Methods utilizing active quantum chemistry
US-2024317612-A1 · Sep 26, 2024 · US
US2022008906A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2022008906-A1 |
| Application number | US-201917292682-A |
| Country | US |
| Kind code | A1 |
| Filing date | Nov 20, 2019 |
| Priority date | Dec 4, 2018 |
| Publication date | Jan 13, 2022 |
| Grant date | — |
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Provided is a semiconductor photoelectrode which maintains a light energy conversion efficiency for a long time. In the semiconductor photoelectrode, using a conductive substrate including a III-V group compound semiconductor, a semiconductor thin film including a III-V group compound semiconductor having a photocatalytic function is disposed on the substrate, and an oxygen generation co-catalyst layer having an oxygen generation co-catalytic function for the semiconductor thin film is disposed on the semiconductor thin film. Between the semiconductor thin film and the oxygen generation co-catalyst layer, a semiconductor thin film including a III-V group compound semiconductor having a lattice constant smaller than that of the semiconductor thin film in a plane perpendicular to a crystal growth direction is disposed.
Opening claim text (preview).
1 . A semiconductor photoelectrode comprising: a conductive substrate comprising a III-V group compound semiconductor; a first semiconductor layer disposed on the substrate and comprising a III-V group compound semiconductor having a photocatalytic function; and; an oxygen generation co-catalyst layer disposed on the first semiconductor layer and having an oxygen generation co-catalytic function for the first semiconductor layer. 2 . The semiconductor photoelectrode according to claim 1 , further comprising a second semiconductor layer which is disposed between the first semiconductor layer and the oxygen generation co-catalyst layer and includes a III-V group compound semiconductor having a lattice constant smaller than a lattice constant of the first semiconductor layer in a plane perpendicular to a crystal growth direction. 3 . The semiconductor photoelectrode according to claim 1 , wherein the substrate and the first semiconductor layer are n-type semiconductors. 4 . The semiconductor photoelectrode according to claim 2 , wherein the substrate and the first semiconductor layer are n-type semiconductors.
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