Method for preparing hollow structure

Patent metadata

Field	Value
Publication number	US-2020099040-A1
Application number	US-201816469040-A
Country	US
Kind code	A1
Filing date	Aug 28, 2018
Priority date	Aug 31, 2017
Publication date	Mar 26, 2020
Grant date	—

Abstract

A method for preparing a hollow structure, and more particularly, to a method for preparing a hollow structure having various stable structures by using polystyrene particles, into which a functional group is introduced, as a template for preparing the hollow structure.

First claim

1 . A method of making a hollow structure comprising the steps of:
(S1) preparing polystyrene having one or more functional group by a method comprising reacting a styrene monomer, a monomer for introducing the functional group and an initiator; (S2) adding the polystyrene of step (S1) to a metal solution to form polystyrene into which metal is introduced; (S3) coating the metal-introduced polystyrene with a carbon-based polymer; (S4) performing a first heat treatment on the metal-introduced polystyrene coated with the carbon-based polymer, to remove the polystyrene; and (S5) performing a second heat treatment on the result of step (S4) to carbonize the result of step (S4).

2 . The method of making the hollow structure according to claim 1 , wherein the functional group is at least one selected from the group consisting of a carboxyl group (—COOH), a hydroxyl group (—OH) and an amine group (—NH 2 ).

3 . The method of making the hollow structure according to claim 1 , wherein the monomer for introducing the functional group is at least one selected from the group consisting of acrylic acid, 2-hydroxyethyl acrylate, and allyl amine.

4 . The method of making the hollow structure according to claim 1 , wherein the initiator is at least one selected from the group consisting of 4,4′-azobis(4-cyanovaleric acid), 2,2′-azobis(2-methylpropionamidine) dihydrochloride and potassium persulfate.

5 . The method of making the hollow structure according to claim 1 , wherein in the polymerization of step (S1), 60 to 95% by weight of the styrene monomer; 1 to 30% by weight of the monomer for introducing the functional group; and 1 to 10% by weight of the initiator are reacted.

6 . The method of making the hollow structure according to claim 1 , wherein the metal solution is prepared by dissolving a metal precursor in a solvent wherein the metal precursor has a concentration of 0.05 to 3 M.

7 . The method of making the hollow structure according to claim 6 , wherein the metal precursor is at least one selected from the group consisting of alkoxide containing metal, acetyl acetate containing metal, nitrate containing metal, oxalate containing metal, halide containing metal, and cyanide containing metal.

8 . The method of making the hollow structure according to claim 7 , wherein the metal is at least one selected from the group consisting of Au, Zn, Mg, Ag, Al, Pt, Si and Ca.

9 . The method of making the hollow structure according to claim 6 , wherein the solvent is at least one selected from the group consisting of ethanol, I-propanol, iso-propanol, DI-water, NMP (methylpyrrolidone), DMF (dimethylformamide), DMAc (dimethylacetamide), DMSO (dimethyl sulfoxide) and THF (tetrahydrofuran).

10 . The method of making the hollow structure according to claim 1 , wherein the carbon-based polymer is at least one selected from the group consisting of resorcinol, polyacrylonitrile (PAN), polyaniline (PANI), polypyrrole (PPY), polyimide (PI), polybenzimidazole (PBI), polypyrrolidone (Ppy), polyamide (PA), polyamide-imide (PAI), polyaramide, melamine, melamine formaldehyde and fluorine mica.

11 . The method of making the hollow structure according to claim 1 , wherein a temperature for the first heat treatment is 450 to 600° C.

12 . The method of making the hollow structure according to claim 1 , wherein the first heat treatment is conducted under an inert atmosphere for 30 minutes to 3 hours.

13 . The method of making the hollow structure according to claim 12 , wherein the inert atmosphere comprises an inert gas selected from the group consisting of nitrogen, argon, helium, neon, krypton, xenon and radon.

14 . The method of making the hollow structure according to claim 1 , wherein a temperature for the second heat treatment is 900 to 1200° C.

Assignees

• Lg Chemical Ltd

Inventors

• Jung Jongwook
• Park Se Ho
• Jang Minchul
• Hwang Gyo Hyun
• Park Eunkyung
• Park Changhun

Classifications

• H01M10/052

  Li-accumulators · CPC title

• H01M4/1395

  of electrodes based on metals, Si or alloys · CPC title

• B22F9/24

  starting from liquid metal compounds, e.g. solutions · CPC title

• H01M2004/027

  Negative electrodes · CPC title

• H01M4/02

  Electrodes composed of, or comprising, active material · CPC title