Valve system with position indicator

Patent metadata

Field	Value
Publication number	US-2020088318-A1
Application number	US-201916564496-A
Country	US
Kind code	A1
Filing date	Sep 9, 2019
Priority date	Sep 13, 2018
Publication date	Mar 19, 2020
Grant date	—

Abstract

A valve system having a valve position indicator is disclosed. The valve position indicator allows for viewing of the valve position from one or more viewing locations. In one example, the valve position indicator includes a side valve open/close indicator and a top valve open/close indicator on a valve assembly. An indicator locking mechanism securely locks the valve position indicator in alignment with a position of a control valve.

First claim

What is claimed is:

1 . A valve system comprising:
a valve assembly that operates to open and close a control valve; a valve position indicator including a valve open/close indicator wherein the open/close indicator located on the top of the valve assembly, or the bottom of the valve assembly, or both the top of the control valve and the side of the valve assembly; wherein the valve position indicator is in threaded engagement with a body of the valve assembly and securely locked in alignment with a position of the control valve by a lock ring.

2 . The system of claim 1 , where the lock-ring is part of the valve position indicator.

3 . The system of claim 1 , where the indicator locking mechanism comprises a slotted attachment that cooperates with the valve position indicator.

4 . The system of claim 1 , where the valve open/close indicator includes a first sleeve; and a second sleeve moveable relative to the first sleeve for changing the valve open/close indicator from indicating a closed valve to indicating an open valve.

5 . The valve system comprising a gas cylinder coupled to the valve system.

6 . The valve system of claim 5 , wherein the gas cylinder comprises:
an interior volume; a reagent gas within the internal volume; and an exterior pressure surface.

7 . The valve system of claim 5 , wherein the gas cylinder comprises:
an interior volume; adsorbent within the interior volume, the adsorbent having sorptive affinity for reagent gas, to contain sorptive gas as adsorbed reagent gas on the adsorbent in equilibrium with gaseous sorptive gas at the interior; a gaseous fluid flow port; and an exterior surface.

8 . The valve system of claim 7 , wherein the adsorbent is selected from a material comprising, carbon, activated carbon, zeolite, porous organic polymers, and metal organic framework.

9 . The valve system of claim 7 , wherein the adsorbent is capable of adsorbing gas selected from silane, diborane, arsine, phosphine, chlorine, boron trichloride, boron trifluoride, B2H6, tungsten hexafluoride, trimethyl stibine, hydrogen fluoride, hydrogen chloride, hydrogen iodide, hydrogen bromide, germane, ammonia, stibine, hydrogen sulfide, hydrogen selenide, hydrogen telluride, GeF4, SiF4, NF3, silane, methyl silane, trimethyl silane, hydrogen, methane, nitrogen, carbon monoxide, bromine, iodine, and fluorine organometallic compounds, AsF5, hydrocarbons, organometallic compounds, including all isotopes.

10 . The valve system of claim 5 , wherein the gas cylinder is pressure-regulated cylinder comprising:
an interior volume; at least one reagent gas in the interior volume; one or more pressure regulators; and an exterior surface.

11 . The valve system of claim 10 , wherein the reagent gas is a gas selected from silane, diborane, arsine, phosphine, chlorine, boron trichloride, boron trifluoride, B2H6, tungsten hexafluoride, trimethyl stibine, hydrogen fluoride, hydrogen chloride, hydrogen iodide, hydrogen bromide, germane, ammonia, stibine, hydrogen sulfide, hydrogen selenide, hydrogen telluride, GeF4, SiF4, NF3, silane, methyl silane, trimethyl silane, hydrogen, methane, nitrogen, carbon monoxide, bromine, iodine, and fluorine organometallic compounds, AsF5, hydrocarbons, organometallic compounds, including all isotopes.

12 . The valve system of claim 10 , wherein the gas cylinder comprises two or more reagent gases.

13 . The valve system of claim 12 , wherein the two or more reagent gases comprises at least one dopant source gas, a diluent gas source, and optionally a supplemental gas source.

14 . The valve system of claim 13 , wherein the dopant gas source is selected from eBF3, eGeF4, CO, CO2, GeF4, B2H6, and eB2H6.

15 . The valve system of claim 13 , wherein the diluent gas source is hydrogen.

Assignees

• Entegris Inc
• Luxemboug Patent Company Sa

Inventors

• Scannell Christopher
• Despres Joseph R
• Chir Pascal
• Muzzo Paul

Classifications

• F17C2270/0518

  Semiconductors · CPC title

• F17C2250/0491

  Parameters measured at or inside the vessel · CPC title

• F17C2250/043

  Pressure · CPC title

• F17C2205/0329

  manually actuated · CPC title

• F17C13/04

  Arrangement or mounting of valves (valves per se F16K {; snap-coupling of nipples F16L37/00}) · CPC title