Multicathode deposition system and methods
US-12051576-B2 · Jul 30, 2024 · US
US2020274068A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2020274068-A1 |
| Application number | US-202016870716-A |
| Country | US |
| Kind code | A1 |
| Filing date | May 8, 2020 |
| Priority date | Apr 11, 2018 |
| Publication date | Aug 27, 2020 |
| Grant date | — |
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A metal foil includes a first surface and a second surface opposite to the first surface. The first surface has a first nickel mass proportion (mass %), which is a percentage of a mass of nickel in a sum of a mass of iron and the mass of nickel at the first surface. The second surface has a second nickel mass proportion (mass %), which is a percentage of a mass of nickel in a sum of a mass of iron and the mass of nickel at the second surface. An absolute value of a difference between the first nickel mass proportion (mass %) and the second nickel mass proportion (mass %) is a mass difference (mass %). A value obtained by dividing the mass difference by a thickness (μm) of the vapor deposition mask substrate is a standard value. The standard value is less than or equal to 0.05 (mass %/μm).
Opening claim text (preview).
1 . A vapor deposition mask substrate, which is metal foil formed by electroplating, wherein the metal foil is made of an iron-nickel alloy, the metal foil includes a first surface, and a second surface opposite to the first surface, the first surface has a first nickel mass proportion (mass %), which is a percentage of a mass of nickel in a sum of a mass of iron and the mass of nickel at the first surface, the second surface has a second nickel mass proportion (mass %), which is a percentage of a mass of nickel in a sum of a mass of iron and the mass of nickel at the second surface, an absolute value of a difference between the first nickel mass proportion (mass %) and the second nickel mass proportion (mass %) is a mass difference (mass %), a value obtained by dividing the mass difference by a thickness (μm) of the vapor deposition mask substrate is a standard value, and the standard value is less than or equal to 0.05 (mass %/μm). 2 . The vapor deposition mask substrate according to claim 1 , wherein the vapor deposition mask substrate has a thickness of less than or equal to 15 μm. 3 . The vapor deposition mask substrate according to any one of claim 1 , wherein each of the first nickel mass proportion and the second nickel mass proportion is between 35.8 mass % and 42.5 mass % inclusive. 4 . A vapor deposition mask substrate, which is metal foil formed by electroplating, wherein the metal foil is made of an iron-nickel alloy, the metal foil includes a first surface, and a second surface opposite to the first surface, the first surface has a first nickel mass proportion (mass %), which is a percentage of a mass of nickel in a sum of a mass of iron and the mass of nickel at the first surface, the second surface has a second nickel mass proportion (mass %), which is a percentage of a mass of nickel in a sum of a mass of iron and the mass of nickel at the second surface, an absolute value of a difference between the first nickel mass proportion (mass %) and the second nickel mass proportion (mass %) is a mass difference (mass %), and the mass difference is less than or equal to 0.6 (mass %). 5 . The vapor deposition mask substrate according to claim 4 , wherein the vapor deposition mask substrate has a thickness of less than or equal to 15 μm. 6 . The vapor deposition mask substrate according to any one of claim 4 , wherein each of the first nickel mass proportion and the second nickel mass proportion is between 35.8 mass % and 42.5 mass % inclusive. 7 . A method for manufacturing a vapor deposition mask substrate, which is metal foil formed by electroplating, the method comprising: forming plating foil by the electroplating; and annealing the plating foil to obtain the metal foil, wherein the metal foil is made of an iron-nickel alloy, the metal foil includes a first surface, and a second surface opposite to the first surface, the first surface has a first nickel mass proportion (mass %), which is a percentage of a mass of nickel in a sum of a mass of iron and the mass of nickel at the first surface, the second surface has a second nickel mass proportion (mass %), which is a percentage of a mass of nickel in a sum of a mass of iron and the mass of nickel at the second surface, an absolute value of a difference between the first nickel mass proportion (mass %) and the second nickel mass proportion (mass %) is a mass difference (mass %), a value obtained by dividing the mass difference by a thickness (μm) of the vapor deposition mask substrate is a standard value, and the standard value is less than or equal to 0.05 (mass %/μm).
Thermal treatment, e.g. annealing in the presence of a solvent vapour · CPC title
using selective deposition, e.g. using a mask · CPC title
using masks · CPC title
containing more than 50% by weight of iron or nickel or cobalt · CPC title
Moulds; Masks; Masterforms · CPC title
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