Resist composition, method of forming resist pattern, compound, and acid diffusion-controlling agent

Patent metadata

Field	Value
Publication number	US-2022011665-A1
Application number	US-202117304442-A
Country	US
Kind code	A1
Filing date	Jun 21, 2021
Priority date	Jul 7, 2020
Publication date	Jan 13, 2022
Grant date	—

Abstract

A resist composition that contains a base material component exhibiting changed solubility in a developing solution under action of acid and a compound (D0) represented by General Formula (d0), in which R01, R02, R03, and R04 each independently represents a hydrogen atom, a hydroxy group, a halogen atom, or an alkyl group; alternatively, R01 and R02, R02 and R03, or R03 and R04 are bonded to each other to form an aromatic ring; R05 represents a hydrogen atom or an alkyl group; Y represents a group that forms an alicyclic group together with a carbon atom *C; provided that at least one of the carbon atoms that form the alicyclic group is substituted with an ether bond, a thioether bond, a carbonyl group, a sulfinyl group, or a sulfonyl group; m represents an integer of 1 or more, and Mm+ represents an m-valent organic cation

First claim

What is claimed is:

1 . A resist composition which generates an acid upon exposure and exhibits changed solubility in a developing solution under action of acid, the resist composition comprising:
a base material component (A) exhibiting changed solubility in a developing solution under action of acid; and a compound (D0) represented by General Formula (d0):

wherein R 01 , R 02 , R 03 , and R 04 each independently represent a hydrogen atom, a hydroxy group, a halogen atom, or an alkyl group having 1 to 5 carbon atoms, alternatively, R 01 and R 02 , R 02 and R 03 , or R 03 and R 04 are bonded to each other to form an aromatic ring, the aromatic ring may have a substituent, R 05 represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, Y represents a group that forms an alicyclic group together with a carbon atom *C, the alicyclic group that is formed by Y may have a substituent, where at least one of carbon atoms that form the alicyclic group is substituted with an ether bond, a thioether bond, a carbonyl group, a sulfinyl group, or a sulfonyl group, and m represents an integer of 1 or more, where M m+ represents an m-valent organic cation.

2 . The resist composition according to claim 1 , wherein a content of the compound (D0) is in a range of 1 to 35 parts by mass with respect to 100 parts by mass of the base material component (A).

3 . The resist composition according to claim 1 , further comprising an acid generator component (B) generating an acid upon exposure, provided that the compound (D0) is excluded from the acid generator component (B).

4 . The resist composition according to claim 1 , wherein the base material component (A) contains a resin component (A1), and the resin component (A1) has a constitutional unit (a1) that contains an acid-decomposable group having a polarity which is increased by action of an acid.

5 . A method of forming a resist pattern, comprising:
forming a resist film on a support using the resist composition according to claim 1 ; exposing the resist film; and developing the exposed resist film to form a resist pattern.

6 . The method of forming a resist pattern according to claim 5 , wherein the resist film is exposed with extreme ultraviolet (EUV) rays or electron beam (EB).

7 . A compound represented by General Formula (d0):

wherein R 01 , R 02 , R 03 , and R 04 each independently represents a hydrogen atom, a hydroxy group, a halogen atom, or an alkyl group having 1 to 5 carbon atoms, alternatively, R 01 and R 02 , R 02 and R 03 , or R 03 and R 04 are bonded to each other to form an aromatic ring, the aromatic ring may have a substituent, R 05 represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, Y represents a group that forms an alicyclic group together with a carbon atom *C, the alicyclic group that is formed by Y may have a substituent, where at least one of carbon atoms that form the alicyclic group is substituted with an ether bond, a thioether bond, a carbonyl group, a sulfinyl group, or a sulfonyl group, and m represents an integer of 1 or more, where M m+ represents an m-valent organic cation.

8 . An acid diffusion-controlling agent comprising the compound according to claim 7 .

Assignees

• Tokyo Ohka Kogyo Co Ltd

Inventors

• Nguyen Khanhtin

Classifications

• G03F7/0045 Primary

  with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors · CPC title

• G03F7/0382

  the macromolecular compound being present in a chemically amplified negative photoresist composition · CPC title

• G03F7/0392

  the macromolecular compound being present in a chemically amplified positive photoresist composition · CPC title

• G03F7/004 Primary

  Photosensitive materials (G03F7/12, G03F7/14 take precedence) · CPC title

• G03F7/2004

  characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light · CPC title