Laser dicing glass wafers using advanced laser sources
US-2024409449-A1 · Dec 12, 2024 · US
US2021331273A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2021331273-A1 |
| Application number | US-201716318092-A |
| Country | US |
| Kind code | A1 |
| Filing date | Jul 21, 2017 |
| Priority date | Sep 22, 2016 |
| Publication date | Oct 28, 2021 |
| Grant date | — |
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A method of processing a workpiece having a first surface and a second surface opposite the first surface includes: generating a first beam of laser pulses having a pulse duration less than 200 ps at a pulse repetition rate greater than 500 kHz, directing the first beam of laser pulses along a beam axis intersecting the workpiece, and scanning the beam axis along a processing trajectory. The beam axis is scanned such that consecutively-directed laser pulses impinge upon the workpiece at a non-zero bite size to form a feature at the first surface of the workpiece. One or more parameters such as bite size, pulse duration, pulse repetition rate, laser pulse spot size and laser pulse energy is selected to ensure that the feature has a processed workpiece surface with a mean surface roughness (Ra) of less than or equal to 1.0 μm.
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1 . A method, comprising: providing a workpiece having a first surface and a second surface opposite the first surface; generating a first beam of laser pulses having a pulse duration less than 200 ps at a pulse repetition rate greater than 500 kHz, a spot size and a pulse energy; and directing the first beam of laser pulses along a beam axis intersecting the workpiece; scanning the beam axis along a processing trajectory, such that consecutively-directed laser pulses impinge upon the workpiece at a non-zero bite size, to form a feature at the first surface of the workpiece, and such that the feature is characterized as having a processed workpiece surface having a mean surface roughness (Ra) of less than 1.0 μm. 2 . The method of claim 1 , wherein the pulse duration is less than or equal to 1 ps. 3 . The method of claim 2 , wherein the pulse duration is less than or equal to 800 fs. 4 . The method of claim 1 , wherein the pulse repetition rate is greater than 1264 kHz. 5 . The method of claim 4 , wherein the pulse repetition rate is greater than or equal to 1800 kHz. 6 . The method of claim 1 , wherein the pulse repetition rate is greater than or equal to 1900 kHz. 7 . The method of claim 6 , wherein the pulse repetition rate is greater than or equal to 2000 kHz. 8 . The method of claim 7 , wherein the pulse repetition rate is greater than or equal to 3000 kHz. 9 . The method of claim 1 , wherein the mean surface roughness (Ra) is less than 0.75 μm. 10 . The method of claim 1 , wherein the mean surface roughness (Ra) is less than 0.5 μm. 11 . The method of claim 10 , wherein the mean surface roughness (Ra) is less than 0.4 μm. 12 . The method of claim 11 , wherein the mean surface roughness (Ra) is less than 0.3 μm. 13 . The method of claim 12 , wherein the mean surface roughness (Ra) is less than 0.25 μm. 14 . The method of claim 1 , further comprising: generating a second beam of laser pulses; focusing laser pulses within the second beam of laser pulses to produce a beam waist; directing the focused, second beam of laser pulses along a beam axis intersecting the processed workpiece surface such that the beam waist is arranged within the workpiece or at the second surface of the workpiece; and processing the workpiece at the beam waist. 15 . The method of claim 14 , wherein the workpiece is more transparent to a wavelength of laser pulses within the second beam of laser pulses than to a wavelength of laser pulses within the first beam of laser pulses.
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