Optical Beam Forming Device With Crossbar as Beamformer and Its Method of Use
US-2024388819-A1 · Nov 21, 2024 · US
US2020028017A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2020028017-A1 |
| Application number | US-201916504875-A |
| Country | US |
| Kind code | A1 |
| Filing date | Jul 8, 2019 |
| Priority date | Jul 18, 2018 |
| Publication date | Jan 23, 2020 |
| Grant date | — |
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A light-receiving element includes an on-chip lens; an interconnection layer; and a semiconductor layer that is disposed between the on-chip lens and the interconnection layer. The semiconductor layer includes a first voltage application unit to which a first voltage is applied, a second voltage application unit to which a second voltage different from the first voltage is applied, a first charge detection unit that is disposed at the periphery of the first voltage application unit, a second charge detection unit that is disposed at the periphery of the second voltage application unit, and a charge discharge region that is provided on an outer side of an effective pixel region. For example, the present technology is applicable to a light-receiving element that generates distance information in a ToF method, or the like.
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What is claimed is: 1 . A light-receiving element comprising: an on-chip lens; an interconnection layer; and a semiconductor layer that is disposed between the on-chip lens and the interconnection layer, wherein the semiconductor layer includes a first voltage application unit to which a first voltage is applied, a second voltage application unit to which a second voltage different from the first voltage is applied, a first charge detection unit that is disposed at a periphery of the first voltage application unit, a second charge detection unit that is disposed at the periphery of the second voltage application unit, and a charge discharge region that is provided on an outer side of an effective pixel region. 2 . The light-receiving element according to claim 1 , wherein the interconnection layer includes at least one layer including a reflection member, and the reflection member is provided to overlap the first charge detection unit or the second charge detection unit in a plan view. 3 . The light-receiving element according to claim 1 , wherein the interconnection layer includes at least one layer including a light-shielding member, and the light-shielding member is provided to overlap the first charge detection unit or the second charge detection unit in a plan view. 4 . The light-receiving element according to claim 1 , wherein the charge discharge region includes an opening pixel that is driven. 5 . The light-receiving element according to claim 1 , wherein the charge discharge region includes a light-shielding pixel that is driven. 6 . The light-receiving element according to claim 1 , wherein the charge discharge region includes a high-concentration N-type region to which a zero or positive voltage is applied. 7 . The light-receiving element according to claim 1 , further comprising a P-well region, which is in contact with an insulating film at the periphery of the first and second charge detection units, at a boundary portion of pixels. 8 . The light-receiving element according to claim 7 , wherein the P-well region has an impurity concentration higher than an impurity concentration of a photoelectric conversion region. 9 . The light-receiving element according to claim 1 , further comprising an N-type diffusion layer, to which a zero or positive voltage is applied, in a gap region between a P-well region in which a pixel transistor is formed and an insulating film at the periphery of the first and second charge detection units. 10 . The light-receiving element according to claim 9 , wherein the N-type diffusion layer is disposed to be shared by a pixel column inside an effective pixel region. 11 . The light-receiving element according to claim 9 , wherein the N-type diffusion layer is disposed in a pixel outside the effective pixel region. 12 . The light-receiving element according to claim 9 , wherein the N-type diffusion layer is disposed in each pixel inside the effective pixel region. 13 . The light-receiving element according to claim 1 , wherein the first and second voltage application units are constituted by first and second P-type semiconductor regions each formed in the semiconductor layer. 14 . The light-receiving element according to claim 1 , wherein the first and second voltage application units are constituted by first and second transfer transistors each formed in the semiconductor layer. 15 . A distance measurement module comprising: a light-receiving element including an on-chip lens, an interconnection layer, and a semiconductor layer that is disposed between the on-chip lens and the interconnection layer, the semiconductor layer including a first voltage application unit to which a first voltage is applied, a second voltage application unit to which a second voltage different from the first voltage is applied, a first charge detection unit that is disposed at the periphery of the first voltage application unit, a second charge detection unit that is disposed at the periphery of the second voltage application unit, and a charge discharge region that is provided on an outer side of an effective pixel region; a light source that emits irradiation light of which brightness periodically fluctuates; and a light-emission control unit that controls an irradiation timing of the irradiation light.
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