Photosensitive composition

Patent metadata

Field	Value
Publication number	US-2020356003-A1
Application number	US-202016943833-A
Country	US
Kind code	A1
Filing date	Jul 30, 2020
Priority date	Feb 28, 2018
Publication date	Nov 12, 2020
Grant date	—

Abstract

A photosensitive composition for pulse exposure includes: a near infrared absorber A; a photoinitiator B; and a compound C that is cured by reacting with an active species generated from the photoinitiator B.

First claim

What is claimed is:

1 . A photosensitive composition for pulse exposure comprising:
a near infrared absorber A; a photoinitiator B; and a compound C that is cured by reacting with an active species generated from the photoinitiator B.

2 . The photosensitive composition according to claim 1 ,
wherein an A/B that is a ratio of an absorbance A of the photosensitive composition with respect to light having a wavelength of 248 nm to an absorbance B of the photosensitive composition with respect to light having a wavelength of 365 nm is 3.4 or higher.

3 . The photosensitive composition according to claim 1 ,
wherein the photoinitiator B includes an photoinitiator b1 that satisfies the following condition 1, condition 1: after a propylene glycol monomethyl ether acetate solution including 0.035 mmol/L of the photoinitiator b1 is exposed to pulses of light having a wavelength of 355 nm under conditions of a maximum instantaneous illuminance of 375000000 W/m 2 , pulse duration: 8 nanoseconds, and frequency: 10 Hz, a quantum yield q 355 is 0.05 or higher.

4 . The photosensitive composition according to claim 3 ,
wherein the quantum yield q 355 of the photoinitiator b1 is 0.10 or higher.

5 . The photosensitive composition according to claim 3 ,
wherein the photoinitiator b1 satisfies the following condition 2, condition 2: after a film having a thickness of 1.0 μm and including 5 mass % of the photoinitiator b1 and 95 mass % of a resin is exposed to pulses of light having a wavelength of 265 nm under conditions of a maximum instantaneous illuminance of 375000000 W/m 2 , pulse duration: 8 nanoseconds, and frequency: 10 Hz, a quantum yield q 265 is 0.05 or higher.

6 . The photosensitive composition according to claim 5 ,
wherein the quantum yield q 265 of the photoinitiator b1 is 0.10 or higher.

7 . The photosensitive composition according to claim 3 ,
wherein the photoinitiator b1 satisfies the following condition 3, condition 3: after a film including 5 mass % of the photoinitiator b1 and a resin is exposed to one pulse of light having a wavelength in a wavelength range of 248 to 365 nm under conditions of a maximum instantaneous illuminance of 62/500,0000 W/m 2 , pulse duration: 8 nanoseconds, and frequency: 10 Hz, an active species concentration in the film reaches 0.000000001 mmol or higher per 1 cm 2 of the film.

8 . The photosensitive composition according to claim 7 ,
wherein the active species concentration in the film of the photoinitiator b1 reaches 0.0000001 mmol or higher per 1 cm 2 of the film under the condition 3.

9 . The photosensitive composition according to claim 1 ,
wherein a content of the near infrared absorber A is 15 mass % or higher with respect to a total solid content of the photosensitive composition.

10 . The photosensitive composition according to claim 1 ,
wherein a content of the compound C is 5% to 30 mass % with respect to a total solid content of the photosensitive composition.

11 . The photosensitive composition according to claim 1 ,
wherein the photoinitiator B is a photoradical polymerization initiator, and the compound C is a radically polymerizable compound.

12 . The photosensitive composition according to claim 11 ,
wherein the radically polymerizable compound includes a radically polymerizable monomer.

13 . The photosensitive composition according to claim 12 ,
wherein a polymerizable group value of the radically polymerizable monomer is 10.5 mmol/g or higher.

14 . The photosensitive composition according to claim 11 ,
wherein the photoradical polymerization initiator is at least one compound selected from an alkylphenone compound, an acylphosphine compound, a benzophenone compound, a thioxanthone compound, a triazine compound, or an oxime compound.

15 . The photosensitive composition according to claim 1 , further comprising:
an ultraviolet absorber.

16 . The photosensitive composition according to claim 15 ,
wherein a content of the ultraviolet absorber is 0.01% to 7 mass % with respect to a total solid content of the photosensitive composition.

17 . The photosensitive composition according to claim 1 , further comprising:
an antioxidant.

18 . The photosensitive composition according to claim 17 ,
wherein a content of the antioxidant is 0.1% to 5 mass % with respect to a total solid content of the photosensitive composition.

19 . The photosensitive composition according to claim 1 , which is a composition for a near infrared cut filter.

20 . The photosensitive composition according to claim 1 , which is a photosensitive composition for a near infrared transmitting filter.

Assignees

• Fujifilm Corp

Inventors

• Kitajima Shunsuke
• Okawara Takahiro

Classifications

• C09K9/02

  Organic tenebrescent materials · CPC title

• G02B5/223

  containing organic substances, e.g. dyes, inks or pigments · CPC title

• G02B5/208

  for use with infrared or ultraviolet radiation, e.g. for separating visible light from infrared and/or ultraviolet radiation · CPC title

• G03F7/031 Primary

  Organic compounds not covered by group G03F7/029 · CPC title

• G03F7/029

  Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur · CPC title