Method of using a gas-phase reactor system including analyzing exhausted gas

Patent metadata

Field	Value
Publication number	US-2020385868-A1
Application number	US-202016886405-A
Country	US
Kind code	A1
Filing date	May 28, 2020
Priority date	Jun 6, 2019
Publication date	Dec 10, 2020
Grant date	—

Abstract

Methods of and systems for performing leak checks of gas-phase reactor systems are disclosed. Exemplary systems include a first exhaust system coupled to a reaction chamber via a first exhaust line, a bypass line coupled to a gas supply unit and to the first exhaust system, a gas detector coupled to the bypass line via a connecting line, a connecting line valve coupled to the connecting line, and a second exhaust system coupled to the connecting line. Methods include using the second exhaust system to exhaust the connecting line to thereby remove residual gas in the connecting line that may otherwise affect the accuracy of the gas detector.

First claim

What is claimed is:

1 . A method of using a gas-phase reactor system, the method comprising the steps of:
providing the gas-phase reactor system comprising:
a reaction chamber;
a gas supply unit coupled to the reaction chamber via a gas supply line;
a first exhaust system coupled to the reaction chamber via a first exhaust line;
a bypass line coupled to the gas supply unit and to the first exhaust system;
a gas detector coupled to the bypass line via a connecting line;
a connecting line valve coupled to the connecting line; and
a second exhaust system coupled to the connecting line;
exhausting the connecting line; and using the gas detector, analyzing gas exhausted from the gas-phase reactor system.

2 . The method of claim 1 , wherein gas is exhausted from the gas supply unit.

3 . The method of claim 1 , further comprising a step of closing a second exhaust line valve between the gas detector and the second exhaust system after the step of exhausting the connecting line and prior to the step of analyzing gas.

4 . The method of claim 1 , further comprising a step of exhausting the bypass line during the step of analyzing.

5 . The method of claim 1 , further comprising a step of loading a substrate within the reaction chamber, wherein the step of analyzing is performed after the step of loading and before a step of unloading the substrate from within the reaction chamber.

6 . The method of claim 1 , further comprising a step of loading a substrate within the reaction chamber, wherein the step of analyzing is performed before the step of loading.

7 . The method of claim 1 , wherein during the step of analyzing, gas is exhausted to the second exhaust system.

8 . The method of claim 7 , wherein during the step of analyzing, the gas is not exhausted to the first exhaust system.

9 . The method of claim 1 , further comprising during the step of analyzing gas, using the gas detector to determine whether a gas flow rate is above a predetermined level.

10 . The method of claim 9 , further comprising if the gas flow rate is above the predetermined level, stopping flow of gas to the reaction chamber.

11 . The method of claim 9 , further comprising if the gas flow rate is above the predetermined level, stopping operation of the gas-phase reactor system.

12 . The method of claim 9 , further comprising if the gas flow rate is above the predetermined level, engaging an interlock system.

13 . The method of claim 1 , wherein the step of analyzing is performed while heating a substrate to a desired process temperature.

14 . The method of claim 1 , wherein the step of analyzing is performed during a process cycle.

15 . The method of claim 1 , wherein the step of analyzing is performed after a substrate has been loaded into the reaction chamber and before the substrate is removed from the reaction chamber.

16 . The method of claim 1 , wherein during the step of analyzing, gas is exhausted to the first exhaust system and the second exhaust system.

Assignees

• Asm Ip Holding Bv

Inventors

• Kim Sungbae
• Kwon Hakyong
• Kim Youngmin
• Kim Kikang
• Lee Seunghwan

Classifications

• H10P72/0604

  Process monitoring, e.g. flow or thickness monitoring · CPC title

• H10P72/06

  Apparatus for monitoring, sorting, marking, testing or measuring · CPC title

• G01M3/04

  by detecting the presence of fluid at the leakage point · CPC title

• C23C16/45561

  Gas plumbing upstream of the reaction chamber · CPC title

• C23C16/4401

  Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber · CPC title