Composition, resist underlayer film, method of forming resist underlayer film, method of producing patterned substrate, and compound

Patent metadata

Field	Value
Publication number	US-2022011672-A1
Application number	US-202117482557-A
Country	US
Kind code	A1
Filing date	Sep 23, 2021
Priority date	Mar 28, 2019
Publication date	Jan 13, 2022
Grant date	—

Abstract

The composition contains: a compound which has a group represented by formula (1); and a solvent. In the formula (1), R 1 and R 2 each independently represent a substituted or unsubstituted aryl group having 6 to 30 ring atoms or a substituted or unsubstituted heteroaryl group having 5 to 30 ring atoms; R 3 represents a hydrogen atom or a substituted or unsubstituted monovalent aliphatic hydrocarbon group having 1 to 10 carbon atoms; and * denotes a bonding site to a part other than the group represented by the following formula (1) in the compound.

First claim

What is claimed is:

1 . A composition comprising:
a compound which comprises a group represented by formula (1); and a solvent,

wherein, in the formula (1), R 1 and R 2 each independently represent a substituted or unsubstituted aryl group having 6 to 30 ring atoms or a substituted or unsubstituted heteroaryl group having 5 to 30 ring atoms; R 3 represents a hydrogen atom or a substituted or unsubstituted monovalent aliphatic hydrocarbon group having 1 to 10 carbon atoms; and * denotes a binding site to a part other than the group represented by the formula (1) in the compound.

2 . The composition according to claim 1 , wherein the compound is represented by formula (2):

wherein, in the formula (2), R 1 and R 2 each independently represent a substituted or unsubstituted aryl group having 6 to 30 ring atoms or a substituted or unsubstituted heteroaryl group having 5 to 30 ring atoms; R 3 represents a hydrogen atom or a substituted or unsubstituted monovalent aliphatic hydrocarbon group having 1 to 10 carbon atoms; n is an integer of 1 to 10, wherein in a case in which n is no less than 2, a plurality of R 1 s are identical or different from each other, a plurality of R 1 s are identical or different from each other, and a plurality of R 3 s are identical or different from each other; and in a case in which n is 1, R 4 represents a hydrogen atom or a monovalent organic group having 1 to 40 carbon atoms, and in a case in which n is no less than 2, R 4 represents an organic group having a valency of n and having 1 to 40 carbon atoms.

3 . The composition according to claim 2 , wherein n in the formula (2) is no less than 2.

4 . The composition according to claim 1 , wherein the substituted or unsubstituted monovalent aliphatic hydrocarbon group which is represented by R 3 is a substituted or unsubstituted monovalent chain hydrocarbon group.

5 . The composition according to claim 1 , wherein R 3 represents a hydrogen atom.

6 . The composition according to claim 1 , wherein at least one of R 1 and R 2 represents a group represented by formula (3):

wherein, in the formula (3), R 5 represents a hydrogen atom or a monovalent aliphatic hydrocarbon group having 1 to 10 carbon atoms; Ar represents a group obtained by removing (m +1) hydrogen atoms from an aromatic ring having 6 to 30 ring atoms; m is an integer of 1 to 3; ** denotes a binding site to a carbon atom to which R 1 or R 2 bonds in the formula (1) or the formula (2); and in a case in which m is no less than 2, a plurality of R 5 s are identical or different from each other.

7 . The composition according to claim 1 , wherein a proportion of hydrogen atoms with respect to all atoms constituting the compound is no greater than 7% by mass.

8 . The composition according to claim 1 , wherein a molecular weight of the compound is no less than 300 and no greater than 3,000.

9 . A method of forming a resist underlayer film, the method comprising:
applying the composition according to claim 1 directly or indirectly on a substrate.

10 . A method of producing a patterned substrate, the method comprising:
forming a resist underlayer film directly or indirectly on a substrate by applying the composition according to claim 1 ; forming a resist pattern directly or indirectly on the resist underlayer film; and carrying out etching using the resist pattern as a mask.

11 . The method according to claim 12 , further comprising, before forming the resist pattern, forming a silicon-containing film directly or indirectly on the resist underlayer film formed.

12 . A compound represented by formula (2):

wherein, in the formula (2), R 1 and R 2 each independently represent a substituted or unsubstituted aryl group having 6 to 30 ring atoms or a substituted or unsubstituted heteroaryl group having 5 to 30 ring atoms; R 3 represents a hydrogen atom or a substituted or unsubstituted monovalent aliphatic hydrocarbon group having 1 to 10 carbon atoms; n is an integer of 1 to 10, wherein in a case in which n is no less than 2, a plurality of les are identical or different from each other, a plurality of les are identical or different from each other, and a plurality of R 3 s are identical or different from each other; and in a case in which n is 1, R 4 represents a hydrogen atom or a monovalent organic group having 1 to 40 carbon atoms, and in a case in which n is no less than 2, R 4 represents an organic group having a valency of n and having 1 to 40 carbon atoms.

Assignees

• Jsr Corp

Inventors

• Nakafuji Shin-Ya
• Taniguchi Tomoaki
• Takanashi Kazunori

Classifications

• C07C211/54

  having amino groups bound to two or three six-membered aromatic rings · CPC title

• G03F7/20

  Exposure; Apparatus therefor (photographic printing apparatus for making copies G03B27/00) · CPC title

• G03F7/11 Primary

  having cover layers or intermediate layers, e.g. subbing layers {(G03F7/091 - G03F7/093, B41N3/03 take precedence)} · CPC title

• C07C39/23

  polycyclic, containing six-membered aromatic rings and other rings, with unsaturation outside the aromatic rings · CPC title

• G03F7/26

  Processing photosensitive materials; Apparatus therefor (G03F7/12 - G03F7/24 take precedence) · CPC title