Method and device for thermally activating a functional layer of a coating material

Patent metadata

Field	Value
Publication number	US-2020107410-A1
Application number	US-201816621216-A
Country	US
Kind code	A1
Filing date	Jun 19, 2018
Priority date	Jun 20, 2017
Publication date	Apr 2, 2020
Grant date	—

Abstract

The present invention relates to a method for thermally activating a functional layer of a coating material, preferably an edge material, wherein the method comprises the following steps: providing the coating material; feeding the coating material to a device for thermally activating a functional layer of the coating material; and thermally activating the functional layer of the coating material, wherein the thermal activation of the functional layer of the coating material occurs by microwaves which are generated by at least one semiconductor wave generator. The present invention also relates to a device for thermally activating a functional layer of a coating material.

First claim

1 . A method for thermally activating a functional layer of a coating material ( 3 ), wherein the method comprises the following steps:
providing the coating material ( 3 ); feeding the coating materials ( 3 ) into a device ( 10 ) for thermally activating a functional layer of the coating material; and thermally activating the functional layer of the coating material ( 3 ), wherein the thermal activation of the functional layer of the coating material ( 3 ) is performed by electromagnetic waves, in particular microwaves which are produced by at least one semiconductor wave generator ( 11 a , 11 b , 11 c ).

2 . The method according to claim 1 also having the following steps:
recording at least one process variable (T i , P i , N i ) of the method,
controlling the semiconductor wave generator ( 11 a , 11 b , 11 c ) using this process variable (T i , P i , N i ).

3 . The method according to claim 2 , wherein
the at least one process variable (T i , P i , N i ) comprises at least the temperature of the functional layer of the edge strip at a particular point before, during or after thermal activation with the semiconductor wave generator ( 11 a , 11 b , 11 c ) or the power, amplitude or phasing of incoming or reflected microwaves.

4 . The method according to claim 2 or 3 , wherein
the at least one process variable (T i , P i , N i ) comprises a plurality of temperatures from the functional layer of the edge strip at particular points before, during or after thermal activation with the semiconductor wave generator ( 11 a , 11 b , 11 c ) to thus allow a specific and defined thermal activation of the functional layer of the coating material ( 3 ).

5 . The method for applying coating material ( 3 ) to an area of a workpiece, in particular to a narrow area, comprising the following steps:
thermal activation of a functional layer of the coating material ( 3 ) using a method according to one of claims 1 to 4 ; injection of the coating material ( 3 ) onto the narrow area of the workpiece.

6 . A device ( 10 ) for thermally activating a functional layer of a coating material ( 3 ) having:
at least one semiconductor wave generator ( 11 a , 11 b , 11 c ), wherein the semiconductor wave generator ( 11 a , 11 b , 11 c ) is able to produce electromagnetic waves, preferably microwaves, which are then able to thermally activate the functional layer of the coating material ( 3 ).

7 . The device ( 10 ) according to claim 6 also having:
an applicator ( 12 a , 12 b , 12 c );
a waveguide which is able to forward electromagnetic waves produced in the semiconductor wave generator ( 11 a , 11 b , 11 c ) to the applicator ( 12 a , 12 b , 12 c ), in order to thermally activate the functional layer of the coating material ( 3 ) there.

8 . The device ( 10 ) according to claim 6 or 7 also having:
a device for recording measurements ( 15 ) and a control device ( 16 ),
wherein the device for recording measurements ( 15 ) is designed to record measurements taken during thermal activation of a functional layer of a coating material ( 3 ) and then forward these measurements to the control device ( 16 ), and
the control device ( 16 ) is designed to regulate or control the semiconductor wave generator ( 11 a , 11 b , 11 c ) using the measurements received.

9 . The device ( 10 ) according to one of claims 6 to 8 also having:
an additional semiconductor wave generator ( 11 a , 11 b , 11 c ) and an additional applicator ( 12 a , 12 b , 12 c ),
wherein the first semiconductor wave generator ( 11 a , 11 b , 11 c ) and the additional semiconductor wave generator ( 11 a , 11 b , 11 c ) are designed to produce microwaves that are synchronised by means of PLL synchronisation.

10 . A device for applying coating material ( 3 ) to a narrow area of a workpiece having:
a device ( 10 ) for thermally activating a functional layer of a coating material ( 3 ) according to one of claims 6 to 9 , and an injection device for injecting the coating material onto the narrow area of the workpiece.

Assignees

• Homag Gmbh

Inventors

• Weiss Ruven
• Albrecht Ludwig

Classifications

• B29C63/0026

  an edge face with strip material, e.g. a panel edge (securing a veneer strip to a panel edge B27D5/003) · CPC title

• H05B6/788

  wherein an elongated material is moved by applying a mechanical tension to it · CPC title

• B27D5/003

  securing a veneer strip to a panel edge (fitting a tenonned strip to a grooved panel edge B27M3/0026) · CPC title

• H05B6/686 Primary

  Circuits comprising a signal generator and power amplifier, e.g. using solid state oscillators · CPC title

• B27G11/02

  Glue vessels; Apparatus for warming or heating glue · CPC title