the plurality of openings comprises irradiating the upper surface with the laser.

12 . The method of claim 10 , wherein
the base comprises a base sheet having an upper surface and a lower surface facing the upper surface, the step of reducing the thickness of the base sheet includes wet-etching the upper surface, and the step of forming the plurality of openings comprises irradiating the upper surface with the laser.

13 . The method of claim 10 , wherein
the base sheet has an upper surface and a lower surface facing the upper surface, the step of reducing the thickness of the base sheet comprises wet-etching both the upper surface and the lower surface, and the step of forming the plurality of openings comprises irradiating the upper surface with the laser.

14 . The method of claim 10 , wherein the openings comprise through-parts, and the step of forming of the plurality of openings comprises forming the through-parts to have a width of about 10 mm to about 400 mm.

15 . A method of manufacturing a display panel, the method comprising:
preparing a target substrate; forming and disposing, on the target substrate, a deposition mask having a base with a thickness and a plurality of openings defined therein; forming, on the target substrate, a plurality of deposition patterns corresponding to the openings; and removing the deposition mask,
wherein the forming of the deposition mask comprises:
reducing the thickness of the base by wet-etching at least one surface of the base to a thickness of about 50 micrometers to about 200 micrometers to form a thickness-reduced section; and
forming a plurality of openings by etching a portion of the thickness-reduced section.

16 . The method of claim 15 , wherein the disposition mask comprises:
a first part in which a first opening is defined; and a second part in which a second opening is defined, the second part having a width that increases in a direction downward from a top surface of the metallic base along the thickness direction of the metallic base.

17 . The method of claim 16 , wherein the first part comprises a first side surface defining the first opening and having a rounded shape with a slope that changes in the thickness direction.

18 . The method of claim 16 , wherein the second part comprises a second side surface defining the second opening, and being inclined at a predetermined taper angle so that the thickness thereof increases in a direction toward the target substrate.

19 . The method of claim 15 , wherein the target substrate comprises a base substrate and a plurality of circuit element layers disposed on the base substrate, and the plurality of deposition patterns are common layers respectively disposed on the plurality of circuit element layers.

20 . The method of claim 19 , wherein
the plurality of circuit element layers comprises a first circuit element layer and a second circuit element layer spaced apart from on the first circuit element layer, the plurality of deposition patterns comprises a first deposition pattern disposed on the first circuit element layer, and a second deposition pattern disposed on the second circuit element layer, and the first deposition pattern and the second deposition pattern are spaced apart from each other.

Assignees

• Samsung Display Co Ltd

Inventors

• Hwang Kyu Hwan
• Kim Jeongkuk
• Kim Hwi
• Nam Kanghyun
• Park Sangha
• Lee Areum
• Jeong Da-Hee
• Jo Eunbee
• Jin Seungmin
• Hong Jaemin

Classifications

• H10K59/12

  Active-matrix OLED [AMOLED] displays · CPC title

• H10K71/166

  using selective deposition, e.g. using a mask · CPC title

• C23C14/042 Primary

  using masks · CPC title

• C23C16/042

  using masks · CPC title

• C23F4/00

  Processes for removing metallic material from surfaces, not provided for in group C23F1/00 or C23F3/00 · CPC title