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US2022010170A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2022010170-A1
Application numberUS-201917293665-A
CountryUS
Kind codeA1
Filing dateNov 11, 2019
Priority dateNov 13, 2018
Publication dateJan 13, 2022
Grant date

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The present invention relates to a process for preparing a thin film on a substrate in which a first precursor composition (FPC) and a second precursor composition (SPC) are combined, a thin layer of the combined first precursor composition (FPC) and second precursor composition (SPC) is formed on a substrate and the thin layer is cured, an article comprising said thin layer, a composition comprising said first precursor composition (FPC) and said second precursor composition (SPC), a kit-of-parts comprising said first precursor composition (FPC) and said second precursor composition (SPC) in two vessels and the use of said composition or kit-of-parts for preparing a thin film on a substrate and for preparing an optical or electrical coating.

First claim

Opening claim text (preview).

1 .- 16 . (canceled) 17 . Process for preparing a thin film on a substrate, the process comprising the steps of a) preparing a first precursor composition (FPC) in a first vessel, the preparation comprising the following steps: a1) providing one or more metal or metalloid compound(s) according to the following formula (I) M 1 (OR 1 ) n R 2 m   (I)  wherein  M 1 is a metal or metalloid with a valence z  R 1 is each independently selected from a C 1 to C 10 organyl or organoheteryl group;  R 2 is each independently selected from a C 1 to C 20 organyl, organoheteryl, fluorinated organyl or fluorinated organoheteryl group  n is 1 to z  m is z−1 to 0  n+m is z a2) at least partial hydrolysation of the M 1 (OR 1 )-moieties and polymerizing the one or more metal or metalloid compound according to formula (I); b) preparing a second precursor composition (SPC) in a second vessel, the preparation comprising the following steps: b1) providing a fluoropolyether silane comprising hydrolysable groups (PFS); c) combining the first precursor composition (FPC) with the second precursor composition (SPC); d) forming a thin layer on the substrate; e) optionally partially or completely removing solvent, if present, after step d); f) curing the intermediate product obtained in step e), if present, or step d), if step e) is not present thereby obtaining a thin film. 18 . The process according to claim 17 , wherein the one or more metal or metalloid compound(s) according to formula (I) is/are free from fluorine. 19 . The process according to claim 17 , wherein one or more of the one or more metal or metalloid compound(s) according to formula (I) comprise at least one fluorine atom in the R 2 residue of formula (I). 20 . The process according to claim 17 , wherein the thickness of the thin film after step f) is 15.0 to 120 nm. 21 . The process according to claim 17 , wherein, in case solvents are present, the amount of fluorine-containing solvents based on the total weight of the solvents present is equal or less than 75 wt. %. 22 . The process according to claim 17 , wherein in step c) the weight ratio between the solids contents of the first precursor composition (FPC) and the solids content of the second precursor composition (SPC) is between 100:1.0 to 0.5:1.0. 23 . The process according to claim 17 , wherein M 1 is selected from Si, Ge, Sb, Ti, Zr, Al, Sn, W, Se, Cr, Ag or Ni. 24 . The process according to claim 17 , wherein step d) is effected by dip coating, slot coating, combined slot+spin coating, spin coating, spray coating, ink-jet printing, curtain coating, roller coating, roll-to-roll coating, screen printing or using a bar, a brush or by rubbing. 25 . The process according to claim 17 , wherein the fluoropolyether silane comprising hydrolysable groups (PFS) is selected from compounds according to the following formula (III) R 5 —R F -Q-Si(OR 3 ) o R 4 p   (III) wherein R F is a fluoropolyether group; Q is a divalent linking group; R 3 is each independently selected from a C 1 to C 10 organyl or organoheteryl group; R 4 is each independently selected from a C 1 to C 20 organyl or organoheteryl group o is 1, 2 or 3 p is 0, 1 or 2 o+p is 3 R 5 is H, C x F 2x+1 with x being 1 to 10 or -Q-Si(OR 3 ) o R 4 p , with Q, R 3 , R 4 , o and p as defined above, whereby in each occurrence Q, R 3 , R 4 , o and p being present may be the same or different. 26 . The process according to claim 17 , wherein in step a2) a compound according to the following formula (II) is present R 7′ t′ (OR 6′ ) s′ M 2− Y-M 2′ (OR 6 ) s R 7 t   (II) wherein M 2 , M 2′ are the same or different and are each independently selected from a metal or metalloid with a valence x; Y is a divalent linking group; R 6 , R 6′ are the same or different and are each independently selected from a C 1 to C 10 organyl or organoheteryl group; R 7 , R 7′ are the same or different and are each independently selected from a C 1 to C 20 organyl or organoheteryl group; s, s′ are the same or different and are each independently selected from 1 to x−1; t, t′ are the same or different and are each independently selected from is x−2 to 0; s+t is x−1; and s′+t′ is x−1. 27 . An article comprising the thin film obtainable by the process according to claim 17 . 28 . The article of claim 27 , being an optically or electrically coated article. 29 . A composition comprising a first precursor composition (FPC) and a second precursor composition (SPC), the first precursor composition (FPC) being a polymerized metal or metalloid compound according to formula (I) M 1 (OR 1 ) n R 2 m   (I) wherein M 1 is a metal or metalloid with a valence z R 1 is each independently selected from a C 1 to C 10 organyl or organoheteryl group; R 2 is each independently selected from a C 1 to C 20 organyl, organoheteryl, fluorinated organyl or fluorinated organoheteryl group n is 1 to z−1 m is 1 to z−1 n+m is z whereby the polymerization is effected by at least partial hydrolysation of the M 1 (OR 1 )-moieties; the second precursor composition (SPC) being obtainable by b1) providing a fluoropolyether silane comprising hydrolysable groups (PFS). 30 . A kit-of-parts comprising a first precursor composition (FPC) in a first vessel and a second precursor composition (SPC) in a second vessel, the first precursor composition (FPC) being a polymerized metal or metalloid compound according to formula (I) M 1 (OR 1 ) n R 2 m   (I) wherein M 1 is a metal or metalloid with a valence z R 1 is each independently selected from a C 1 to C 10 organyl, organoheteryl, fluorinated organyl or fluorinated organoheteryl group; R 2 is each independently selected from a C 1 to C 20 organyl or organoheteryl group n is 1 to z−1 m is 1 to z−1 n+m is z whereby the polymerization is effected by at least partial hydrolysation of the M 1 (OR 1 )-moieties; the second precursor composition (SPC) being obtainable by b1) providing a fluoropolyether silane comprising hydrolysable groups (PFS). 31 . Use of the composition according to claim 29 or the kit-of-parts according to claim 30 for preparing a thin film on a substrate. 32 . Use of the composition according to claim 29 or the kit-of-parts according to claim 30 for preparing an optical or electrical coating.

Assignees

Inventors

Classifications

  • Glass · CPC title

  • containing silicon · CPC title

  • Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced {(electrically insulating plastics, resins or waxes H01B3/30)}; Filling pastes · CPC title

  • After-treatment · CPC title

  • B05D5/00Primary

    Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures · CPC title

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What does patent US2022010170A1 cover?
The present invention relates to a process for preparing a thin film on a substrate in which a first precursor composition (FPC) and a second precursor composition (SPC) are combined, a thin layer of the combined first precursor composition (FPC) and second precursor composition (SPC) is formed on a substrate and the thin layer is cured, an article comprising said thin layer, a composition comp…
Who is the assignee on this patent?
Basf Se
What technology area does this patent fall under?
Primary CPC classification B05D5/00. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Thu Jan 13 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).