Ultraviolet Curable Ink Composition, Method for Manufacturing Bezel Pattern in Display Substrate by Using Same, and Bezel Pattern Manufactured Thereby

US2020291252A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2020291252-A1
Application numberUS-201816491770-A
CountryUS
Kind codeA1
Filing dateDec 26, 2018
Priority dateDec 27, 2017
Publication dateSep 17, 2020
Grant date

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  1. Title

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Abstract

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An ultraviolet curable ink composition, a method for forming a bezel pattern using the same, a bezel pattern produced by the method, and a display substrate comprising the bezel pattern are disclosed herein. In some embodiments, an ultraviolet curable ink composition comprises a colorant, an epoxy monomer, an oxetane monomer, a cationic photo-polymerization initiator, and a polymerization inhibitor, wherein the weight ratio of the epoxy monomer to the oxetane monomer is 1:0.5 to 1:6.

First claim

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1 . A ultraviolet curable ink composition comprising a colorant, an epoxy monomer, an oxetane monomer, a cationic photopolymerization initiator and a polymerization inhibitor, wherein a weight ratio of the epoxy monomer to the oxetane monomer is 1:0.5 to 1:6. 2 . The ultraviolet curable ink composition according to claim 1 , wherein the composition further comprises at least one selected from the group consisting of a diluting solvent, an adhesion promoter, a surfactant and a photosensitizer. 3 . The ultraviolet curable ink composition according to claim 1 , wherein the polymerization inhibitor is an amine compound. 4 . The ultraviolet curable ink composition according to claim 3 , wherein the amine compound is a monovalent amine or a divalent amine. 5 . The ultraviolet curable ink composition according to claim 3 , wherein the amine compound is a primary amine, a secondary amine or a tertiary amine. 6 . The ultraviolet curable ink composition according to claim 3 , wherein the amine compound is a tertiary amine. 7 . The ultraviolet curable ink composition according to claim 5 , wherein the amine compound has at least one functional group bonded to a nitrogen atom, wherein the at least one functional group is selected from the group consisting of (C1-C6) alkyl, (C2-C6) alkenyl, (C2-C6) alkynyl, phenyl, (C1-C6) ketone, (C1-C6) ether and (C1-C6) ester, and wherein the at least one functional group is substituted with one or more substituents selected from the group consisting of a amide group, a cyan group, a carboxyl group, an aldehyde group and a hydroxy group. 8 . The ultraviolet curable ink composition according to claim 7 , wherein the amine compound is a tertiary amine in which three functional groups bonded to the nitrogen atom are, independently, (C1-C6) alkyl and wherein one of the functional groups is substituted with hydroxy. 9 . The ultraviolet curable ink composition according to claim 3 , wherein the amine compound is di(C1-C6) alkylamino (C1-C6) alkanol. 10 . The ultraviolet curable ink composition according to claim 9 , wherein the amine compound is at least one selected from the group consisting of 2-dimethylaminoethanol (2-DMAEA), 3-dimethylamino-1-propanol (3-DMA-1-PA) and dimethylaminomethanol (DMAMA). 11 - 15 . (canceled) 16 . The ultraviolet curable ink composition according to claim 1 , wherein the polymerization inhibitor is present in an amount of 0.2 to 4.9% by weight based on the total weight of the ultraviolet curable ink composition. 17 - 23 . (canceled) 24 . The ultraviolet curable ink composition according to claim 1 , wherein the ultraviolet curable ink composition has a viscosity of 1 to 50 cP at 25° C. 25 . The ultraviolet curable ink composition according to claim 1 , wherein the viscosity of the ink composition increases at a rate of 100% or less when the ink composition is stored at 45° C. for 3 months. 26 - 28 . (canceled) 29 . A method of manufacturing a bezel pattern for a display substrate, comprising: forming the ultraviolet curable ink composition according to claim 1 on a substrate in the shape of a bezel pattern; and curing the ink composition to form the bezel pattern. 30 - 33 . (canceled) 34 . The method of manufacturing a bezel pattern for a display substrate according to claim 29 , wherein the thickness of the bezel pattern is 0.1 to 20 μm after curing. 35 - 36 . (canceled) 37 . A bezel pattern for a display substrate, the bezel pattern formed by patterning and curing the ultraviolet curable ink composition of claim 1 . 38 . The bezel pattern for a display substrate according to claim 37 , wherein the thickness of the bezel pattern is 0.1 to 20 μm. 39 . (canceled) 40 . The bezel pattern for a display substrate according to claim 37 , wherein the taper angle of the bezel pattern is 0° to 10°. 41 . The bezel pattern for a display substrate according to claim 37 , wherein the optical density (OD) of the bezel pattern is 0.05 to 2.5 on the basis of the film thickness of 1.0 μm. 42 . A display substrate comprising the bezel pattern according to claim 37 .

Assignees

Inventors

Classifications

  • Curing or drying the ink on the copy materials, e.g. by heating or irradiating · CPC title

  • characterised by the ink properties (supplying ink in a solid state B41J2/17593) · CPC title

  • Ink jet · CPC title

  • for microlithography (measuring printed patterns for monitoring overlay G03F7/70633 or focus G03F7/70641; projection system adjustment G03F7/70258; position control G03F7/70775) · CPC title

  • Inkjet printing inks · CPC title

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What does patent US2020291252A1 cover?
An ultraviolet curable ink composition, a method for forming a bezel pattern using the same, a bezel pattern produced by the method, and a display substrate comprising the bezel pattern are disclosed herein. In some embodiments, an ultraviolet curable ink composition comprises a colorant, an epoxy monomer, an oxetane monomer, a cationic photo-polymerization initiator, and a polymerization inhib…
Who is the assignee on this patent?
Lg Chemical Ltd
What technology area does this patent fall under?
Primary CPC classification C09D11/101. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Thu Sep 17 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).