Cr-si sintered body

US2022017424A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2022017424-A1
Application numberUS-201917295191-A
CountryUS
Kind codeA1
Filing dateNov 18, 2019
Priority dateNov 22, 2018
Publication dateJan 20, 2022
Grant date

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

It is difficult for a Cr—Si-based sintered body composed of chromium silicide (CrSi2) and silicon (Si) to have high strength.Provided is a Cr—Si-based sintered body including Cr (chromium) and silicon (Si), in which the crystal structure attributed by X-ray diffraction is composed of chromium silicide (CrSi2) and silicon (Si), a CrSi2 phase is present at 60 wt % or more in a bulk, a density of the sintered body is 95% or more, and an average grain size of the CrSi2 phase is 60 μm or less.

First claim

Opening claim text (preview).

1 . A Cr—Si-based sintered body comprising Cr (chromium) and silicon (Si), wherein the crystal structure attributed by X-ray diffraction is composed of chromium silicide (CrSi 2 ) and silicon (Si), a CrSi 2 phase is present at 60 wt % or more in a bulk, a density of the sintered body is 95% or more, and an average grain size of the CrSi 2 phase is 60 μm or less. 2 . The Cr—Si-based sintered body according to claim 1 , wherein a flexural strength is 100 MPa or more. 3 . The Cr—Si-based sintered body according to claim 1 , wherein an amount of oxygen in the bulk is 1 wt % or less. 4 . A sputtering target comprising the Cr—Si-based sintered body according to claim 1 . 5 . A method for producing a thin film, the method comprising performing sputtering using the sputtering target according to claim 4 .

Assignees

Inventors

Classifications

  • Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy · CPC title

  • Heating rate · CPC title

  • Products showing a density-gradient · CPC title

  • Preparing or treating the powders individually or as batches {(pigments for ceramics C09C1/0009); preparing or treating macroscopic reinforcing agents for ceramic products, e.g. fibres; mechanical aspects section B} · CPC title

  • Silicides, e.g. molybdenum disilicide, iron silicide · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US2022017424A1 cover?
It is difficult for a Cr—Si-based sintered body composed of chromium silicide (CrSi2) and silicon (Si) to have high strength.Provided is a Cr—Si-based sintered body including Cr (chromium) and silicon (Si), in which the crystal structure attributed by X-ray diffraction is composed of chromium silicide (CrSi2) and silicon (Si), a CrSi2 phase is present at 60 wt % or more in a bulk, a density of …
Who is the assignee on this patent?
Tosoh Corp
What technology area does this patent fall under?
Primary CPC classification C23C14/3414. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Thu Jan 20 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).