Surface clean system and method

Patent metadata

Field	Value
Publication number	US-2021237228-A1
Application number	US-202017119464-A
Country	US
Kind code	A1
Filing date	Dec 11, 2020
Priority date	Jan 30, 2020
Publication date	Aug 5, 2021
Grant date	—

Abstract

A portable handheld cleaning device is provided capable of cleaning the surface of the substrate table without damaging the surface. The portable handheld cleaning device in accordance with the present disclosure includes a base having a first side and a second side (the first side and the second side overlapping each other), a hollow structure on the first side of the base, and a weight holding space within the hollow structure. A grinding pad is provided on the second side of the base. The grinding pad includes a cleaning surface, the cleaning surface having a plurality of substantial pyramid shaped grits.

First claim

What is claimed is:

1 . A portable cleaning device, comprising:
a base having a first side and a second side, the first side and the second side overlapping each other; a hollow structure on the first side of the base; a weight holding space within the hollow structure; and a grinding pad on the second side of the base, wherein the grinding pad includes a cleaning surface, the cleaning surface having a plurality of substantial pyramid shaped structures.

2 . The portable cleaning device of claim 1 , wherein the weight holding space includes at least one weight alignment structure.

3 . The portable cleaning device of claim 2 , wherein the at least one weight alignment structure includes a post on the first side.

4 . The portable cleaning device of claim 1 , wherein a hardness of the plurality of substantial pyramid shaped structures is in a range between 800 HV and 3000 HV.

5 . The portable cleaning device of claim 1 , wherein the plurality of substantial pyramid shaped structures is formed with silicon carbide.

6 . The portable cleaning device of claim 1 , wherein the plurality of substantial pyramid shaped structures includes a first pyramid shaped grit and a second pyramid shaped grit,
wherein the first pyramid shaped structure and the second pyramid shaped structure are parallel to each other.

7 . The portable cleaning device of claim 6 , wherein the first pyramid shaped structure includes a first apex and the second pyramid shaped structure includes a second apex, and
wherein the first and second apexes are aligned in a first direction.

8 . The portable cleaning device of claim 1 , wherein each of the substantial pyramid shaped structures is a triangular-based pyramid shape structure.

9 . The portable cleaning device of claim 8 , wherein a length for the base of the triangular-based pyramid shape structure is in a range between 100 μm and 700 μm.

10 . The portable cleaning device of claim 8 , wherein a spacing between adjacent triangular-based pyramid shaped structures is in a range between 0 μm and 100 μm.

11 . A surface cleaning device, comprising:
a controller; a cleaning member having at least one scrubbing surface; a rotating mechanism that rotates the cleaning member in response to a rotating control signal from the controller, the rotating control signal includes a rotational speed setting; a robot arm that transports the rotating mechanism that rotates the cleaning member to a surface; and a feedback circuitry transmitting actual rotational speed of the cleaning member to the controller at a plurality of location on the surface, wherein the controller determines at least one location on the surface where a particle is located based on a rotational speed from the rotational speed setting and the actual rotational speed of the cleaning member.

12 . The surface cleaning device of claim 11 , wherein the scrubbing surface includes a plurality of substantial pyramid shaped grits.

13 . The surface cleaning device of claim 12 , wherein the plurality of substantial pyramid shaped grits includes a first pyramid shaped grit and a second pyramid shaped grit,
wherein the first pyramid shaped grit and the second pyramid shaped grit are parallel to each other.

14 . The surface cleaning device of claim 11 , wherein the scrubbing surface includes a granite material.

15 . The surface cleaning device of claim 11 , wherein the scrubbing surface includes silicon carbide.

16 . The surface cleaning device of claim 11 , wherein the controller determines the at least one location where a rotational speed from the rotational speed setting is greater than the actual rotational speed of the cleaning member.

17 . A method of detecting a particle on a surface, comprising:
rotating a cleaning member on a surface; moving the cleaning member in a cleaning pattern on the surface; measuring, at a plurality of locations on the surface, an actual rotational speed of the cleaning member on the surface; determining an average rotational speed of the cleaning member on the surface based on the measurement; and determining at least one of the plurality of locations where the average rotational speed is greater than the actual rotational speed of the cleaning member.

18 . The method according to claim 17 , further comprising:
applying an additional cleaning to the at least one location of the plurality of locations where the average rotational speed is greater than the actual rotational speed of the cleaning member.

19 . The method according to claim 17 , wherein the cleaning member includes at least one scrubbing surface in contact with the surface while cleaning the surface.

20 . The method according to claim 19 , wherein the scrubbing surface includes a plurality of substantial pyramid shaped grits, the scrubbing surface including silicon carbide.

Assignees

• Taiwan Semiconductor Mfg Co Ltd

Inventors

• Su Pei-Yi
• Chen Cheng-Chieh

Classifications

• H10P52/00

  Grinding, lapping or polishing of wafers, substrates or parts of devices · CPC title

• H10P72/0406

  for cleaning followed by drying, rinsing, stripping, blasting or the like · CPC title

• B24D3/346 Primary

  utilised during polishing, or grinding operation · CPC title

• B24B53/017 Primary

  Devices or means for dressing, cleaning or otherwise conditioning lapping tools · CPC title

• H01L21/304

  Electricity · mapped topic