Vapor deposition mask base material, method for manufacturing vapor deposition mask base material, method for manufacturing vapor deposition mask, and method for manufacturing display device

US2020274068A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2020274068-A1
Application numberUS-202016870716-A
CountryUS
Kind codeA1
Filing dateMay 8, 2020
Priority dateApr 11, 2018
Publication dateAug 27, 2020
Grant date

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  1. Title

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  2. Abstract

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  5. First independent claim

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  6. CPC / IPC classifications

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Abstract

Official abstract text for this publication.

A metal foil includes a first surface and a second surface opposite to the first surface. The first surface has a first nickel mass proportion (mass %), which is a percentage of a mass of nickel in a sum of a mass of iron and the mass of nickel at the first surface. The second surface has a second nickel mass proportion (mass %), which is a percentage of a mass of nickel in a sum of a mass of iron and the mass of nickel at the second surface. An absolute value of a difference between the first nickel mass proportion (mass %) and the second nickel mass proportion (mass %) is a mass difference (mass %). A value obtained by dividing the mass difference by a thickness (μm) of the vapor deposition mask substrate is a standard value. The standard value is less than or equal to 0.05 (mass %/μm).

First claim

Opening claim text (preview).

1 . A vapor deposition mask substrate, which is metal foil formed by electroplating, wherein the metal foil is made of an iron-nickel alloy, the metal foil includes a first surface, and a second surface opposite to the first surface, the first surface has a first nickel mass proportion (mass %), which is a percentage of a mass of nickel in a sum of a mass of iron and the mass of nickel at the first surface, the second surface has a second nickel mass proportion (mass %), which is a percentage of a mass of nickel in a sum of a mass of iron and the mass of nickel at the second surface, an absolute value of a difference between the first nickel mass proportion (mass %) and the second nickel mass proportion (mass %) is a mass difference (mass %), a value obtained by dividing the mass difference by a thickness (μm) of the vapor deposition mask substrate is a standard value, and the standard value is less than or equal to 0.05 (mass %/μm). 2 . The vapor deposition mask substrate according to claim 1 , wherein the vapor deposition mask substrate has a thickness of less than or equal to 15 μm. 3 . The vapor deposition mask substrate according to any one of claim 1 , wherein each of the first nickel mass proportion and the second nickel mass proportion is between 35.8 mass % and 42.5 mass % inclusive. 4 . A vapor deposition mask substrate, which is metal foil formed by electroplating, wherein the metal foil is made of an iron-nickel alloy, the metal foil includes a first surface, and a second surface opposite to the first surface, the first surface has a first nickel mass proportion (mass %), which is a percentage of a mass of nickel in a sum of a mass of iron and the mass of nickel at the first surface, the second surface has a second nickel mass proportion (mass %), which is a percentage of a mass of nickel in a sum of a mass of iron and the mass of nickel at the second surface, an absolute value of a difference between the first nickel mass proportion (mass %) and the second nickel mass proportion (mass %) is a mass difference (mass %), and the mass difference is less than or equal to 0.6 (mass %). 5 . The vapor deposition mask substrate according to claim 4 , wherein the vapor deposition mask substrate has a thickness of less than or equal to 15 μm. 6 . The vapor deposition mask substrate according to any one of claim 4 , wherein each of the first nickel mass proportion and the second nickel mass proportion is between 35.8 mass % and 42.5 mass % inclusive. 7 . A method for manufacturing a vapor deposition mask substrate, which is metal foil formed by electroplating, the method comprising: forming plating foil by the electroplating; and annealing the plating foil to obtain the metal foil, wherein the metal foil is made of an iron-nickel alloy, the metal foil includes a first surface, and a second surface opposite to the first surface, the first surface has a first nickel mass proportion (mass %), which is a percentage of a mass of nickel in a sum of a mass of iron and the mass of nickel at the first surface, the second surface has a second nickel mass proportion (mass %), which is a percentage of a mass of nickel in a sum of a mass of iron and the mass of nickel at the second surface, an absolute value of a difference between the first nickel mass proportion (mass %) and the second nickel mass proportion (mass %) is a mass difference (mass %), a value obtained by dividing the mass difference by a thickness (μm) of the vapor deposition mask substrate is a standard value, and the standard value is less than or equal to 0.05 (mass %/μm).

Assignees

Inventors

Classifications

  • Thermal treatment, e.g. annealing in the presence of a solvent vapour · CPC title

  • using selective deposition, e.g. using a mask · CPC title

  • C23C14/042Primary

    using masks · CPC title

  • containing more than 50% by weight of iron or nickel or cobalt · CPC title

  • C25D1/10Primary

    Moulds; Masks; Masterforms · CPC title

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What does patent US2020274068A1 cover?
A metal foil includes a first surface and a second surface opposite to the first surface. The first surface has a first nickel mass proportion (mass %), which is a percentage of a mass of nickel in a sum of a mass of iron and the mass of nickel at the first surface. The second surface has a second nickel mass proportion (mass %), which is a percentage of a mass of nickel in a sum of a mass of i…
Who is the assignee on this patent?
Toppan Printing Co Ltd
What technology area does this patent fall under?
Primary CPC classification C23C14/042. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Thu Aug 27 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).