Photo-curable compositions for additive manufacturing

US2022017743A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2022017743-A1
Application numberUS-202117487976-A
CountryUS
Kind codeA1
Filing dateSep 28, 2021
Priority dateMar 28, 2019
Publication dateJan 20, 2022
Grant date

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  5. First independent claim

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Abstract

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The present invention is directed to a photo-curable composition for use in additive manufacturing, said composition comprising, based on the total weight of the composition: from 10 to 80 wt. % of a) a dispersion of nanosilica particles in epoxy resin, said nanosilica particles having an average particle size (d50) of less than 50 nm, as measured by dynamic light scattering; from 10 to 80 wt. % of b) a toughened epoxy resin comprising i) core shell rubber particles; and, ii) at least one cycloaliphatic epoxy resin; and, from 0.1 to 10 wt. % of c) a photoinitatior, said photoinitator comprising an ionic photoacid generator.

First claim

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What is claimed is: 1 . A photo-curable composition for use in additive manufacturing, said composition comprising, based on the total weight of the composition: from 10 to 80 wt. % of a) a dispersion of nanosilica particles in epoxy resin, said nanosilica particles having an average particle size (d50) of less than 50 nm, as measured by dynamic light scattering; from 10 to 80 wt. % of b) a toughened epoxy resin comprising i) core shell rubber particles; and, ii) at least one cycloaliphatic epoxy resin; and, from 0.1 to 10 wt. % of c) a photoinitatior, said photoinitator comprising an ionic photoacid generator. 2 . The photo-curable according to claim 1 comprising, based on the total weight of the composition: from 25 to 65 wt. % of a) a dispersion of nanosilica particles in epoxy resin, said nanosilica particles having an average particle size (d50) of less than 50 nm, as measured by dynamic light scattering; from 15 to 65 wt. % of b) a toughened epoxy resin comprising i) core shell rubber particles; and, ii) at least one cycloaliphatic epoxy resin; and, from 0.5 to 5 wt. % of c) a photoinitatior, said photoinitator comprising an ionic photoacid generator. 3 . The photo-curable composition according to claim 1 , wherein said nanosilica particles have an average particle size of from 1 to 40 nm as measured by dynamic light scattering. 4 . The photo-curable composition according to claim 1 , wherein said nanosilica particles constitute from 10 to 50 wt. % of part a), based on the total weight of said dispersion. 5 . The photo-curable composition according to claim 1 , wherein said dispersion of part a) is a colloidal silica sol. 6 . The photo-curable composition according to claim 1 , wherein said epoxy resin of part a) is comprised of at least one diepoxide compound having an epoxy equivalent weight of less than 500. 7 . The photo-curable composition according to claim 1 , wherein said epoxy resin of part a) is comprised of at least one polyepoxide compound selected from the group consisting of: glycidyl ethers of polyhydric alcohols; gycidyl ethers of polyhydric phenols; and glycidyl esters of polycarboxylic acids. 8 . The photo-curable composition according to claim 1 , wherein said core shell rubber particles of part b) have an average particle size (d50) of from 10 nm to 300 nm as measured via dynamic light scattering. 9 . The photo-curable composition according to claim 1 , wherein said core shell rubber particles constitute from 10 to 50 wt. % of part b), based on the total weight of said dispersion. 10 . The photo-curable composition according to claim 1 , wherein said at least one cycloaliphatic epoxy resin of part b) is selected from the group consisting of: cyclohexanedimethanol diglycidyl ether; bis(3,4-epoxycyclohexylmethyl) adipate; bis(3 4-epoxy-6-methylcyclohexylmethyl) adipate; bis(2,3-epoxycyclopentyl) ether; 3,4-epoxycyclohexylmethyl; 3,4-epoxycyclohexanecarboxylate; 1,4-cyclohexanedimethanol diglycidyl ether; diglycidyl 1,2-cyclohexanedicarboxylate; and, cycloaliphatic epoxy resins obtained by the hydrogenation of aromatic bisphenol A diglycidyl ether (BADGE) epoxy resins. 11 . The photo-curable composition according to claim 1 , said composition comprising: from 40 to 60 wt. % of a) a dispersion of nanosilica particles in epoxy resin, said nanosilica particles having an average particle size (d50) of less than 50 nm, as measured by dynamic light scattering, and said epoxy resin being comprised of at least one polyepoxide compound selected from the group consisting of glycidyl ethers of polyhydric alcohols, glycidyl ethers of polyhydric phenols and glycidyl esters of polycarboxylic acids; from 40 to 60 wt. % of b) a toughened epoxy resin comprising iii) core shell rubber particles having an average particle size (d50) of from 10 to 300 nm, as measured via dynamic light scattering; and, iv) at least one cycloaliphatic epoxy resin selected from the group consisting of: cyclohexanedimethanol diglycidyl ether; bis(3,4-epoxycyclohexylmethyl) adipate; bis(3 4-epoxy-6-methylcyclohexylmethyl) adipate; bis(2,3-epoxycyclopentyl) ether; 3,4-epoxycyclohexylmethyl; 3,4-epoxycyclohexanecarboxylate; 1,4-cyclohexanedimethanol diglycidyl ether; diglycidyl 1,2-cyclohexanedicarboxylate; and, cycloaliphatic epoxy resins obtained by the hydrogenation of aromatic bisphenol A diglycidyl ether (BADGE) epoxy resins; and, from 0.5 to 5 wt. % of c) a photoinitatior, said photoinitator consisting of an ionic photoacid generator. 12 . The photo-curable composition according to claim 1 , wherein said ionic photoacid generator is a hexafluoroantimonate salt. 13 . A method for forming a three dimensional object, said method comprising: i) providing a carrier and an optically transparent member having a movable build surface, said carrier and build surface defining a build region there between; ii) within said build region, applying by 3D printing a first layer of the composition as defined in claim 1 ; iii) irradiating said build region through said optically transparent member to at least partially cure that first layer; iv) applying a subsequent layer of said composition by 3D printing on the at least partially cured layer; and, v) irradiating said build region through said optically transparent member to at least partially cure that subsequent layer. 14 . An iterative method according to claim 13 for forming a three dimensional object, wherein said steps iv) and v) are performed and repeated so as to dispose second, third, fourth and further layers within the build region.

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What does patent US2022017743A1 cover?
The present invention is directed to a photo-curable composition for use in additive manufacturing, said composition comprising, based on the total weight of the composition: from 10 to 80 wt. % of a) a dispersion of nanosilica particles in epoxy resin, said nanosilica particles having an average particle size (d50) of less than 50 nm, as measured by dynamic light scattering; from 10…
Who is the assignee on this patent?
Henkel Ag & Co Kgaa
What technology area does this patent fall under?
Primary CPC classification C08G59/24. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Thu Jan 20 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).