Strain tolerant particle structures for high energy anode materials and sythesis methods thereof

US2021075000A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2021075000-A1
Application numberUS-202017011740-A
CountryUS
Kind codeA1
Filing dateSep 3, 2020
Priority dateSep 6, 2019
Publication dateMar 11, 2021
Grant date

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

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Disclosed herein are embodiments of strain tolerant particle structures, methods of manufacturing such structures, and precursors to form said structures. In some embodiments, the structures can be formed of a network of nano-scale walls. The structures can be incorporated into powders, which can then be used for any number of applications, such as microwave plasma processing.

First claim

Opening claim text (preview).

What is claimed is: 1 . A strain tolerant particle comprising: a plurality of walls surrounding a plurality of voids, the walls being between 10-90% of a total volume of the particle; and Si, Si monoxide, Sn, or Sn oxide; wherein the particle is configured to stay within 50 volume % during lithiation and delithiation. 2 . The particle of claim 1 , wherein the plurality of voids are closed cells. 3 . The particle of claim 1 , wherein the plurality of voids are open cells. 4 . The particle of claim 1 , wherein the plurality of voids are a mixture of closed cells and open cells. 5 . The particle of claim 1 , wherein the plurality of walls are between 20 and 50% of the total volume of the particle. 6 . The particle of claim 1 , wherein the plurality of walls have a thickness of between 50 and 150 nm. 7 . The particle of claim 1 , wherein the particle is coated with carbon. 8 . The particle of claim 1 , wherein the particle is configured to stay within 10 volume % during lithiation and delithiation. 9 . The particle of claim 1 , wherein the particle further comprises a transition metal. 10 . The particle of claim 1 , wherein the particle comprises polydimethylsiloxane. 11 . The particle of claim 1 , wherein the particle comprises diphenylsiloxane. 12 . A powder formed from a plurality of the particle of claim 1 . 13 . The powder of claim 12 , wherein a D50 of the powder lies between 0.2 and 100 um. 14 . An anode formed from the particle of claim 1 . 15 . A battery formed from the anode of claim 14 . 16 . A method of manufacturing a strain tolerant powder, the method comprising: preparing a precursor material including an Si, Si monoxide, Sn, or Sn oxide material and a component that produces gas; forming droplets from the precursor material; and interacting the droplets in a plasma or plasma exhaust of a microwave plasma torch to produce gases from the component and form a powder of a plurality of particles; wherein the precursor material is configured to prevent gas bubbles formed during synthesis from coalescing and/or escaping; and wherein the particles in the powder are configured to stay within 50 volume % during lithiation and delithiation. 17 . The method of claim 16 , wherein a viscosity of the precursor material is between 3 and 500 cS. 18 . The method of claim 16 , wherein the plurality of particles includes a carbon coating. 19 . The method of claim 16 , wherein the plurality of particles includes an Al 2 O 3 coating. 20 . A strain tolerant particle comprising: a composition comprising: silicon, tin, or a combination of silicon and tin; a transition metal; and silica; and a plurality of walls surrounding a plurality of voids, the walls being between 10-90% of a total volume of the particle; wherein the particle is configured to stay within 50 volume % during lithiation and delithiation.

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Classifications

  • Energy storage using batteries · CPC title

  • using waveguides · CPC title

  • with provisions for introducing materials into the plasma, e.g. powder or liquid {(arc stabilising or constricting arrangements H05H1/3405; coaxial protecting fluids H05H1/341)} · CPC title

  • H05H1/30Primary

    using applied electromagnetic fields, e.g. high frequency or microwave energy (H05H1/28 takes precedence) · CPC title

  • Negative electrodes · CPC title

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What does patent US2021075000A1 cover?
Disclosed herein are embodiments of strain tolerant particle structures, methods of manufacturing such structures, and precursors to form said structures. In some embodiments, the structures can be formed of a network of nano-scale walls. The structures can be incorporated into powders, which can then be used for any number of applications, such as microwave plasma processing.
Who is the assignee on this patent?
6K Inc
What technology area does this patent fall under?
Primary CPC classification H05H1/30. Mapped technology areas include Electricity.
When was this patent published?
Publication date Thu Mar 11 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).