Memory system, semiconductor device and fabrication method therefor
US-2024107759-A1 · Mar 28, 2024 · US
US2021057441A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2021057441-A1 |
| Application number | US-201916550252-A |
| Country | US |
| Kind code | A1 |
| Filing date | Aug 25, 2019 |
| Priority date | Aug 25, 2019 |
| Publication date | Feb 25, 2021 |
| Grant date | — |
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
What the patent document calls the invention.
A short plain-language summary of the technical disclosure.
Who owns or filed the patent and who is credited as inventor.
Filing, priority, publication, and grant dates set the timeline.
The legal scope of protection — read this for what is actually claimed.
Technology tags used to group this patent with similar filings.
Prior art links and similar publications in this corpus.
Official abstract text for this publication.
A memory array comprising strings of memory cells comprises laterally-spaced memory blocks individually comprising a vertical stack comprising alternating insulative tiers and conductive tiers. Operative channel-material strings of memory cells extend through the insulative tiers and the conductive tiers. The operative channel-material strings in the laterally-spaced memory blocks comprise part of a memory plane. An elevationally-extending wall is in the memory plane laterally-between immediately-laterally-adjacent of the memory blocks and that completely encircles an island that is laterally-between immediately-laterally-adjacent of the memory blocks in the memory plane. Other embodiments, including method are disclosed.
Opening claim text (preview).
1 . A memory array comprising strings of memory cells, comprising: laterally-spaced memory blocks individually comprising a vertical stack comprising alternating insulative tiers and conductive tiers, operative channel-material strings of memory cells extending through the insulative tiers and the conductive tiers in a memory-array region; the insulative tiers and the conductive tiers of the laterally-spaced memory blocks extending from the memory-array region into a stair-step region that is adjacent the memory-array region, the insulative tiers and the conductive tiers of the memory blocks in the stair-step region comprising operative stair-step structures that are laterally-spaced relative one another and that are individually horizontally-longitudinally-elongated; individual of the stair-step structures comprising a pair of elevationally-extending walls that are spaced laterally-inward from sides of the respective stair-step structure, that are laterally-spaced relative one another, and that are individually horizontally-longitudinally-elongated; and the individual stair-step structures being devoid of operative TAV's laterally-between the pair of walls. 2 . The memory array of claim 1 wherein the individual stair-step structures comprise a landing region and a step region comprising steps that is adjacent the landing region, at least a portion of the walls being in the landing region. 3 . The memory array of claim 1 wherein the individual stair-step structures comprise a landing region and a step region comprising steps that is adjacent the landing region, at least a portion of the walls being in the step region. 4 . The memory array of claim 1 wherein the individual stair-step structures comprise a landing region and a step region comprising steps that is adjacent the landing region, the walls being in each of the landing region and the step region. 5 . The memory array of claim 1 comprising more elevationally-extending walls that connect with the pair of walls, the pair of walls and the more walls collectively completely-encircling an island that includes space between the laterally-spaced walls of the pair of walls. 6 . The memory array of claim 5 wherein the island is longitudinally-elongated along the pair of walls. 7 . The memory array of claim 1 wherein the walls are horizontally parallel relative one another. 8 . The memory array of claim 1 wherein at least one of the walls is horizontally parallel horizontal-longitudinal-orientation of the stair-step structure it is in. 9 . The memory array of claim 1 wherein at least one of the walls is not horizontally parallel horizontal-longitudinal-orientation of the stair-step structure it is in. 10 . The memory array of claim 1 wherein at least one of the walls is vertical or within 10° of vertical. 11 . The memory array of claim 1 wherein at least one of the walls is horizontally straight-linear. 12 . The memory array of claim 1 comprising NAND. 13 . A memory array comprising strings of memory cells, comprising: laterally-spaced memory blocks individually comprising a vertical stack comprising alternating insulative tiers and conductive tiers, operative channel-material strings of memory cells extending through the insulative tiers and the conductive tiers in a memory-array region; the insulative tiers and the conductive tiers of the laterally-spaced memory blocks extending from the memory-array region into a stair-step region that is adjacent the memory-array region, the insulative tiers and the conductive tiers of the memory blocks in the stair-step region comprising operative stair-step structures that are laterally-spaced relative one another and that are individually horizontally-longitudinally-elongated; and individual of the stair-step structures comprising a pair of elevationally-extending walls that are spaced laterally-inward from sides of the respective stair-step structure, that are laterally-spaced relative one another, and that are individually horizontally-longitudinally-elongated; at least one of the walls neither being horizontally parallel horizontal-longitudinal-orientation of its individual stair-step structure nor angled orthogonally relative said horizontal-longitudinal-orientation. 14 . A memory array comprising strings of memory cells, comprising: laterally-spaced memory blocks individually comprising a vertical stack comprising alternating insulative tiers and conductive tiers, operative channel-material strings of memory cells extending through the insulative tiers and the conductive tiers in a memory-array region; the insulative tiers and the conductive tiers of the laterally-spaced memory blocks extending from the memory-array region into a stair-step region that is adjacent the memory-array region, the insulative tiers and the conductive tiers of the memory blocks in the stair-step region comprising operative stair-step structures that are laterally-spaced relative one another and that are individually horizontally-longitudinally-elongated; individual of the stair-step structures comprising a pair of elevationally-extending walls that are spaced laterally-inward from sides of the respective stair-step structure, that are laterally-spaced relative one another, and that are individually horizontally-longitudinally-elongated; and the individual stair-step structures being devoid of any interconnecting wall that extends laterally between the pair of walls. 15 . A memory array comprising strings of memory cells, comprising: laterally-spaced memory blocks individually comprising a vertical stack comprising alternating insulative tiers and conductive tiers, operative channel-material strings of memory cells extending through the insulative tiers and the conductive tiers, the operative channel-material strings in the laterally-spaced memory blocks comprising part of a memory plane; and an elevationally-extending wall in the memory plane laterally-between immediately-laterally-adjacent of the memory blocks and that completely encircles an island that is laterally-between immediately-laterally-adjacent of the memory blocks in the memory plane. 16 . A memory array comprising strings of memory cells, comprising: laterally-spaced memory blocks individually comprising a vertical stack comprising alternating insulative tiers and conductive tiers, operative channel-material strings of memory cells extending through the insulative tiers and the conductive tiers, the operative channel-material strings in the laterally-spaced memory blocks comprising part of a memory plane; and a pair of elevationally-extending walls in the memory plane laterally-between immediately-laterally-adjacent of the memory blocks, that are laterally-spaced relative one another, and that are individually horizontally-longitudinally-elongated; at least one of the walls not being horizontally parallel horizontal-longitudinal-orientation of the immediately-laterally-adjacent memory blocks which the at least one of the walls is laterally-there-between. 17 . A memory array comprising strings of memory cells, comprising: laterally-spaced memory blocks individually comprising a vertical stack comprising alternating insulative tiers and conductive tiers, operative channel-material strings of memory cells extending through the insulative tiers and the conductive tiers, the operative channel-material strings in the laterally-spaced memory blocks comprising part of a memory plane; and a pair of elevationally-extending walls that are laterally-spaced relative one another and that are individually horizontally-longitu
Cross-sectional shapes or dispositions of interconnections · CPC title
using processes for implementing desired shapes or dispositions of the openings, e.g. double patterning · CPC title
by filling conductive material into holes, grooves or trenches · CPC title
Vias, e.g. via plugs · CPC title
Electricity · mapped topic
Related publications grouped by family.
Answers are generated from the same data shown on this page.