Method of Detecting A Concealed Pattern

Patent metadata

Field	Value
Publication number	US-2022012555-A1
Application number	US-201917293813-A
Country	US
Kind code	A1
Filing date	Nov 12, 2019
Priority date	Nov 13, 2018
Publication date	Jan 13, 2022
Grant date	—

Abstract

A method for detecting a component including a concealed pattern includes: detecting infrared electromagnetic radiation reflected or emitted by a component including a first pattern, the component including: a substrate; the first pattern disposed over at least a portion of the substrate; an optional primer layer disposed between at least a portion of the substrate and at least a portion of the first pattern; and a first visibly opaque layer including an infrared transparent pigment, the first visibly opaque layer disposed over at least a portion of the first pattern; and comparing the reflectivity and/or absorbance of infrared electromagnetic radiation by the first pattern at one wavelength to the reflectivity and/or absorbance by the primer layer and/or the substrate at the same wavelength.

First claim

The invention claimed is:

1 . A method for detecting a component including a concealed pattern, comprising:
detecting infrared electromagnetic radiation reflected or emitted by a component including a first pattern, the component comprising:
a substrate;
the first pattern disposed over at least a portion of the substrate;
an optional primer layer disposed between at least a portion of the substrate and at least a portion of the first pattern; and
a first visibly opaque layer comprising an infrared transparent pigment, the first visibly opaque layer disposed over at least a portion of the first pattern; and
comparing the reflectivity and/or absorbance of infrared electromagnetic radiation by the first pattern at one wavelength to the reflectivity and/or absorbance by the primer layer and/or the substrate at the same wavelength.

2 . The method of claim 1 , further comprising:
directing, from an infrared source, infrared electromagnetic radiation having a predetermined wavelength in the infrared region at the component including the first pattern.

3 . The method of claim 1 , further comprising:
based on the detected infrared electromagnetic radiation, identifying the first pattern, an orientation of the first pattern, a condition of the pattern, and/or a distance to the first pattern.

4 . The method of claim 3 , further comprising:
determining, with at least one processor and based on the identified first pattern, component identifying information associated with the component, orientation of the first pattern, a condition of the pattern, and/or distance to the first pattern.

5 . The method of claim 1 , wherein the first visibly opaque layer is substantially free of an infrared absorbing pigment and/or an infrared reflective pigment.

6 . The method of claim 1 , wherein the first pattern comprises an infrared reflective pigment and the primer layer is substantially free of any infrared reflective pigment.

7 . The method of claim 1 , wherein the primer layer comprises an infrared reflective pigment and the first pattern is substantially free of any infrared reflective pigment.

8 . The method of claim 1 , wherein the first pattern comprises a machine readable code.

9 . The method of claim 1 , wherein the first pattern is formed from a surface deterioration of the substrate of the component.

10 . The method of claim 1 , wherein the substrate comprises a vehicle component or vehicle surroundings, a surface in a virtual reality/augmented reality (VR/AR) environment, packaging, a label, and/or an identification component.

11 . The method of claim 1 , wherein the component further comprises a second pattern disposed over the substrate,
wherein the reflectivity and/or absorbance of infrared electromagnetic radiation by the first pattern at one wavelength differs from the reflectivity and/or absorbance by the second pattern at the same wavelength.

12 . The method of claim 11 , further comprising:
directing, from an infrared source, infrared electromagnetic radiation having a predetermined wavelength in the infrared region at the component including the second pattern; based on the detected infrared electromagnetic radiation, identifying the second pattern, an orientation of the second pattern, a condition of the pattern, and/or a distance to the second pattern.

13 . The method of claim 11 , wherein the first pattern is disposed directly over a layer of the component, the layer including the substrate or a coating layer of the component and beneath the first visibly opaque layer; and the second pattern is disposed directly over a different layer of the component compared to the first pattern, and the second pattern is disposed beneath the first visibly opaque layer.

14 . The method of claim 11 , wherein the first pattern reflects or emits infrared electromagnetic radiation in the range of 800-1000 nm and the second pattern reflects or emits infrared electromagnetic radiation in the range of 1600-2500 nm.

15 . The method of claim 1 , wherein the component further comprises a second visibly opaque layer comprising an infrared transparent pigment, the second visibly opaque layer disposed over at least a portion of the first pattern,
wherein the first visibly opaque layer and the second visibly opaque layer are transparent at different wavelengths from each another in the infrared electromagnetic spectrum.

16 . The method of claim 15 , wherein the second visibly opaque layer comprises titanium dioxide.

17 . The method of claim 16 , wherein the titanium dioxide has an average particle size from 0.2-0.5 μm.

18 . A system for detecting a component including a concealed pattern, comprising:
(a) a first component comprising:
a substrate;
a first pattern disposed over at least a portion of the substrate;
an optional primer layer disposed between at least a portion of the substrate and at least a portion of the first pattern; and
a first visibly opaque layer comprising an infrared transparent pigment, the first visibly opaque layer disposed over at least a portion of the first pattern,
wherein the reflectivity and/or absorbance of infrared electromagnetic radiation by the first pattern at one wavelength differs from the reflectivity and/or absorbance by the primer layer and/or the substrate at the same wavelength; and
(b) a second component comprising an infrared detector that detects infrared electromagnetic radiation reflected or emitted from the first component.

19 . The system of claim 18 , wherein the second component further comprises an infrared source that directs infrared electromagnetic radiation toward the first component.

20 . The system of claim 19 , wherein the second component further comprises a computing device that identifies, with at least one processor, the first pattern based on the reflected infrared electromagnetic radiation and determines, with at least one processor and based on the identified first pattern, component identifying information associated with the first component, orientation of the first pattern, a condition of the pattern, and/or distance to the first pattern.

21 . A component including a concealed pattern, comprising:
a substrate; a first pattern disposed over at least a portion of the substrate; a second pattern disposed over at least a portion of the substrate; an optional primer layer disposed between at least a portion of the substrate and at least a portion of the first pattern or the second pattern; and a first visibly opaque layer comprising an infrared transparent pigment, the first visibly opaque layer disposed over at least a portion of the first pattern and the second pattern, wherein the reflectivity and/or absorbance of infrared electromagnetic radiation by the first pattern at one wavelength differs from the reflectivity and/or absorbance by the second pattern at the same wavelength, and wherein the first pattern is disposed directly over a layer of the component, the layer including the substrate or a coating layer of the component and beneath the first visibly opaque layer; and the second pattern is disposed directly over a different layer of the component compared to the first pattern, and the second pattern is disposed beneath the first visibly opaque layer, wherein the reflectivity and/or absorbance of infrared electromagnetic radiation by the first pattern at one wavelength differs from the reflectivity and/or absorbance by the layer over which the first pattern is directly disposed, a

Assignees

• Ppg Ind Ohio Inc

Inventors

• Duarte Nicolas B
• Brown Zachary J
• Choreno Juan F
• Galvan-Miyoshi Julian M
• Laird Darin W
• Morones Dobarganes Alejandro
• Olivares Lecona Jose Alberto

Classifications

• C09D7/61

  inorganic · CPC title

• C09D7/41

  Organic pigments; Organic dyes · CPC title

• C09D5/002

  Priming paints (C09D5/08 takes precedence) · CPC title

• G07D7/005

  Testing security markings invisible to the naked eye, e.g. verifying thickened lines or unobtrusive markings or alterations · CPC title

• G07D7/12

  Visible light, infrared or ultraviolet radiation · CPC title