Strain gauge and method for manufacture thereof

Patent metadata

Field	Value
Publication number	US-2021018383-A1
Application number	US-201917043898-A
Country	US
Kind code	A1
Filing date	Apr 1, 2019
Priority date	Apr 5, 2018
Publication date	Jan 21, 2021
Grant date	—

Abstract

A strain gauge includes a flexible substrate, and a resistor formed of material containing at least one from among chromium and nickel, on or above the substrate. The resistor includes a first layer that is a lowermost layer; and a second layer that is a surface layer laminated on or: above the first layer. The second layer is a layer having a higher density than the first layer.

First claim

1 . A strain gauge comprising:
a flexible resin substrate; a functional layer formed of a metal, an alloy, or a metal compound, on one surface of the substrate; and a resistor formed as a film containing Cr, CrN, and Cr 2 N, on one surface of the functional layer, wherein the resistor includes a first layer that is a lowermost layer; and a second layer that is a surface layer laminated on or above the first layer, and wherein the second layer is a layer haying a higher density than the first layer.

2 . The strain gauge according to claim I, further comprising one or more other layers between the first layer and the second layer, wherein the density gradually increases from the first layer to the second layer.

3 . The strain gauge according to claim 1 , wherein one or more lower layers beneath the second layer each have a columnar structure.

4 . The strain gauge according to claim 3 , wherein a film thickness of the second layer is half or less than half a total thickness of the layers each having the columnar structure.

5 . The strain gauge according to claim 1 , wherein a main component of the resistor is alpha-chromium.

6 . The strain gauge according to claim 5 , wherein the resistor includes alpha-chromium at 80% by weight or more.

7 . (canceled)

8 . (canceled)

9 . The strain gauge according to claim 1 , wherein the functional layer includes a function of promoting crystal growth of the resistor.

10 . The strain gauge according to claim 1 , further comprising an insulating resin layer with which the resistor is coated.

11 . A method for manufacturing a strain gauge, the method comprising:
forming, on one surface of a flexible resin substrate, a functional laver formed of a metal, an alloy, or a metal compound: and forming, on one surface of the functional layer, a resistor formed as a film containing Cr, CrN, and Cr 2 N, by sputtering. wherein the resistor includes a first layer that is a lowermost layer; and a second layer that is a surface layer laminated on or above the first layer, wherein the second layer is a layer having a higher density than the first layer, and wherein in the forming a resistor, pressure of a noble gas that is supplied to a chamber, or sputtering power, is controlled so that the densities of the first layer and the second layer vary.

Assignees

• Minebea Mitsumi Inc

Inventors

• Asakawa Toshiaki
• Niwa Shinichi
• Takata Shintaro
• Toda Shinya

Classifications

• G01L1/2287 Primary

  constructional details of the strain gauges (adjustable resistors H01C10/00) · CPC title

• G01B7/16

  for measuring the deformation in a solid, e.g. by resistance strain gauge · CPC title