Polishing pads produced by an additive manufacturing process

Patent metadata

Field	Value
Publication number	US-2021107116-A1
Application number	US-202017114633-A
Country	US
Kind code	A1
Filing date	Dec 8, 2020
Priority date	Oct 17, 2014
Publication date	Apr 15, 2021
Grant date	—

Abstract

Embodiments of the present disclosure relate to advanced polishing pads with tunable chemical, material and structural properties, and new methods of manufacturing the same. According to one or more embodiments of the disclosure, it has been discovered that a polishing pad with improved properties may be produced by an additive manufacturing process, such as a three-dimensional (3D) printing process. Embodiments of the present disclosure thus may provide an advanced polishing pad that has discrete features and geometries, formed from at least two different materials that include functional polymers, functional oligomers, reactive diluents, and curing agents. For example, the advanced polishing pad may be formed from a plurality of polymeric layers, by the automated sequential deposition of at least one resin precursor composition followed by at least one curing step, wherein each layer may represent at least one polymer composition, and/or regions of different compositions.

First claim

1 . A polishing article having a polishing surface that is configured to polish a material surface of a substrate, the polishing article comprising:
a base material layer forming a supporting surface of the polishing article, wherein the base material layer is formed from a plurality sequentially deposited and partially cured first layers; and a plurality of individual polishing elements disposed on and extending upwardly from the base material layer in one or more spiral shaped arrangements to collectively define one or more channels in the polishing surface, wherein adjacent ones of the plurality of individual polishing elements within each of the one or more spiral shaped arrangements are spaced apart to define a corresponding plurality of gaps disposed there between, the plurality of polishing elements are formed from a plurality of sequentially deposited and partially cured second layers, respective precursor compositions used to form the base material layer and the plurality of individual polishing elements are copolymerized with one another at interfacial boundary regions there between, and a glass transition temperature of the base material layer is less than a glass transition temperature of the plurality of individual polishing elements.

2 . The polishing article of claim 1 , wherein individual ones of the plurality of gaps are not radially aligned with other ones of the plurality of gaps in adjacent portions of the one or more spiral shaped arrangements.

3 . The polishing article of claim 2 , wherein the plurality of gaps form a tortuous path across a radius of the polishing surface.

4 . The polishing article of claim 1 , wherein the plurality of first layers are formed of at least first droplets of a corresponding first precursor composition, the plurality of second layers are formed of the first droplets and of second droplets of a corresponding second precursor composition, and the first precursor composition is different from the second precursor composition.

5 . The polishing article of claim 4 , wherein the plurality of first layers are further formed of second droplets of the corresponding second precursor composition and a ratio of the first and second droplets used to form the first layers is different from a ratio of the first and second droplets used to form the second layers.

6 . The polishing article of claim 4 , wherein the first precursor composition comprises components having a glass transition temperature of less than 40° C. and the second precursor composition comprises components having a glass transition temperature of greater than or equal to 40° C.

7 . The polishing article of claim 4 , wherein the first precursor composition comprises one or more functional polymers having a glass transition temperature of less 40° C. and one or more multifunctional acrylate oligomers.

8 . The polishing article of claim 7 , wherein a ratio of the second droplets to the first droplets used to form the plurality of second layers is more than one.

9 . The polishing article of claim 4 , wherein one or both of the first and second precursor compositions comprises a multifunctional acrylate oligomer and an acrylate monomer.

10 . The polishing article of claim 9 , wherein the acrylate monomer has a functionality of two or more.

11 . A polishing article, comprising:
a supporting portion formed of at least a plurality of individual droplets of a first precursor composition dispensed and at least partially cured in a layer-by-layer additive manufacturing process; and a plurality of individual polishing elements extending upwardly from the supporting portion to form a polishing surface, wherein the plurality of individual polishing elements are formed in the layer-by-layer additive manufacturing process using partially overlapping patterns of a plurality of individual droplets of the first precursor composition and a plurality of individual droplets of a second precursor composition, the second precursor composition is different from the first precursor composition, the respective precursor compositions used to form the supporting portion and the plurality of individual polishing elements are copolymerized with one another at interfacial boundary regions between the supporting portion and the plurality of individual polishing elements, the plurality of individual polishing elements are disposed in one or more spiral shaped arrangements to collectively define one or more channels in the polishing surface, and adjacent ones of the plurality of individual polishing elements within each of the one or more spiral shaped arrangements are spaced apart to define a corresponding plurality of gaps disposed there between.

12 . The polishing article of claim 11 , wherein
the supporting portion is further formed of a plurality of individual droplets of the second precursor composition, and a ratio of an amount of the first precursor composition to an amount of the second precursor composition in forming the supporting portion is different from a ratio of an amount of the first precursor composition to an amount of the second precursor composition in forming the plurality of individual polishing elements.

13 . The polishing article of claim 11 , wherein a glass transition temperature of the support portion is less than a glass transition temperature of the plurality of individual polishing elements.

14 . The polishing article of claim 11 , wherein the plurality of gaps disposed between adjacent ones of the plurality of individual polishing elements are not radially aligned between adjacent portions of the one or more spiral shaped arrangements.

15 . The polishing article of claim 14 , wherein the plurality of gaps form a tortuous path across a radius of the polishing surface.

16 . The polishing article of claim 11 , wherein the first precursor composition comprises components having a glass transition temperature of less than 40° C. and the second precursor composition comprises components having a glass transition temperature of greater than or equal to 40° C.

17 . The polishing article of claim 11 , wherein the first precursor composition comprises one or more functional polymers having a glass transition temperature of less 40° C. and one or more multifunctional acrylate oligomers.

18 . The polishing article of claim 11 , wherein one or both of the first and second precursor compositions comprises a multifunctional acrylate oligomer and an acrylate monomer.

19 . A polishing article having a polishing surface that is configured to polish a material surface of a substrate, the polishing article comprising:
a base material layer forming a supporting portion of the polishing article, wherein the base material layer is formed from a plurality of sequentially deposited and partially cured first layers of at least first droplets of a corresponding first precursor composition; and a plurality of individual polishing elements disposed on and extending upwardly from the supporting portion of the base material layer to collectively therewith define one or more channels in the polishing surface, wherein the plurality of individual polishing elements are formed from a plurality of sequentially deposited and partially cured second layers of first droplets of the first precursor composition and of second droplets of a corresponding second precursor composition, the first precursor composition is different from the second precursor composition, and the precursor compositions used to form the respective first and second lay

Assignees

• Applied Materials Inc

Inventors

• Bajaj Rajeev
• Redfield Daniel
• Orilall Mahendra C
• Fu Boyi
• Khanna Aniruddh Jagdish
• Fung Jason G
• Chockalingam Ashwin
• Yamamura Mayu
• Kakireddy Veera Raghava Reddy
• Menk Gregory E
• Patibandla Nag B

Classifications

• B33Y70/00

  Materials specially adapted for additive manufacturing · CPC title

• B24B37/24

  characterised by the composition or properties of the pad materials · CPC title

• B24D11/001 Primary

  Manufacture of flexible abrasive materials · CPC title

• B33Y10/00

  Processes of additive manufacturing · CPC title

• B24B37/26

  characterised by the shape of the lapping pad surface, e.g. grooved · CPC title