Resin/phosphor composite scintillator, and scintillator array

US2022002617A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2022002617-A1
Application numberUS-202117476874-A
CountryUS
Kind codeA1
Filing dateSep 16, 2021
Priority dateMar 19, 2019
Publication dateJan 6, 2022
Grant date

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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Abstract

Official abstract text for this publication.

The present invention addresses the problem of providing a scintillator which has excellent impact resistance and favorable workability and moldability. The problem is solved by a resin-phosphor composite scintillator which contains a resin and a phosphor and is capable of converting irradiated radiation into visible light. In this composite scintillator, a brightness retention rate, which is measured 24 hours after 38-minute irradiation with an X-ray to a total irradiation dose of 13 kGy at a distance of 40 mm from a radiation source, is 65% or higher; the Rockwell hardness is 30 HRM or higher; and the content of the resin is not less than 10% by weight.

First claim

Opening claim text (preview).

1 . A resin-phosphor composite scintillator, comprising: a resin; and a phosphor; wherein: the scintillator is capable of converting irradiated radiation into visible light a brightness retention rate of the scintillator, when measured 24 hours after 38-minute irradiation with an X-ray to a total irradiation dose of 13 kGy at a distance of 40 mm from a radiation source, is 65% or higher; a Rockwell hardness of the scintillator is 30 HRM or higher; and a content of the resin in the scintillator is not less than 10% by weight. 2 . The composite scintillator according to claim 1 , which is in the form of a plate having a thickness of 500 μm or greater. 3 . The composite scintillator according to claim 1 , wherein the resin is a cured product obtained using a cationic polymerization initiator. 4 . The composite scintillator according to claim 1 , wherein the resin has an epoxy equivalent of 190 or more. 5 . The composite scintillator according to claim 1 , wherein the resin comprises a cyclic structure which contains no double bond. 6 . The composite scintillator according to claim 1 , wherein the resin comprises at least one selected from the group consisting of a hydrogenated epoxy resin and an epoxy silicone resin. 7 . The composite scintillator according to claim 1 , wherein a content of the phosphor in the scintillator is 30% by weight to 90% by weight. 8 . The composite scintillator according to claim 1 , wherein the scintillator exhibits an afterglow of 100 ppm or less after 20 ms when irradiated with a 16-Gy X-ray. 9 . The composite scintillator according to claim 1 , wherein the phosphor comprises at least one selected from the group consisting of a GOS phosphor, a CWO phosphor, a CsI phosphor, and a GAGG phosphor. 10 . The composite scintillator according to claim 1 , wherein the phosphor is in the form of particles. 11 . The composite scintillator according to claim 1 , wherein the phosphor has an average particle size of 0.1 μm to 50 μm. 12 . A composite scintillator array, comprising a plurality of composite scintillators according to claim 1 , wherein: the scintillators are arranged linearly in the array, each scintillator has a size of 10 mm 3 or smaller.

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Classifications

  • Oxysulfides · CPC title

  • Selection of materials · CPC title

  • Selection of materials · CPC title

  • C09K11/02Primary

    Use of particular materials as binders, particle coatings or suspension media therefor · CPC title

  • containing chromium, molybdenum or tungsten · CPC title

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What does patent US2022002617A1 cover?
The present invention addresses the problem of providing a scintillator which has excellent impact resistance and favorable workability and moldability. The problem is solved by a resin-phosphor composite scintillator which contains a resin and a phosphor and is capable of converting irradiated radiation into visible light. In this composite scintillator, a brightness retention rate, which is m…
Who is the assignee on this patent?
Mitsubishi Chem Corp
What technology area does this patent fall under?
Primary CPC classification C09K11/7771. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Thu Jan 06 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).