Method for manufacturing pdms device and pdms device manufactured thereby

US2022063211A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2022063211-A1
Application numberUS-202117365105-A
CountryUS
Kind codeA1
Filing dateJul 1, 2021
Priority dateAug 25, 2020
Publication dateMar 3, 2022
Grant date

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

A method for manufacturing a PDMS device in accordance with an exemplary embodiment of the present invention surface treats the entire surface of a pattern with a thiol group (—SH), so that a hydrogel may be connected to the surface of the pattern by a covalent bond under ultraviolet rays. Therefore, a PDMS device manufactured by the above method has an advantage in that the shape thereof may be stably maintained without the swelling or desorption of a hydrogel even when an electrolyte is filled in a pattern.

First claim

Opening claim text (preview).

What is claimed is: 1 . A method for manufacturing a PDMS device, the method comprising: (a) preparing a first PDMS substrate and a second PDMS substrate at least one of which has a pattern formed thereon; (b) introducing a hydroxyl group (—OH) on the surface of the first PDMS substrate and the surface of the second PDMS substrate; (c) introducing a thiol group (—SH) on the surface of the first PDMS substrate, and introducing an epoxide on the surface of the second PDMS substrate; (d) bonding the first PDMS substrate and the second PDMS substrate to form a PDMS structure; and (e) substituting the epoxide present on the surface of the pattern of the PDMS structure with a thiol group. 2 . The method of claim 1 , wherein Step (b) is performed by irradiating the first PDMS substrate and the second PDMS substrate with ultraviolet rays in an ozone atmosphere. 3 . The method of claim 1 , wherein the introducing of a thiol group (—SH) on the surface of the first PDMS substrate in Step (c) is performed by dissolving at least one selected from the group consisting of (3-Mercaptopropyl)trimethoxysilane, (3-Mercaptopropyl)trimethoxy-d9-silane, and Bis[3-(triethoxysilyl)propyl] tetrasulfide in a solvent, and then immersing the first PDMS substrate therein. 4 . The method of claim 1 , wherein the introducing of an epoxide on the surface of the second PDMS substrate in Step (c) is performed by dissolving at least one selected from the group consisting of (3-Glycidyloxypropyl)trimethoxysilane and Diethoxy(3-glycidyloxypropyl)methylsilane in a solvent, and then immersing the second PDMS substrate therein. 5 . The method of claim 1 , wherein Step (e) is one in which a compound having 2 or more thiol groups (—SH) is dissolved together with a base in a solvent, and then allowed to come into contact with the pattern, thereby introducing a thiol group while the epoxide ring is opened. 6 . The method of claim 5 , wherein: the compound having 2 or more thiol groups (—SH) is at least one selected from the group consisting of 1,2-Ethanedithiol, Propanedithiol, 2,3-Dimercapto-1-propanol, Poly(ethylene glycol) dithiolm and 4,4 ; and the base is at least one selected from the group consisting of 1,8-Diazabicyclo[5.4.0]undec-7-ene, and 1,5-Diazabicyclo[4.3.0]non-5-ene. 7 . The method of claim 1 , further comprising, after Step (e) is performed, injecting a hydrogel monomolecular aqueous solution at one position of the pattern, and then irradiating the pattern with ultraviolet rays to fix a hydrogel to the thiol group on the surface of the pattern. 8 . A PDMS device including a PDMS structure formed by bonding a first PDMS substrate and a second PDMS substrate at least one of which has a pattern formed thereon, wherein the first PDMS substrate and the second PDMS substrate are bonded by the coupling of a thiol group (—SH) formed on the surface of the first PDMS substrate and an epoxide of the second PDMS substrate, and a thiol group (—SH) is formed on the surface of the pattern. 9 . The PDMS device of claim 8 , wherein among walls constituting the pattern, the thiol group is formed through a connection body on the surface of a wall configured by the second PDMS substrate, and one end of the connection body is connected to a hydroxyl group (—OH) on the surface of the second PDMS substrate, whereas the other end of the connection body is connected to the thiol group while the epoxide ring is opened. 10 . The PDMS device of claim 8 , wherein the pattern comprises: a first channel formed long in one direction; a second channel branched from the first channel; a switch formed at an end of the second channel; and an electrolyte filled in the first channel, wherein when the switch is pressed, a non-conductive material or air positioned in the second channel flows into the first channel, so that the electrolyte filled in the first channel is disconnected. 11 . The PDMS device of claim 8 , wherein the pattern comprises: a channel filled with an electrolyte; and a diode unit formed in the middle of the channel, wherein a p-type hydrogel and an n-type hydrogel are formed facing and in contact with each other in the diode unit, and only the p-type hydrogel is exposed on one side of the channel, whereas only the n-type hydrogel is exposed on the other side of the channel.

Assignees

Inventors

Classifications

  • of PN junction diodes · CPC title

  • Organic PV cells · CPC title

  • Post-polymerisation treatment · CPC title

  • Polysiloxanes modified by chemical after-treatment · CPC title

  • C08G77/392Primary

    containing sulfur · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US2022063211A1 cover?
A method for manufacturing a PDMS device in accordance with an exemplary embodiment of the present invention surface treats the entire surface of a pattern with a thiol group (—SH), so that a hydrogel may be connected to the surface of the pattern by a covalent bond under ultraviolet rays. Therefore, a PDMS device manufactured by the above method has an advantage in that the shape thereof may b…
Who is the assignee on this patent?
Seoul Nat Univ R&Db Foundation
What technology area does this patent fall under?
Primary CPC classification C08G77/392. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Thu Mar 03 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).