Structure body, structure body manufacturing method, and electronic apparatus

US2022055343A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2022055343-A1
Application numberUS-201917413658-A
CountryUS
Kind codeA1
Filing dateDec 6, 2019
Priority dateJan 7, 2019
Publication dateFeb 24, 2022
Grant date

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A structure body according to an embodiment of the present disclosure includes: a first base having one surface, and having a density lower than a density that is determined by a crystal structure and a composition of a constituent material; a second base disposed to face the one surface of the first base; and a buffer layer provided between the first base and the second base, and containing at least a metal element.

First claim

Opening claim text (preview).

What is claimed is: 1 . A structure body comprising: a first base having one surface, and having a density lower than a density that is determined by a crystal structure and a composition of a constituent material; a second base disposed to face the one surface of the first base; and a buffer layer provided between the first base and the second base, and containing at least a metal element. 2 . The structure body according to claim 1 , wherein the first base has a region having a large surface roughness in at least a portion of the one surface. 3 . The structure body according to claim 1 , wherein the first base has an arithmetic average roughness (Ra) of 2 nm or greater. 4 . The structure body according to claim 1 , wherein the first base comprises a porous base material. 5 . The structure body according to claim 1 , wherein the first base comprises ceramics. 6 . The structure body according to claim 1 , wherein the second base comprises a metal base material. 7 . The structure body according to claim 1 , wherein the first base comprises a difficult-to-process glass material. 8 . The structure body according to claim 1 , wherein the metal element is locally distributed in the buffer layer in a film-thickness direction. 9 . The structure body according to claim 1 , wherein the buffer layer has a light permeability. 10 . The structure body according to claim 1 , further comprising a functional layer provided at least one of between the first base and the buffer layer or between the second base and the buffer layer. 11 . The structure body according to claim 1 , wherein the first base and the second base are bonded by an atomic diffusion bonding. 12 . A structure body manufacturing method comprising: bonding a first base and a second base, the first base having one surface, and having a density lower than a density that is determined by a crystal structure and a composition of a constituent material; and forming, between the first base and the second base, a buffer layer containing at least a metal element. 13 . The structure body manufacturing method according to claim 12 , further comprising: forming, on the first base, a first buffer layer containing at least the metal element; polishing a surface of the first buffer layer; and forming, on the first buffer layer, a first metal film having a microcrystal structure after the polishing, wherein the bonding comprises bonding the first metal film and the second base. 14 . The structure body manufacturing method according to claim 13 , further comprising, after the bonding the first metal film and the second base, performing a heating treatment to form the buffer layer. 15 . The structure body manufacturing method according to claim 12 , further comprising: forming, on the first base, a first buffer layer containing at least the metal element; polishing a surface of the first buffer layer; forming, on the first buffer layer, a first metal film having a microcrystal structure after the polishing; and forming, on the second base, a second buffer layer containing at least the metal element and a second metal film having a microcrystal structure, wherein the bonding comprises bonding the first metal film and the second metal film. 16 . The structure body manufacturing method according to claim 15 , further comprising, after the bonding the first metal film and the second metal film, performing a heating treatment to form the buffer layer. 17 . The structure body manufacturing method according to claim 13 , wherein the first buffer layer is formed using a vacuum deposition method or a sputtering method. 18 . The structure body manufacturing method according to claim 13 , wherein the surface of the first buffer layer is processed by an optical polishing or a chemical mechanical polishing. 19 . An electronic apparatus with a structure body, the structure body comprising: a first base having one surface, and having a density lower than a density that is determined by a crystal structure and a composition of a constituent material; a second base disposed to face the one surface of the first base; and a buffer layer provided between the first base and the second base, and containing at least a metal element.

Assignees

Inventors

Classifications

  • characterised by their material, e.g. binder · CPC title

  • Optical field-shaping means, e.g. lenses · CPC title

  • not being in contact with the bodies · CPC title

  • using secondary light emission, e.g. luminescence or fluorescence (using different colours G03B33/00; if related to video signals H04N9/3197) · CPC title

  • Pre-treatment of the joining surfaces, e.g. cleaning, machining · CPC title

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What does patent US2022055343A1 cover?
A structure body according to an embodiment of the present disclosure includes: a first base having one surface, and having a density lower than a density that is determined by a crystal structure and a composition of a constituent material; a second base disposed to face the one surface of the first base; and a buffer layer provided between the first base and the second base, and containing at…
Who is the assignee on this patent?
Sony Group Corp, Univ Tohoku
What technology area does this patent fall under?
Primary CPC classification B32B15/04. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Thu Feb 24 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).