Photosensitive, inorganic ligand-capped inorganic nanocrystals

Patent metadata

Field	Value
Publication number	US-2022011664-A1
Application number	US-201917283457-A
Country	US
Kind code	A1
Filing date	Oct 11, 2019
Priority date	Oct 17, 2018
Publication date	Jan 13, 2022
Grant date	—

Abstract

Ligand-capped inorganic particles, dispersions of the ligand-capped inorganic particles, and films composed of the ligand-capped inorganic particles are provided. Also provided are methods of patterning the films and electronic, photonic, and optoelectronic devices that incorporate the films. The ligands include bifunctional ligands and two-component ligand systems that include a photosensitive group, cation, or molecule.

First claim

1 . Ligand-capped inorganic crystals comprising:
inorganic crystals, each crystal having a surface; alkyl carbamate anions bound to the surfaces of the inorganic crystals; and photosensitive cations or photosensitive non-ionic molecules associated with the inorganic crystals.

2 . The ligand-capped inorganic crystals of claim 1 , wherein the photosensitive cations or photosensitive non-ionic molecules are photoacid generators.

3 . A solid film comprising the ligand-capped inorganic crystals of claim 1 on a substrate.

4 . A method of patterning the film of claim 1 , the method comprising:
irradiating a first portion of the film with radiation, wherein the interaction between the radiation and the photosensitive cations or photosensitive non-ionic molecules results in the chemical modification of the film, while preventing a second portion of the film from being irradiated by the radiation; and contacting the film with a solvent that dissolves the second portion of the film, but not the first portion of the film.

5 . Ligand-capped inorganic crystals comprising:
inorganic crystals, each crystal having a surface; anions bound to the surfaces of the inorganic crystals; and 2-phenyl-2-(-5-((tosyloxy)imino)thiophen-2-ylidene)acetonitrile molecules associated with the inorganic crystals.

6 . The ligand-capped inorganic crystals of claim 5 , wherein the anions comprise metal halide or metal chalcogenide anions.

7 . A solid film comprising the ligand-capped inorganic crystals of claim 5 on a substrate.

8 . A method of patterning the film of claim 7 , the method comprising:
irradiating a first portion of the film with radiation, wherein the interaction between the radiation and the 2-phenyl-2-(-5-((tosyloxy)imino)thiophen-2-ylidene)acetonitrile molecules results in the chemical modification of the film, while preventing a second portion of the film from being irradiated by the radiation; and
contacting the film with a solvent that dissolves the second portion of the film, but not the first portion of the film.

9 . Ligand-capped inorganic crystals comprising:
inorganic crystals, each crystal having a surface; anions bound to the surfaces of the inorganic crystals; and 1,2-naphthoquinonediazide-4-sulfonyl chloride molecules associated with the inorganic crystals.

10 . The ligand-capped inorganic crystals of claim 9 , wherein the anions comprise metal halide or metal chalcogenide anions.

11 . A solid film comprising the ligand-capped inorganic crystals of claim 9 on a substrate.

12 . A method of patterning the film of claim 11 , the method comprising:
irradiating a first portion of the film with radiation, wherein the interaction between the radiation and the 1,2-naphthoquinonediazide-4-sulfonyl chloride molecules results in the chemical modification of the film, while preventing a second portion of the film from being irradiated by the radiation; and contacting the film with a solvent that dissolves the second portion of the film, but not the first portion of the film.

13 .- 26 . (canceled)

Assignees

• Univ Chicago

Inventors

• Talapin Dmitri V
• Wang Yuanyuan
• Pan Jia-Ahn
• Wu Haoqi

Classifications

• G03F7/0043

  Chalcogenides; Silicon, germanium, arsenic or derivatives thereof; Metals, oxides or alloys thereof (G03F7/0044 takes precedence) · CPC title

• G03F7/0045 Primary

  with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors · CPC title

• G03F7/0042 Primary

  with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists (G03F7/075 takes precedence) · CPC title

• G03F7/20

  Exposure; Apparatus therefor (photographic printing apparatus for making copies G03B27/00) · CPC title

• G03F7/008

  Azides (G03F7/075 takes precedence) · CPC title