Notched Gate Structure Fabrication

Patent metadata

Field	Value
Publication number	US-2021074591-A1
Application number	US-202017099613-A
Country	US
Kind code	A1
Filing date	Nov 16, 2020
Priority date	Jun 27, 2018
Publication date	Mar 11, 2021
Grant date	—

Abstract

A method includes providing a structure having a substrate and a fin protruding from the substrate, forming a gate stack layer over the fin, and patterning the gate stack layer in forming a gate stack. The patterning of the gate stack layer simultaneously forms a passivation layer on sidewall surfaces of the gate stack. The method also includes removing a bottom portion of the passivation layer, thereby exposing a bottom portion of the gate stack, while a top portion of the passivation layer remains. The method further includes laterally etching the bottom portion of the gate stack, thereby shrinking a width of the bottom portion of the gate stack.

First claim

What is claimed is:

1 . A method, comprising:
providing a structure having a substrate and a fin protruding from the substrate; forming a gate stack layer over the fin; patterning the gate stack layer, thereby forming a gate stack, wherein the patterning of the gate stack layer simultaneously forms a passivation layer on sidewall surfaces of the gate stack; removing a bottom portion of the passivation layer, thereby exposing a bottom portion of the gate stack, wherein a top portion of the passivation layer remains; and laterally etching the bottom portion of the gate stack, thereby shrinking a width of the bottom portion of the gate stack.

2 . The method of claim 1 , wherein the bottom portion of the passivation layer is thinner than the top portion of the passivation layer.

3 . The method of claim 1 , wherein the passivation layer is formed on the sidewall surfaces of the gate stack but not on a top surface of the gate stack.

4 . The method of claim 1 , wherein the passivation layer is an oxide layer or a nitride layer.

5 . The method of claim 1 , wherein after the laterally etching of the bottom portion of the gate stack, the bottom portion of the gate stack has a curvature surface.

6 . The method of claim 1 , wherein the patterning of the gate stack layer includes applying a mixture of an etchant and a passivation gas.

7 . The method of claim 6 , wherein the laterally etching of the bottom portion of the gate stack includes applying the etchant without the passivation gas.

8 . The method of claim 6 , wherein the removing of the bottom portion of the passivation layer includes applying the etchant without the passivation gas.

9 . The method of claim 6 , wherein the etchant contains HBr.

10 . The method of claim 1 , wherein the patterning of the gate stack layer, the removing of the bottom portion of the passivation layer, and the laterally etching of the bottom portion of the gate stack are in-situ in a plasma processing chamber.

11 . A method, comprising:
providing a structure having a semiconductor substrate and semiconductor fins protruding from the semiconductor substrate in a center region and a peripheral region surrounding the center region; forming a gate material layer over the semiconductor fins; etching the gate material layer with a first etchant, thereby forming a first gate stack in the center region and a second gate stack in the peripheral region; and etching the first and second gate stacks with a second etchant, the second etchant having a higher flow rate in the peripheral region than in the center region, thereby forming the first and second gate stacks with bottom portions narrower than respective top portions.

12 . The method of claim 11 , wherein the etching of the first and second gate stacks is limited to the bottom portions of the first and second gate stacks but not the top portions thereof.

13 . The method of claim 11 , wherein the first etchant is a mixture of the second etchant with a passivation gas.

14 . The method of claim 13 , wherein the passivation gas is an oxygen-containing gas or a nitrogen-containing gas.

15 . The method of claim 11 , wherein during the etching of the first and second gate stacks, the second etchant has a concentration about 5% to about 20% higher in the peripheral region than in the center region.

16 . The method of claim 11 , wherein after the etching of the first and second gate stacks, a variation of a width of the bottom portions of the first and second gate stacks is less than 10% across the center and peripheral regions.

17 . A method of semiconductor device fabrication, comprising:
providing a semiconductor wafer; forming a first plurality of fins in a center region of the semiconductor wafer and a second plurality of fins in an edge region of the semiconductor wafer; forming a dielectric layer over the first and second pluralities of fins; patterning the dielectric layer, thereby forming a first plurality of dummy gates on the first plurality of fins and a second plurality of dummy gates on the second plurality of fins; and performing a dry etching process to the first and second pluralities of dummy gates by applying different etchant flow rates to the center and edge regions, thereby forming the first and second pluralities of dummy gates with bottom portions narrower than respective top portions, wherein a maximum variation of widths of the bottom portions of the first and second pluralities of dummy gates is less than 10%.

18 . The method of claim 17 , wherein during the performing of the dry etching process, the edge region receives a higher etchant flow rate than the center region.

19 . The method of claim 17 , wherein the patterning of the dielectric layer simultaneously forms passivation layers on sidewall surfaces of the first and second pluralities of dummy gates.

20 . The method of claim 19 , wherein the performing of the dry etching process includes removing bottom portions of the passivation layers.

Assignees

• Taiwan Semiconductor Mfg Co Ltd

Inventors

• Chen chang-yin
• Chang Che-Cheng
• Lin Chih-Han

Classifications

• H10P50/695

  characterised by the process involved to create the mask, e.g. lift-off masks or sidewalls or to modify the mask · CPC title

• H10P50/644

  Anisotropic liquid etching (H10P50/61 takes precedence) · CPC title

• H10P50/242

  of Group IV materials · CPC title

• H10P50/71

  using masks for conductive or resistive materials · CPC title

• H10P50/73

  using masks for insulating materials · CPC title