Plating film

US2021087702A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2021087702-A1
Application numberUS-201916968351-A
CountryUS
Kind codeA1
Filing dateJan 28, 2019
Priority dateFeb 8, 2018
Publication dateMar 25, 2021
Grant date

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Provided is a plating film that can exhibit a high gloss and a low contact resistance value. The plating film according to an embodiment of the present invention is a plating film including a noble metal matrix and nanodiamond particles dispersed in the noble metal matrix. The plating film according to an embodiment of the present invention preferably has a gloss at an incident angle of 60° of not less than 250 GU and/or a contact resistance value at a load of 50 gf of not greater than 1 mΩ, and a difference between a contact resistance value at a load of 50 gf and a contact resistance value at a load of 5 gf of not greater than 5 mΩ. The nanodiamond particles are preferably nanodiamond particles including a surface-modifying group containing a sterically repulsive group and particularly preferably nanodiamond particles including a surface-modifying group containing a polyglycerol chain.

First claim

Opening claim text (preview).

1 . A plating film comprising a noble metal matrix and nanodiamond particles dispersed in the noble metal matrix. 2 . The plating film according to claim 1 , wherein the plating film has a gloss at an incident angle of 60° of not less than 250 GU. 3 . The plating film according to claim 1 , wherein the plating film is produced using a plating bath comprising noble metal ions and nanodiamond particles. 4 . The plating film according to claim 3 , wherein the plating film has a gloss at an incident angle of 60° by not less than 20 GU compared with a plating film produced using a plating bath having an identical composition except for not containing nanodiamond particles. 5 . The plating film according to claim 1 , wherein the plating film has a contact resistance value at a load of 50 gf of not greater than 1 mΩ, and a difference between a contact resistance value at a load of 50 gf and a contact resistance value at a load of 5 gf of not greater than 5 mΩ. 6 . The plating film according to claim 1 , wherein the plating film has a surface roughness (Ra) of not greater than 0.5 μm. 7 . The plating film according to claim 1 , wherein a particle diameter (D50) of the nanodiamond particles dispersed in the noble metal matrix by scanning electron microscopy is in a range from 4 to 100 nm. 8 . The plating film according to claim 1 , wherein the nanodiamond particles comprise a surface-modifying group containing a sterically repulsive group. 9 . The plating film according to claim 1 , wherein the nanodiamond particles comprise a surface-modifying group containing a polyglycerol chain. 10 . The plating film according to claim 1 , wherein a content of the nanodiamond particles is from 0.5 to 25 area % of the plating film. 11 . A plating film producing method for producing the plating film described in claim 1 by electrolytic plating using a plating bath comprising noble metal ions and nanodiamond particles, the plating bath containing from 0.001 to 1.0 g/L of the nanodiamond particles and having a light transmittance of light at a wavelength of 600 nm of not less than 95%. 12 . A plating bath comprising noble metal ions and nanodiamond particles, the plating bath containing from 0.005 to 1.0 g/L of the nanodiamond particles and having a light transmittance of light at a wavelength of 600 nm of not less than 95%. 13 . An electronic component comprising the plating film described in claim 1 . 14 . A leveling agent comprising nanodiamond particles comprising a surface-modifying group containing a polyglycerol chain. 15 . The plating film according to claim 1 , wherein the nanodiamond particles comprise a surface-modifying group containing a sterically repulsive group derived from a hydrophilic polymer. 16 . The plating film according to claim 1 , wherein the nanodiamond particles comprise from 0.4 to 1.0 parts by mass of a surface-modifying group per part by mass of the nanodiamond particles. 17 . The plating film according to claim 1 , wherein the nanodiamond particles comprising a surface-modifying group containing a polyglycerol chain are nanodiamond particles comprising a surface-modifying group containing a polyglycerol chain obtained by ring-opening polymerization from 20 to 150 parts by mass of glycidol relative to 1 part by mass of the nanodiamond particles. 18 . The plating bath according to claim 12 , wherein the nanodiamond particles comprise a surface-modifying group containing a sterically repulsive group derived from a hydrophilic polymer. 19 . The plating bath according to claim 12 , wherein the nanodiamond particles comprising a surface-modifying group containing a polyglycerol chain. 20 . The plating bath according to claim 12 , comprising no surfactant or comprising not greater than 0.05 g/L of a surfactant.

Assignees

Inventors

Classifications

  • Cu-base component · CPC title

  • Au-base component · CPC title

  • Group IB metal-base component alternative to platinum group metal-base component [e.g., precious metal, etc.] · CPC title

  • Free carbon containing component · CPC title

  • Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process (C23C26/00, C23C28/00 take precedence) · CPC title

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What does patent US2021087702A1 cover?
Provided is a plating film that can exhibit a high gloss and a low contact resistance value. The plating film according to an embodiment of the present invention is a plating film including a noble metal matrix and nanodiamond particles dispersed in the noble metal matrix. The plating film according to an embodiment of the present invention preferably has a gloss at an incident angle of 60° of …
Who is the assignee on this patent?
Daicel Corp
What technology area does this patent fall under?
Primary CPC classification C25D3/46. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Thu Mar 25 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).