Semiconductor Optical Electrode

US2022008906A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2022008906-A1
Application numberUS-201917292682-A
CountryUS
Kind codeA1
Filing dateNov 20, 2019
Priority dateDec 4, 2018
Publication dateJan 13, 2022
Grant date

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Provided is a semiconductor photoelectrode which maintains a light energy conversion efficiency for a long time. In the semiconductor photoelectrode, using a conductive substrate including a III-V group compound semiconductor, a semiconductor thin film including a III-V group compound semiconductor having a photocatalytic function is disposed on the substrate, and an oxygen generation co-catalyst layer having an oxygen generation co-catalytic function for the semiconductor thin film is disposed on the semiconductor thin film. Between the semiconductor thin film and the oxygen generation co-catalyst layer, a semiconductor thin film including a III-V group compound semiconductor having a lattice constant smaller than that of the semiconductor thin film in a plane perpendicular to a crystal growth direction is disposed.

First claim

Opening claim text (preview).

1 . A semiconductor photoelectrode comprising: a conductive substrate comprising a III-V group compound semiconductor; a first semiconductor layer disposed on the substrate and comprising a III-V group compound semiconductor having a photocatalytic function; and; an oxygen generation co-catalyst layer disposed on the first semiconductor layer and having an oxygen generation co-catalytic function for the first semiconductor layer. 2 . The semiconductor photoelectrode according to claim 1 , further comprising a second semiconductor layer which is disposed between the first semiconductor layer and the oxygen generation co-catalyst layer and includes a III-V group compound semiconductor having a lattice constant smaller than a lattice constant of the first semiconductor layer in a plane perpendicular to a crystal growth direction. 3 . The semiconductor photoelectrode according to claim 1 , wherein the substrate and the first semiconductor layer are n-type semiconductors. 4 . The semiconductor photoelectrode according to claim 2 , wherein the substrate and the first semiconductor layer are n-type semiconductors.

Assignees

Inventors

Classifications

  • Electrogenerative processes, i.e. processes for producing compounds in which electricity is generated simultaneously · CPC title

  • C25B1/55Primary

    Photoelectrolysis · CPC title

  • Cells or assemblies of cells comprising photoelectrodes; Assemblies of constructional parts thereof · CPC title

  • characterised by multilayer electrocatalytic coatings · CPC title

  • with diaphragms · CPC title

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What does patent US2022008906A1 cover?
Provided is a semiconductor photoelectrode which maintains a light energy conversion efficiency for a long time. In the semiconductor photoelectrode, using a conductive substrate including a III-V group compound semiconductor, a semiconductor thin film including a III-V group compound semiconductor having a photocatalytic function is disposed on the substrate, and an oxygen generation co-cataly…
Who is the assignee on this patent?
Nippon Telegraph & Telephone
What technology area does this patent fall under?
Primary CPC classification C25B1/55. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Thu Jan 13 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).