Controlled printing surface and method of forming topographical features on a controlled printing surface

Patent metadata

Field	Value
Publication number	US-2022016809-A1
Application number	US-202117387791-A
Country	US
Kind code	A1
Filing date	Jul 28, 2021
Priority date	Jan 29, 2019
Publication date	Jan 20, 2022
Grant date	—

Abstract

Provided herein are methods of forming and optimizing cured features on a surface including controlling the surface upon which the cured features are applied. Additionally, a system for forming and processing the topographical features on the membrane is also described, along with mechanical features at specific system stations. More particularly, provided herein are methods of forming and optimizing topographical features applied to a membrane surface by controlling the membrane surface and by controlling the direction and magnitude of pressure applied to the membrane (substrate), as well as initially partially curing the topographical features, followed by fully curing of the topographical features to form the membrane having topographical spacing features formed thereon.

First claim

1 . A method of forming topographical features on a membrane surface comprising:
a. providing a stencil over a first surface of a membrane, the stencil having openings exposing the first surface for receiving a curable composition; b. applying positive pressure to a second opposing surface of the membrane to contact the first surface to the stencil; c. depositing one or more layers of curable composition into the stencil openings and onto the first surface to form topographical features, the openings defining an approximate shape and size of the topographical features; d. exposing the curable composition to conditions to partially cure the curable composition to a state sufficient to hold its topographical features but insufficient to cause adhesion to the stencil; and e. applying negative pressure to the second surface to separate the membrane and stencil without disturbing the partially cured topographical features;
wherein the positive pressure is sufficient to reduce a halo area around the topographical features by at least about 25%.

2 . The method of claim 1 , wherein the conditions to partially cure the curable composition the curable composition comprise exposing the membrane to a light source.

3 . The method of claim 2 , wherein the light from the light source is applied to the second surface.

4 . The method of claim 1 , further comprising f. exposing the partially cured topographical features to conditions to cure the curable composition to a solid state.

5 . The method of claim 4 , wherein the conditions to cure the curable composition to a solid state comprise exposing the membrane to a light source.

6 . The method of claim 1 , wherein the depositing step comprises depositing two or more layers of curable composition into the stencil openings and onto the first surface.

7 . The method of claim 1 , wherein the positive pressure is sufficient to reduce the halo area around the topographical features by at least about 40%.

8 . A method of forming topographical features on a membrane surface comprising:
a. providing an apparatus with a support for supporting a membrane having a first surface and a second opposing surface and capable of producing a positive pressure and a negative pressure on the surface of the membrane in contact with the support; b. placing the second surface of the membrane in contact with the support; c. providing a stencil over the first surface of the membrane, the stencil having openings exposing the first surface for receiving a curable composition; d. applying positive pressure to the second surface to contact the first surface to the stencil; e. depositing one or more layers of curable composition into the stencil openings and onto the first surface to form topographical features, the openings defining an approximate shape and size of the topographical features; f. exposing the curable composition to conditions to partially cure the curable composition to a state sufficient to hold its topographical features but insufficient to cause adhesion to the stencil; and g. applying negative pressure to the second surface to separate the membrane and stencil without disturbing the partially cured topographical features; wherein the positive pressure is sufficient to reduce a halo area around the topographical features by at least about 25%.

9 . The method of claim 8 , wherein the conditions to partially cure the curable composition comprise exposing the membrane to a light source.

10 . The method of claim 9 , wherein the light from the light source is applied to the second surface.

11 . The method of claim 8 , further comprising h. exposing the partially cured topographical features to conditions to cure the curable composition to a solid state.

12 . The method of claim 11 , wherein the conditions to cure the curable composition to a solid state comprise exposing the membrane to a light source.

13 . The method of claim 8 , further comprising removing the membrane from the support.

14 . The method of claim 13 , wherein positive pressure is applied to second surface during removing the membrane from the support.

15 . The method of claim 13 , wherein step h. is carried out before, during, or after removing the membrane from the support.

16 . The method of claim 8 , wherein positive pressure is applied to the second surface during the placing the second surface of the membrane in contact with the support step.

17 . The method of claim 8 , wherein negative pressure is applied to the second surface after the placing the membrane on the support step and during the providing a stencil over the first surface step.

18 . The method of claim 8 , wherein the depositing step comprises depositing two or more layers of curable composition into the stencil openings and onto the first surface.

19 . The method of claim 8 , wherein the positive pressure is sufficient to reduce the halo area around the topographical features by at least about 25%.

20 . A system for forming a pattern of features on a surface of a substrate, the system comprising:
A. a pre-cure station, comprising:
i. a first support for supporting a substrate with two opposing surfaces;
ii. a deposition device that deposits a pattern of a curable composition on at least one surface of the substrate; and
iii. a partial cure device that partially cures the pattern of the curable composition to form a partially cured pattern of the curable composition on the at least one surface of the substrate;
B. a first transport device that transports the substrate from the pre-cure station to a full-cure station; and C. the full-cure station, comprising:
i. a second support for supporting the substrate with the partially cured pattern of the curable composition on the at least one surface of the substrate;
ii. a full cure device that fully cures the partially cured pattern of the curable composition to form the pattern of features on the at least one surface of the substrate.

21 . The system of claim 20 , wherein the first support comprises a vacuum and/or pressure table.

22 . The system of claim 21 , wherein the vacuum and/or pressure table provides a back pressure which seals the substrate against the stencil to prevent leakage of the adhesive beyond the desired pattern.

23 . The system of claim 22 , wherein the vacuum and/or pressure table provides a vacuum which holds down the substrate to allow removal-force to be applied for removal of the pre-cured features from the stencil.

24 . The system of claim 20 , wherein the deposition device comprises:
A. a stencil having openings for receiving the curable composition; B. a positioning device that positions the stencil above and in contact with the at least one surface of the substrate on which the pattern of features is to be positioned and also removes the stencil from the at least one surface of the substrate on which the pattern of features is to be positioned; and C. a dispensing device that dispenses the curable composition into the stencil openings and onto the at least one surface of the substrate on which the pattern of features is to be positioned.

25 . The system of claim 24 , wherein the dispensing device comprises dispensing valves and a squeegee.

26 . The system of claim 24 , wherein the stencil comprises a material selected from the group consisting of steel, aluminum, stainless steel, polymeric coated met

Assignees

• Henkel IP & Holding GmbH

Inventors

• Izzo Michael M
• Johnson Ivan Gustaf

Classifications

• G03F7/0002 Primary

  Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping · CPC title

• B01D2323/52

  Use of a mould · CPC title

• B01D2323/40

  in-situ membrane formation · CPC title

• B01D2323/345

  UV-treatment · CPC title

• B01D2323/24

  Use of template or surface directing agents [SDA] · CPC title