Organic thin film transistor and method of manufacturing organic thin film transistor

US2021184142A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2021184142-A1
Application numberUS-202117186275-A
CountryUS
Kind codeA1
Filing dateFeb 26, 2021
Priority dateSep 3, 2018
Publication dateJun 17, 2021
Grant date

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  1. Title

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  2. Abstract

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  4. Key dates

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  5. First independent claim

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Provided are an organic thin film transistor that has high bendability and can suppress a decrease in carrier mobility caused by a pinhole of an insulating film or leveling properties and a method of manufacturing the organic thin film transistor. The organic thin film transistor includes: a gate electrode; an insulating film that is formed to cover the gate electrode; an organic semiconductor layer that is formed on the insulating film, and a source electrode and a drain electrode that are formed on the organic semiconductor layer, in which the insulating film includes an inorganic film consisting of SiNH.

First claim

Opening claim text (preview).

What is claimed is: 1 . An organic thin film transistor comprising: a gate electrode; an insulating film that is formed to cover the gate electrode; an organic semiconductor layer that is formed on the insulating film; and a source electrode and a drain electrode that are formed on the organic semiconductor layer, wherein the insulating film includes an inorganic film consisting of SiNH. 2 . The organic thin film transistor according to claim 1 , wherein a ratio SiN:H of the number of SiN atoms to the number of H atoms in the inorganic film is 1:0.7 to 2. 3 . The organic thin film transistor according to claim 1 , wherein a thickness of the inorganic film is 1 nm to 100 nm. 4 . The organic thin film transistor according to claim 1 , wherein an organic layer is provided on the gate electrode side of the inorganic film. 5 . The organic thin film transistor according to claim 4 , wherein a thickness of the organic layer is 0.01 μm to 1 μm. 6 . The organic thin film transistor according to claim 4 , wherein a glass transition temperature of the organic layer is 200° C. or higher. 7 . The organic thin film transistor according to claim 1 , wherein a second inorganic film consisting of SiO 2 is provided on a surface on the organic semiconductor layer side of the inorganic film. 8 . The organic thin film transistor according to claim 1 , wherein a support that supports the gate electrode, the insulating film, the organic semiconductor layer, the source electrode, and the drain electrode is provided. 9 . A method of manufacturing the organic thin film transistor according to claim 1 , the method comprising: a gate electrode forming step of forming a gate electrode on a support; an insulating film laminating step of laminating an insulating film on the gate electrode; an organic semiconductor layer forming step of forming an organic semiconductor layer on the insulating film; and a source-drain electrode forming step of forming a source electrode and a drain electrode on the organic semiconductor layer, wherein the insulating film includes an inorganic layer consisting of SiNH. 10 . The method of manufacturing the organic thin film transistor according to claim 9 , wherein in the insulating film laminating step, a transfer type laminated film including a substrate and a transfer layer that includes the inorganic layer formed on the substrate is laminated on the gate electrode and subsequently the substrate is peeled off from the transfer layer such that the insulating film is laminated on the gate electrode. 11 . The organic thin film transistor according to claim 2 , wherein a thickness of the inorganic film is 1 nm to 100 nm. 12 . The organic thin film transistor according to claim 2 , wherein an organic layer is provided on the gate electrode side of the inorganic film. 13 . The organic thin film transistor according to claim 12 , wherein a thickness of the organic layer is 0.01 μm to 1 μm. 14 . The organic thin film transistor according to claim 12 , wherein a glass transition temperature of the organic layer is 200° C. or higher. 15 . The organic thin film transistor according to claim 2 , wherein a second inorganic film consisting of SiO 2 is provided on a surface on the organic semiconductor layer side of the inorganic film. 16 . The organic thin film transistor according to claim 2 , wherein a support that supports the gate electrode, the insulating film, the organic semiconductor layer, the source electrode, and the drain electrode is provided. 17 . A method of manufacturing the organic thin film transistor according to claim 2 , the method comprising: a gate electrode forming step of forming a gate electrode on a support; an insulating film laminating step of laminating an insulating film on the gate electrode; an organic semiconductor layer forming step of forming an organic semiconductor layer on the insulating film; and a source-drain electrode forming step of forming a source electrode and a drain electrode on the organic semiconductor layer, wherein the insulating film includes an inorganic layer consisting of SiNH. 18 . The method of manufacturing the organic thin film transistor according to claim 17 , wherein in the insulating film laminating step, a transfer type laminated film including a substrate and a transfer layer that includes the inorganic layer formed on the substrate is laminated on the gate electrode and subsequently the substrate is peeled off from the transfer layer such that the insulating film is laminated on the gate electrode. 19 . The organic thin film transistor according to claim 3 , wherein an organic layer is provided on the gate electrode side of the inorganic film. 20 . The organic thin film transistor according to claim 19 , wherein a thickness of the organic layer is 0.01 μm to 1 μm.

Assignees

Inventors

Classifications

  • Electricity · mapped topic

  • Electricity · mapped topic

  • Electricity · mapped topic

  • H10K10/472Primary

    the gate dielectric comprising only inorganic materials · CPC title

  • using non-liquid printing techniques, e.g. thermal transfer printing from a donor sheet · CPC title

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What does patent US2021184142A1 cover?
Provided are an organic thin film transistor that has high bendability and can suppress a decrease in carrier mobility caused by a pinhole of an insulating film or leveling properties and a method of manufacturing the organic thin film transistor. The organic thin film transistor includes: a gate electrode; an insulating film that is formed to cover the gate electrode; an organic semiconductor …
Who is the assignee on this patent?
Fujifilm Corp
What technology area does this patent fall under?
Primary CPC classification H01L51/0525. Mapped technology areas include Electricity.
When was this patent published?
Publication date Thu Jun 17 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).