Cobalt complex, method for manufacturing same, and method for manufacturing cobalt-containing thin film

Patent metadata

Field	Value
Publication number	US-2022017553-A1
Application number	US-201917292819-A
Country	US
Kind code	A1
Filing date	Nov 8, 2019
Priority date	Nov 12, 2018
Publication date	Jan 20, 2022
Grant date	—

Abstract

To provide a cobalt complex which is liquid at room temperature, useful for producing a cobalt-containing thin film under conditions without using an oxidizing gas.
A cobalt complex represented by the following formula (1):
L 1 -Co-L 2   (1)

wherein L 1 and L 2 represent a unidentate amide ligand of the following formula (A), a bidentate amide ligand of the following formula (B) or a hetero atom-containing ligand of the following formula (C):

wherein R 1 and R 2 represent a C 1-6 alkyl group or a tri(C 1-6 alkyl)silyl group, and the wave line represents a binding site to the cobalt atom;

wherein R 3 represents a tri(C 1-6 alkyl)silyl group, R 4 and R 5 represent a C 1-4 alkyl group, and X represents a C 1-6 alkylene group;

wherein R 6 and R 8 represent a C 1-6 alkyl group, R 7 represents a hydrogen atom or a C 1-4 alkyl group, Y represents an oxygen atom or NR 9 , Z represents an oxygen atom or NR 10 , and R 9 and R 10 independently represent a C 1-6 alkyl group.

First claim

1 . A cobalt complex represented by the following formula (1):
L 1 -Co-L 2   (1)

wherein L 1 and L 2 which are different from each other represent a unidentate amide ligand represented by the following formula (A), a bidentate amide ligand represented by the following formula (B) or a hetero atom-containing ligand represented by the following formula (C):

wherein R 1 and R 2 independently represent a C 1-6 alkyl group or a tri(C 1-6 alkyl)silyl group, and the wave line represents a binding site to the cobalt atom;

wherein R 3 represents a tri(C 1-6 alkyl)silyl group, R 4 and R 5 independently represent a C 1-4 alkyl group, and X represents a C 1-6 alkylene group;

wherein R 6 and R 8 independently represent a C 1-6 alkyl group, R 7 represents a hydrogen atom or a C 1-4 alkyl group, Y represents an oxygen atom or NR 9 , Z represents an oxygen atom or NR 10 , and R 9 and R 10 independently represent a C 1-6 alkyl group.

2 . The cobalt complex according to claim 1 , which is represented by the following formula (1AB):

wherein R 1 and R 2 are as defined for R 1 and R 2 in the above formula (A), and R 3 , R 4 , R 5 and X are as defined for R 3 , R 4 , R 5 and X in the above formula (B).

3 . The cobalt complex according to claim 2 , wherein R 1 , R 2 and R 3 are a tri(C 1-4 alkyl)silyl group, R 4 and R 5 are a methyl group or an ethyl group, and X is a C 1-4 alkylene group.

4 . The cobalt complex according to claim 2 , wherein R 1 , R 2 and R 3 are a trimethylsilyl group, R 4 and R 5 are a methyl group or an ethyl group, and X is a C 1-4 alkylene group.

5 . The cobalt complex according to claim 1 , which is represented by the following formula (1AC):

wherein R 1 and R 2 are as defined for R 1 and R 2 in the above formula (A), and R 6 , R 7 , R 8 , Y and Z are as defined for R 6 , R 7 , R 8 , Y and Z in the above formula (C).

6 . The cobalt complex according to claim 5 , wherein R 1 and R 2 are a tri(C 1-4 alkyl)silyl group, R 6 and R 8 are a methyl group, R 7 is a hydrogen atom, Y is NR 9 , Z is NR 10 , and R 9 and R 10 are a C 1-4 alkyl group.

7 . The cobalt complex according to claim 5 , wherein R 1 and R 2 are a trimethylsilyl group, R 6 and R 8 are a methyl group, R 7 is a hydrogen atom, Y is NR 9 , Z is NR 10 , and R 9 and R 10 are a C 1-4 alkyl group.

8 . The cobalt complex according to claim 1 , which is represented by the following formula (1BC):

wherein R 3 , R 4 , R 5 and X are as defined for R 3 , R 4 , R 5 and X in the above formula (B), and R 6 , R 7 , R 8 , Y and Z are as defined for R 6 , R 7 , R 8 , Y and Z in the above formula (C).

