Sintered compact target and method of producing sintered compact

US2021237153A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2021237153-A1
Application numberUS-202117239740-A
CountryUS
Kind codeA1
Filing dateApr 26, 2021
Priority dateMar 17, 2008
Publication dateAug 5, 2021
Grant date

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  1. Title

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Abstract

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A sintered compact target containing an element(s) (A) and an element(s) (B) as defined below is provided. The sintered compact target is free from pores having an average diameter of 1 μm or more, and the number of micropores having an average diameter of less than 1 μm existing in 40000 μm2 of the target surface is 100 micropores or less. The element(s) (A) is one or more chalcogenide elements selected from S, Se, and Te, and the element(s) (B) is one or more Vb group elements selected from Bi, Sb, As, P, and N. The provided technology is able to eliminate the source of grain dropping or generation of nodules in the target during sputtering, and additionally inhibit the generation of particles.

First claim

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We claim: 1 . A method of producing a sintered compact containing an element (A) and an element (B), comprising the steps of: mixing raw material powder composed of respective elements or raw material powder of an alloy of two or more elements; vacuum hot pressing the mixed powder under conditions that satisfy the following formula: P (pressure)≤(Pf/(Tf−T 0 ))×(T−T 0 )+P 0 wherein Pf: final pressure, Tf: final temperature, P 0 : atmospheric pressure, T: heating temperature, T 0 : room temperature, and temperatures are in Celsius; and further performing hot isostatic pressing (HIP) treatment under the conditions of P hip >5×Pf; wherein the sintered compact is free from pores having an average diameter of 1 μm or more, and the number of micropores having an average diameter of less than 1 μm existing in an area of 40,000 μm 2 of the target surface is 100 micropores or less; and wherein (A): one or more chalcogenide elements selected from S, Se, and Te and (B): one or more elements selected from Bi, Sb, As, P, and N. 2 . The method of producing a sintered compact according to claim 1 , wherein a composition of the sintered compact is selected from the group consisting of Ge—Sb—Te, Ag—In—Sb—Te, and Ge—In—Sb—Te. 3 . The method of producing a sintered compact according to claim 1 , wherein raw material powder is composed of an alloy, a compound or a mixture of constituent elementary substances, or constituent elements, and wherein the average grain size of the raw material powder is 0.1 μm to 50 μm, the maximum grain size is 90 μm or less, and the purity is 4N or higher. 4 . The method of producing a sintered compact according to claim 1 , wherein, in a course of heating temperature T rising from 100° C. to 500° C. during the vacuum hot pressing, the pressure P is maintained at a constant level for 10 to 120 minutes at least in a part of a range of the heating temperature of 100° C. to 500° C. 5 . A method of producing a sintered compact containing an element (A), an element (B) and one or more elements selected from (C) or (D), comprising the steps of: mixing raw material powder composed of the respective elements or raw material powder of an alloy of two or more elements; vacuum hot pressing the mixed powder under conditions that satisfy the following formula: P (pressure)≤(Pf/(Tf−T 0 ))×(T−T 0 )+P 0 wherein Pf: final pressure, Tf: final temperature, P 0 : atmospheric pressure, T: heating temperature, T 0 : room temperature, and temperatures are in Celsius; and further performing hot isostatic pressing (HIP) treatment under the conditions of P hip >5×Pf; wherein the sintered compact is free from pores having an average diameter of 1 μm or more, and the number of micropores having an average diameter of 0.1 to 1 μm existing in an area of 40,000 μm 2 of the target surface is 100 micropores or less; and wherein (A): one or more chalcogenide elements selected from S, Se, and Te; (B): one or more elements selected from Bi, Sb, As, P, and N; (C): one or more elements selected from Pb, Sn, Ge, Si, and C; and (D): one or more elements selected from Ag, Au, Pd, Pt, B, Al, Ga, In, Ti, and Zr. 6 . The method of producing a sintered compact according to claim 5 , wherein the element (A) is Te, the element (B) is Sb, the element (C) is Ge, and the element (D) is one or more elements selected from Ag, Ga, and In. 7 . The method of producing a sintered compact according to claim 5 , wherein a composition of the sintered compact is selected from the group consisting of Ge—Sb—Te, Ag—In—Sb—Te, and Ge—In—Sb—Te. 8 . The method of producing a sintered compact according to claim 5 , wherein raw material powder is composed of an alloy, a compound or a mixture of constituent elementary substances, or constituent elements, and wherein the average grain size of the raw material powder is 0.1 μm to 50 μm, the maximum grain size is 90 μm or less, and the purity is 4N or higher. 9 . The method of producing a sintered compact according to claim 5 , wherein, in a course of heating temperature T rising from 100° C. to 500° C. during the vacuum hot pressing, the pressure P is maintained at a constant level for 10 to 120 minutes at least in a part of a range of the heating temperature of 100° C. to 500° C.

Assignees

Inventors

Classifications

  • group 16 elements (i.e. chalcogenides, Se, Te) · CPC title

  • simultaneously · CPC title

  • Hot isostatic pressing · CPC title

  • transition metal elements of group 11 (Cu, Ag, Au) · CPC title

  • Processes characterised by the sequence of their steps · CPC title

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What does patent US2021237153A1 cover?
A sintered compact target containing an element(s) (A) and an element(s) (B) as defined below is provided. The sintered compact target is free from pores having an average diameter of 1 μm or more, and the number of micropores having an average diameter of less than 1 μm existing in 40000 μm2 of the target surface is 100 micropores or less. The element(s) (A) is one or more chalcogenide element…
Who is the assignee on this patent?
Jx Nippon Mining & Metals Corp
What technology area does this patent fall under?
Primary CPC classification B22F3/1103. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Thu Aug 05 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).