Strain gauge

US2020333199A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2020333199-A1
Application numberUS-201816650566-A
CountryUS
Kind codeA1
Filing dateSep 27, 2018
Priority dateSep 29, 2017
Publication dateOct 22, 2020
Grant date

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  1. Title

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  2. Abstract

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  4. Key dates

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  5. First independent claim

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Abstract

Official abstract text for this publication.

A strain gauge includes a flexible substrate, and a resistor formed of material including at least one from among chromium and nickel, on or above the substrate. Surface unevenness on one surface of the substrate is 15 nm or less, and the resistor has a film thickness of 0.05 μm or more.

First claim

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1 - 9 . (canceled) 10 . A strain gauge comprising: a flexible resin substrate; a functional layer formed of a metal, an alloy, or a metal compound, directly on one surface of the substrate; and a resistor formed of a film that includes Cr, CrN, and Cr 2 N and into which an element included in the functional layer is diffused, on one surface of the functional layer, wherein a gauge factor of the strain gauge is 10 or more, wherein the substrate includes a filler, wherein surface unevenness on the one surface of the substrate is 15 nm or less, and wherein the resistor has a film thickness of 0.05 μmm or more. 11 . A strain gauge comprising: a flexible resin substrate; a functional layer formed of a metal, an alloy, or a metal compound, directly on one surface of the substrate; and a resistor formed of a film that includes Cr, CrN, and Cr 2 N and into which an element included in the functional layer is diffused, on one surface of the functional layer, wherein a temperature coefficient of resistance of the strain gauge is in a range of from −1000 ppm/° C. to +1000 ppm/° C. wherein the substrate includes a filler, wherein surface unevenness on the one surface of the substrate is 15 nm or less, and wherein the resistor has a film thickness of 0.05 μm or more. 12 . A strain gauge comprising: a flexible resin substrate; a functional layer formed of a metal, an alloy, or a metal compound, directly on one surface of the substrate; and a resistor formed of a film including Cr, CrN, Cr 2 N, on one surface of the functional layer, wherein the substrate includes a filler, wherein surface unevenness on the one surface of the substrate is 15 nm or less, and wherein the resistor has a film thickness of 0.05 μmm or more. 13 . The strain gauge according to claim 10 , wherein the functional layer includes one or more metals selected from the group consisting of Cr, Ti, V, Nb, Ta, Ni, Y, Zr, Hf, Si, C, Zn, Cu, Bi, Fe, Mo, W, Ru, Rh, Re, Os, Ir, Pt, Pd, Ag, Au, Co, Mn, and Al; an alloy of any metals from among the group; or a compound of any metal from among the group. 14 . The strain gauge according to claim 13 , wherein the functional layer includes one or more metals selected from the group consisting of Cr, V, Nb, Ta, Ni, Y, Hf, C, Zn, Bi, Fe, Mo, W, Ru, Rh, Re, Os, Ir, Pt, Pd, Ag, Au, Co, and Mn; an alloy of any metals from among the group; or a compound of any metal from among the group. 15 . The strain gauge according to claim 13 , wherein the functional layer includes one metal compound selected from the group consisting of TiN, TaN, Si 3 N 4 , TiO 2 , Ta 2 O 5 , and SiO 2 . 16 . The strain gauge according to claim 15 , wherein the functional layer includes one metal compound selected from the group consisting of TiN, TaN, Si 3 N 4 , and Ta 2 O 5 . 17 . The strain gauge according to claim 13 , wherein the functional layer includes one alloy selected from the group consisting of FeCr, TiAl, FeNi, NiCr, and CrCu. 18 . The strain gauge according to claim 10 , wherein the functional layer protects the resistor from oxidation; suppresses movement of oxygen and moisture present in the substrate into the resistor; and/or improves adhesion between the substrate and the resistor. 19 . The strain gauge according to claim 10 , wherein the functional layer is patterned in a same planar shape as the resistor. 20 . The strain gauge according to claim 10 , wherein the functional layer has a thickness of from 1 nm to 100 nm.

Assignees

Inventors

Classifications

  • G01L1/2287Primary

    constructional details of the strain gauges (adjustable resistors H01C10/00) · CPC title

  • using change in resistance · CPC title

  • for measuring the deformation in a solid, e.g. by resistance strain gauge · CPC title

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Frequently asked questions

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What does patent US2020333199A1 cover?
A strain gauge includes a flexible substrate, and a resistor formed of material including at least one from among chromium and nickel, on or above the substrate. Surface unevenness on one surface of the substrate is 15 nm or less, and the resistor has a film thickness of 0.05 μm or more.
Who is the assignee on this patent?
Minebea Mitsumi Inc
What technology area does this patent fall under?
Primary CPC classification G01L1/2287. Mapped technology areas include Physics.
When was this patent published?
Publication date Thu Oct 22 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).