Gas sensor and method of manufacturing the same

US2020003717A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2020003717-A1
Application numberUS-201916353275-A
CountryUS
Kind codeA1
Filing dateMar 14, 2019
Priority dateJun 28, 2018
Publication dateJan 2, 2020
Grant date

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  1. Title

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  2. Abstract

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Abstract

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A gas sensor includes a substrate, a thin film metallic glass, an ultrananocrystalline diamond layer and a sensor structure. The thin film metallic glass is formed on the substrate. The ultrananocrystalline diamond layer partially covers the thin film metallic glass. The sensor structure includes a seed layer formed on the ultrananocrystalline diamond layer and a plurality of nanostructures formed on the seed layer.

First claim

Opening claim text (preview).

What is claimed is: 1 . A gas sensor, comprising: a substrate; a thin film metallic glass formed on the substrate; an ultrananocrystalline diamond layer partially covering the thin film metallic glass; and a sensor structure, comprising a seed layer formed on the ultrananocrystalline diamond layer and a plurality of nanostructures formed on the seed layer. 2 . The gas sensor of claim 1 , wherein a coverage of the ultrananocrystalline diamond layer on the thin film metallic glass is 50% to 90%. 3 . The gas sensor of claim 1 , wherein the thin film metallic glass comprises a copper-based thin film metallic glass or a silver-based thin film metallic glass. 4 . The gas sensor of claim 1 , wherein each nanostructure is configured as a zinc oxide nanotube or a zinc oxide nanorod. 5 . The gas sensor of claim 1 , further comprising an electrode layer formed on the sensor structure. 6 . The gas sensor of claim 1 , wherein the gas sensor is capable of sensing a gas at ambient temperature. 7 . The gas sensor of claim 6 , which is a hydrogen gas sensor, an ammonia sensor, or an acetone sensor. 8 . The gas sensor of claim 6 , wherein when the gas is hydrogen gas, a detectable concentration range of hydrogen gas of the gas sensor is from 10 ppm to 500 ppm, and a sensitivity of the gas sensor is above 34%. 9 . The gas sensor of claim 8 , wherein when the concentration of the hydrogen gas is 100 ppm, a decay in sensitivity of the gas sensor is less than 1% for 60 days. 10 . A method of manufacturing a gas sensor, comprising: providing a substrate; forming a thin film metallic glass on the substrate; depositing an ultrananocrystalline diamond layer on the thin film metallic glass, wherein the ultrananocrystalline diamond layer partially covers the thin film metallic glass; and forming a sensor structure on the ultrananocrystalline diamond layer. 11 . The method of claim 10 , further comprising: forming an electrode layer on the sensor structure. 12 . The method of claim 10 , wherein a coverage of the ultrananocrystalline diamond layer on the thin film metallic glass is adjustable by controlling a deposition time of the ultrananocrystalline diamond layer.

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What does patent US2020003717A1 cover?
A gas sensor includes a substrate, a thin film metallic glass, an ultrananocrystalline diamond layer and a sensor structure. The thin film metallic glass is formed on the substrate. The ultrananocrystalline diamond layer partially covers the thin film metallic glass. The sensor structure includes a seed layer formed on the ultrananocrystalline diamond layer and a plurality of nanostructures for…
Who is the assignee on this patent?
Univ Nat Taiwan Science & Technology
What technology area does this patent fall under?
Primary CPC classification G01N27/127. Mapped technology areas include Physics.
When was this patent published?
Publication date Thu Jan 02 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).