Single mode vcsels with low threshold and high-speed operation

Patent metadata

Field	Value
Publication number	US-2020119521-A1
Application number	US-201916600030-A
Country	US
Kind code	A1
Filing date	Oct 11, 2019
Priority date	Oct 12, 2018
Publication date	Apr 16, 2020
Grant date	—

Abstract

Vertical-cavity surface-emitting lasers (VCSELs) and methods for making such are provided. The VCSELs include stepped upper reflectors having respective differently-sized apertures. This allows the lower portion of the reflector to have formed therein a wider-diameter aperture to allow for increased current injection. The upper portion of the reflector has formed therein a narrower-diameter, mode-selecting aperture to allow higher-order modes to be reduced, leading to single-mode operation. The VCSELs are thus capable of higher-power emission in a single mode, allowing for longer-distance signaling over optical fiber, despite modal dispersion within the fiber and/or at the coupling between the VCSEL and the fiber. The two differently-sized apertures can be formed via respective lateral oxidation processes following etch-down to form the respective steps of the upper reflector. Differences in composition across the upper reflector results in temperature-dependence of the oxidation process, allowing the apertures to be formed with different sizes.

First claim

We claim:

1 . A vertical-cavity surface-emitting laser comprising:
a base reflective element; a gain element; a current-injection reflective element, wherein the current-injection reflective element comprises a first portion of a first distributed Bragg reflector (DBR), wherein the current-injection reflective element includes a current-injection aperture having a first diameter, wherein the gain element is disposed between the base reflective element and the current-injection reflective element, and wherein at least a portion of the current-injection element has a second diameter that is greater than the first diameter; an electrode electrically coupled to the current-injection reflective element such that current passing though the electrode into the current-injection reflective element passes into the gain element via the current-injection aperture; and a mode-selective reflective element, wherein the mode-selective reflective element comprises a second portion of the first DBR, wherein the mode-selective reflective element includes a mode-selective aperture having a third diameter that is less than the first diameter, wherein the current-injection reflective element is disposed between the gain element and the mode-selective reflective element, and wherein at least a portion of the mode-selective reflective element has a fourth diameter that is greater than the third diameter.

2 . The vertical-cavity surface-emitting laser of claim 1 , wherein the base reflective element comprises a second DBR.

3 . The vertical-cavity surface-emitting laser of claim 1 , wherein the electrode comprises a metal in contact with the current-injection reflective element.

4 . The vertical-cavity surface-emitting laser of claim 1 , wherein the electrode comprises:
a low-bandgap, positively-doped semiconductor material in contact with the current-injection reflective element; and a metal in contact with the low-bandgap, positively-doped semiconductor material, wherein the low-bandgap, positively-doped semiconductor material is disposed between the metal and the current-injection reflective element.

5 . The vertical-cavity surface-emitting laser of claim 1 , wherein the first diameter is less than the fourth diameter.

6 . The vertical-cavity surface-emitting laser of claim 1 , wherein the first diameter is greater than twice the third diameter.

7 . The vertical-cavity surface-emitting laser of claim 1 , wherein the third diameter is selected such that, when a supra-threshold current is passed through the electrode and a temperature of the vertical-cavity surface-emitting laser is within an operating temperature range between 0 degrees and 85 degrees Celsius, the vertical-cavity surface-emitting laser emits emitted light exhibiting a first mode power that is at least 30 dB greater than a second mode power of the emitted light.

8 . The vertical-cavity surface-emitting laser of claim 1 , wherein the gain element comprises at least one quantum well.

9 . The vertical-cavity surface-emitting laser of claim 1 , wherein the mode-selective element comprises at least 10 layer-pairs of the first DBR.

10 . The vertical-cavity surface-emitting laser of claim 1 , wherein the mode-selective element comprises at least 15 layer-pairs of the first DBR.

11 . The vertical-cavity surface-emitting laser of claim 1 , wherein the third diameter is between 2.5 microns and 3.5 microns.

12 . The vertical-cavity surface-emitting laser of claim 1 , wherein at least one layer-pair of the first DBR comprises a layer of GaAs and a layer of Al X Ga 1-X As.

13 . The vertical-cavity surface-emitting laser of claim 1 , wherein a composition of the second portion of the first DBR within the mode-selective reflective element differs from a composition of the first portion of the first DBR within the current-injection reflective element.

14 . The vertical-cavity surface-emitting laser of claim 13 , wherein the second portion of the first DBR within the mode-selective reflective element comprises a layer of GaAs and a layer of Al X Ga 1-X As, wherein the first portion of the first DBR within the current-injection reflective element comprises a layer of GaAs and a layer of Al Y Ga 1-Y As, and wherein the fraction Y is greater than the fraction X.

15 . The vertical-cavity surface-emitting laser of claim 1 , wherein the current-injection aperture is incorporated into a subset of layers of the first portion of the first DBR that are within the current-injection reflective element.

16 . A method for fabricating a vertical-cavity surface-emitting laser, the method comprising:
forming a mode-selective reflective mesa having a first diameter from a substrate, wherein the substrate comprises:
a base reflective element;
a gain element;
a first upper reflective element having a first thickness, wherein the first upper reflective element comprises at least one layer-pair of a distributed Bragg reflector (DBR) having a first composition, and wherein the gain element is disposed within the substrate between the base reflective element and the first upper reflective element; and
a second upper reflective element, wherein the second upper reflective element comprises at least one layer-pair of a DBR having a second composition that differs from the first composition, and wherein the second upper reflective element is disposed within the substrate between the gain element and the first upper reflective element;
wherein forming the mode-selective reflective mesa from the substrate comprises etching at least a portion of the substrate to a depth less than the first thickness; forming, in the mode-selective mesa via lateral oxidation at a first temperature, a mode-selective aperture having a second diameter that is less than the first diameter; forming a current-injection reflective mesa having a third diameter from the substrate, wherein the third diameter is greater than the first diameter, and wherein forming the current-injection reflective mesa from the substrate comprises etching at least a portion of the substrate to a depth greater than the first thickness; and forming, in the current-injection mesa via lateral oxidation at a second temperature, a current injection aperture having a fourth diameter that is less than the third diameter and that is greater than the second diameter.

17 . The method of claim 16 , wherein the first composition specifies alternating layers of GaAs and Al X Ga 1-X As, wherein the second composition specifies alternating layers of GaAs and Al Y Ga 1-Y As, and wherein the fraction Y is greater than the fraction X.

18 . The method of claim 16 , wherein the gain element and second upper reflective element have a second combined thickness, and wherein etching the current-injection reflective mesa into the substrate comprises etching the substrate to a depth greater than a sum of the first thickness and second combined thickness.

19 . The method of claim 16 , further comprising:
forming, on the current-injection mesa via an epitaxial growth method, a low-bandgap, positively-doped semiconductor material.

20 . The method of claim 16 , wherein the second temperature is less than the first temperature.

Assignees

• Univ Illinois

Inventors

• Feng Milton
• Yu Xin

Classifications

• H01S5/18344

  characterized by the mesa, e.g. dimensions or shape of the mesa · CPC title

• H01S2301/02

  ASE (amplified spontaneous emission), noise; Reduction thereof · CPC title

• H01S5/18347

  Mesa comprising active layer · CPC title

• H01S5/04257

  having positive and negative electrodes on the same side of the substrate · CPC title

• H01S2301/163

  Single longitudinal mode · CPC title