Crystallized glass substrate

Patent metadata

Field	Value
Publication number	US-2022024802-A1
Application number	US-201817296983-A
Country	US
Kind code	A1
Filing date	Dec 21, 2018
Priority date	Dec 21, 2018
Publication date	Jan 27, 2022
Grant date	—

Abstract

Provided is a crystallized glass substrate including a surface with a compressive stress layer, in which a gradient A of a surface compressive stress from an outermost surface to a depth of 6 μm in the compressive stress layer is 50.0 to 110.0 MPa/μm, a gradient B of a surface compressive stress from a depth of (a stress depth DOLzero—10 μm) to the stress depth DOLzero is 2.5 to 15.0 MPa/μm, where the stress depth DOLzero is a depth of the compressive stress layer at a surface compressive stress of 0 MPa, and a hardness of the outermost surface at an indentation depth of 20 nm is 7.50 to 9.50 GPa.

First claim

1 . A crystallized glass substrate including a surface with a compressive stress layer, wherein a gradient A of a surface compressive stress from an outermost surface to a depth of 6 μm in the compressive stress layer is 50.0 to 110.0 MPa/μm,
a gradient B of a surface compressive stress from a depth of (a stress depth DOLzero—10 μm) to the stress depth DOLzero is 2.5 to 15.0 MPa/μm,
where the stress depth DOLzero is a depth of the compressive stress layer at a surface compressive stress of 0 MPa, and
a hardness of the outermost surface at an indentation depth of 20 nm is 7.50 to 9.50 GPa.

2 . A crystallized glass substrate including a surface with a compressive stress layer,
wherein a gradient A of a surface compressive stress from an outermost surface to a depth of 6 μm in the compressive stress layer is 50.0 to 110.0 MPa/μm, a gradient B of a surface compressive stress from a depth of (a stress depth DOLzero—10 μm) to the stress depth DOLzero is 2.5 to 15.0 MPa/μm, where the stress depth DOLzero is a depth of the compressive stress layer at a surface compressive stress of 0 MPa, and a hardness of the outermost surface at an indentation depth of 100 nm is 8.00 to 9.50 GPa.

3 . A crystallized glass substrate including a surface with a compressive stress layer,
wherein a gradient A of a surface compressive stress from an outermost surface to a depth of 6 μm in the compressive stress layer is 50.0 to 110.0 MPa/μm, a gradient B of a surface compressive stress from a depth of (a stress depth DOLzero—10 μm) to the stress depth DOLzero is 2.5 to 15.0 MPa/μm, where the stress depth DOLzero is a depth of the compressive stress layer at a surface compressive stress of 0 MPa, and a surface compressive stress CS on the outermost surface of the compressive stress layer is 900.0 to 1200.0 MPa.

4 . The crystallized glass substrate according to claim 1 , wherein the stress depth DOLzero is 30.0 to 70.0 μm,
a surface compressive stress CS on an outermost surface of the compressive stress layer is 870.0 to 1150.0 MPa, and
a central compressive stress CT is 35.0 to 70.0 MPa.

5 . The crystallized glass substrate according to claim 1 , comprising:
by wt % in terms of oxide, 40.0% to 70.0% of a SiO 2 component; 11.0% to 25.0% of an Al 2 O 3 component; 5.0% to 19.0% of a Na 2 O component; 0% to 9.0% of a K 2 O component; 1.0% to 18.0% of one or more selected from a MgO component and a ZnO component; 0% to 3.0% of a CaO component; and 0.5% to 12.0% of a TiO 2 component.

6 . The crystallized glass substrate according to claim 1 , wherein a thickness of the crystallized glass substrate is 0.1 to 1.0 mm.

7 . The crystallized glass substrate according to claim 2 , wherein the stress depth DOLzero is 30.0 to 70.0 μm,
a surface compressive stress CS on an outermost surface of the compressive stress layer is 870.0 to 1150.0 MPa, and
a central compressive stress CT is 35.0 to 70.0 MPa.

8 . The crystallized glass substrate according to claim 2 , comprising:
by wt % in terms of oxide, 40.0% to 70.0% of a SiO 2 component; 11.0% to 25.0% of an Al 2 O 3 component; 5.0% to 19.0% of a Na 2 O component; 0% to 9.0% of a K 2 O component; 1.0% to 18.0% of one or more selected from a MgO component and a ZnO component; 0% to 3.0% of a CaO component; and 0.5% to 12.0% of a TiO 2 component.

9 . The crystallized glass substrate according to claim 3 , comprising:
by wt % in terms of oxide, 40.0% to 70.0% of a SiO 2 component; 11.0% to 25.0% of an Al 2 O 3 component; 5.0% to 19.0% of a Na 2 O component; 0% to 9.0% of a K 2 O component; 1.0% to 18.0% of one or more selected from a MgO component and a ZnO component; 0% to 3.0% of a CaO component; and 0.5% to 12.0% of a TiO 2 component.

10 . The crystallized glass substrate according to claim 4 , comprising:
by wt % in terms of oxide, 40.0% to 70.0% of a SiO 2 component; 11.0% to 25.0% of an Al 2 O 3 component; 5.0% to 19.0% of a Na 2 O component; 0% to 9.0% of a K 2 O component; 1.0% to 18.0% of one or more selected from a MgO component and a ZnO component; 0% to 3.0% of a CaO component; and 0.5% to 12.0% of a TiO 2 component.

11 . The crystallized glass substrate according to claim 2 , wherein a thickness of the crystallized glass substrate is 0.1 to 1.0 mm.

12 . The crystallized glass substrate according to claim 3 , wherein a thickness of the crystallized glass substrate is 0.1 to 1.0 mm.

13 . The crystallized glass substrate according to claim 4 , wherein a thickness of the crystallized glass substrate is 0.1 to 1.0 mm.

14 . The crystallized glass substrate according to claim 5 , wherein a thickness of the crystallized glass substrate is 0.1 to 1.0 mm.

Assignees

• Ohara Kk

Inventors

• Yagi Toshitaka
• OGASAWARA Kohei

Classifications

• C03C10/0045

  containing SiO2, Al2O3 and MgO as main constituents · CPC title

• C03C3/087 Primary

  containing calcium oxide, e.g. common sheet or container glass · CPC title

• C03C10/0018

  containing SiO2, Al2O3 and monovalent metal oxide as main constituents · CPC title

• C03C21/002

  to perform ion-exchange between alkali ions (C03C21/005 takes precedence) · CPC title

• C03C21/00 Primary

  Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface · CPC title