9 . The cobalt complex according to claim 8 , wherein R 3 is a tri(C 1-4 alkyl)silyl group, R 4 and R 5 are a methyl group or an ethyl group, X is a C 1-4 alkylene group, R 6 and R 8 are a C 1-4 alkyl group, R 7 is a hydrogen atom, and Y and Z are an oxygen atom.

10 . The cobalt complex according to claim 8 , wherein R 3 is a trimethylsilyl group, R 4 and R 5 are a methyl group or an ethyl group, X is a C 1-4 alkylene group, R 6 and R 8 are a C 1-4 alkyl group, R 7 is a hydrogen atom, and Y and Z are an oxygen atom.

11 . A method for producing a cobalt complex represented by the following formula (1AB), which comprises reacting a bisamide complex represented by the following formula (2) and an aminoalkylamine represented by the following formula (3):

wherein R 1 and R 2 independently represent a C 1-6 alkyl group or a tri(C 1-6 alkyl)silyl group, D represents a neutral ligand, and n represents 0 or 1;

wherein R 3 represents a tri(C 1-6 alkyl)silyl group, R 4 and R 5 independently represent a C 1-6 alkyl group, and X represents a C 1-6 alkylene group;

wherein R 1 and R 2 are as defined for R 1 and R 2 in the above formula (A), R 3 , R 4 , R 5 and X are as defined for R 3 , R 4 , R 5 and X in the above formula (B).

12 . A method for producing a cobalt complex represented by the following formula (1AC), which comprises reacting a bisamide complex represented by the following formula (2) and a hetero atom-containing compound represented by the following formula (4):

wherein R 1 and R 2 independently represent a C 1-6 alkyl group or a tri(C 1-6 alkyl)silyl group, D represents a neutral ligand, and n represents 0 or 1:

wherein R 6 and R 8 independently represent a C 1-6 alkyl group, R 7 represents a hydrogen atom or a C 1-4 alkyl group, Y represents an oxygen atom or NR 9 , Z represents an oxygen atom or NR 10 and R 9 and R 10 independently represent a C 1-6 alkyl group;

wherein R 1 and R 2 are as defined for R 1 and R 2 in the above formula (A), and R 6 , R 7 , R 8 , Y and Z are as defined for R 6 , R 7 , R 8 , Y and Z in the above formula (C).

13 . A method for producing a cobalt complex represented by the following formula (1BC), which comprises reacting a cobalt complex represented by the following formula (1AB) and a hetero atom-containing compound represented by the following formula (4):

wherein R 1 and R 2 independently represent a C 1-6 alkyl group or a tri(C 1-6 alkyl)silyl group, R 3 represents a tri(C 1-6 alkyl)silyl group, R 4 and R 5 independently represent a C 1-4 alkyl group, and X represents a C 1-6 alkylene group;

wherein R 6 and R 8 independently represent a C 1-6 alkyl group, R 7 represents a hydrogen atom or a C 1-4 alkyl group, Y represents an oxygen atom or NR 9 , Z represents an oxygen atom or NR 10 , and R 9 and R 10 independently represent a C 1-6 alkyl group;

wherein R 3 , R 4 , R 5 and X are as defined for R 3 , R 4 , R 5 and X in the above formula (B), and R 6 , R 7 , R 8 , Y and Z are as defined for R 6 , R 7 , R 8 , Y and Z in the above formula (C).

14 . A method for producing a cobalt-containing thin film, which comprises using a cobalt complex represented by the following formula (1) for a vapor deposition method based on a chemical reaction:
L 1 -Co-L 2   (1)

wherein L 1 and L 2 which are d

Assignees

• Tosoh Corp
• Sagami Chem Res Inst

Inventors

• Oike Hiroyuki
• Hayakawa Teppei
• Yamamoto Yuki
• Furukawa Taishi
• Tada Ken-Ichi

Classifications

• C07C49/14

  Acetylacetone, i.e. 2,4-pentanedione · CPC title

• C23C16/4485

  by evaporation without using carrier gas in contact with the source material (C23C16/4486 takes precedence) · CPC title

• C07C49/12

  Ketones containing more than one keto group · CPC title

• C23C16/18

  from metallo-organic compounds · CPC title

• C23C16/45553

  characterized by the use of precursors specially adapted for ALD · CPC title