Display device and electronic device including the same

US2020052004A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2020052004-A1
Application numberUS-201916653007-A
CountryUS
Kind codeA1
Filing dateOct 15, 2019
Priority dateDec 4, 2009
Publication dateFeb 13, 2020
Grant date

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

One embodiment of the present invention provides a highly reliably display device in which a high mobility is achieved in an oxide semiconductor. A first oxide component is formed over a base component. Crystal growth proceeds from a surface toward an inside of the first oxide component by a first heat treatment, so that a first oxide crystal component is formed in contact with at least part of the base component. A second oxide component is formed over the first oxide crystal component. Crystal growth is performed by a second heat treatment using the first oxide crystal component as a seed, so that a second oxide crystal component is formed. Thus, a stacked oxide material is formed. A transistor with a high mobility is formed using the stacked oxide material and a driver circuit is formed using the transistor.

First claim

Opening claim text (preview).

1 . (canceled) 2 . A semiconductor device comprising: an insulating film; and a single crystalline oxide semiconductor film processed into a predetermined shape over the insulating film. 3 . The semiconductor device according to claim 2 , wherein the single crystalline oxide semiconductor film is an island-shaped single crystalline oxide semiconductor film. 4 . The semiconductor device according to claim 2 , further comprising a substrate, wherein the insulating film is provided over the substrate. 5 . The semiconductor device according to claim 2 , wherein the single crystalline oxide semiconductor film comprises In, Ga, and Zn. 6 . A semiconductor device comprising: a single crystalline oxide semiconductor film processed into a predetermined shape, wherein the single crystalline oxide semiconductor film comprises In, Ga, and Zn. 7 . The semiconductor device according to claim 6 , wherein the single crystalline oxide semiconductor film is an island-shaped single crystalline oxide semiconductor film. 8 . The semiconductor device according to claim 6 , further comprising an insulating film over a substrate, wherein the single crystalline oxide semiconductor film is provided over the insulating film. 9 . A method for manufacturing a semiconductor device comprising the steps of: forming an insulating film; forming a single crystalline oxide semiconductor film over the insulating film; and processing the single crystalline oxide semiconductor film into a predetermined shape. 10 . The method for manufacturing a semiconductor device according to claim 9 , wherein the single crystalline oxide semiconductor film is processed into an island-shaped single crystalline oxide semiconductor film. 11 . The method for manufacturing a semiconductor device according to claim 9 , wherein the insulating film is formed over a substrate. 12 . The method for manufacturing a semiconductor device according to claim 9 , wherein the single crystalline oxide semiconductor film comprises In, Ga, and Zn. 13 . A method for manufacturing a semiconductor device comprising the steps of: forming a single crystalline oxide semiconductor film comprising In, Ga, and Zn, and processing the single crystalline oxide semiconductor film into a predetermined shape. 14 . The method for manufacturing a semiconductor device according to claim 13 , wherein the single crystalline oxide semiconductor film is processed into an island-shaped single crystalline oxide semiconductor film. 15 . The method for manufacturing a semiconductor device according to claim 9 , further comprising a step of forming an insulating film over a substrate, wherein the single crystalline oxide semiconductor film is formed over the insulating film.

Assignees

Inventors

Classifications

  • using energy recovery or conservation · CPC title

  • Layout of electrodes and connections · CPC title

  • Details of drivers for data electrodes · CPC title

  • suitable for active matrices only · CPC title

  • Details of a shift registers arranged for use in a driving circuit · CPC title

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Frequently asked questions

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What does patent US2020052004A1 cover?
One embodiment of the present invention provides a highly reliably display device in which a high mobility is achieved in an oxide semiconductor. A first oxide component is formed over a base component. Crystal growth proceeds from a surface toward an inside of the first oxide component by a first heat treatment, so that a first oxide crystal component is formed in contact with at least part of…
Who is the assignee on this patent?
Semiconductor Energy Lab
What technology area does this patent fall under?
Primary CPC classification H01L27/1225. Mapped technology areas include Electricity.
When was this patent published?
Publication date Thu Feb 13 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).