Method for producing transparent optical film and method for producing transparent multilayer film

Patent metadata

Field	Value
Publication number	US-2020002804-A1
Application number	US-201916568905-A
Country	US
Kind code	A1
Filing date	Sep 12, 2019
Priority date	Mar 17, 2017
Publication date	Jan 2, 2020
Grant date	—

Abstract

This method for producing a transparent optical film includes a film formation step of forming a silver layer and a high standard electrode potential metal layer so as to be laminated on a substrate, the film formation step including a silver deposition step of forming the silver layer, at a thickness of 6 nm or less by vacuum deposition, and a high standard electrode potential metal deposition step of forming the high standard electrode potential metal layer formed of a high standard electrode potential metal having a higher standard electrode potential than that of silver by vacuum deposition, and an alloying step of forming a silver alloy layer by diffusing the high standard electrode potential metal within the silver layer by performing a heating treatment at a temperature of 50° C. or higher and 400° C. or lower.

First claim

What is claimed is:

1 . A method for producing a transparent optical film including a silver alloy layer, the method comprising:
a film formation step of forming a silver layer and a high standard electrode potential metal layer so as to be laminated on a substrate, the film formation step including a silver deposition step of forming the silver layer, at a thickness of 6 nm or less, by vacuum deposition, and a high standard electrode potential metal deposition step of forming the high standard electrode potential metal layer, which is a layer formed of a high standard electrode potential metal that is a metal having a higher standard electrode potential than that of silver, by vacuum deposition; and an alloying step of forming the silver alloy layer by diffusing the high standard electrode potential metal within the silver layer by performing a heating treatment at a temperature of 50° C. or higher and 400° C. or lower, wherein: the film formation step includes an anchor metal deposition step of forming an anchor metal layer, formed of an anchor metal having a lower surface energy than silver at a side closer to the substrate than the silver layer, by vacuum deposition, and the anchor metal deposition step, the high standard electrode potential metal deposition step, and the silver deposition step are performed in this order.

2 . A method for producing a transparent optical film including a silver alloy layer, the method comprising:
a film formation step of forming a silver layer and a high standard electrode potential metal layer so as to be laminated on a substrate, the film formation step including a silver deposition step of forming the silver layer, at a thickness of 6 nm or less, by vacuum deposition, and a high standard electrode potential metal deposition step of forming the high standard electrode potential metal layer, which is a layer formed of a high standard electrode potential metal that is a metal having a higher standard electrode potential than that of silver, by vacuum deposition; and an alloying step of forming the silver alloy layer by diffusing the high standard electrode potential metal within the silver layer by performing a heating treatment at a temperature of 50° C. or higher and 400° C. or lower, wherein: the film formation step includes an anchor metal deposition step of forming an anchor metal layer, formed of an anchor metal having a lower surface energy than silver at a side closer to the substrate than the silver layer, by vacuum deposition, and the high standard electrode potential metal deposition step, the anchor metal deposition step, and the silver deposition step are performed in this order.

3 . The method for producing a transparent optical film according to claim 1 ,
wherein an oxidation step of oxidizing at least a part of the anchor metal is performed simultaneously with forming the silver alloy layer by performing the alloying step under an oxygen-containing atmosphere after the anchor metal layer, the silver layer, and the high standard electrode potential metal layer are formed and laminated through the anchor metal deposition step, the silver deposition step, and the high standard electrode potential metal deposition step.

4 . The method for producing a transparent optical film according to claim 2 ,
wherein an oxidation step of oxidizing at least a part of the anchor metal is performed simultaneously with forming the silver alloy layer by performing the alloying step under an oxygen-containing atmosphere after the anchor metal layer, the silver layer, and the high standard electrode potential metal layer are formed and laminated through the anchor metal deposition step, the silver deposition step, and the high standard electrode potential metal deposition step.

5 . A method for producing a transparent optical film including a silver alloy layer, the method comprising:
a film formation step of forming a silver layer and a high standard electrode potential metal layer so as to be laminated on a substrate, the film formation step including a silver deposition step of forming the silver layer, at a thickness of 6 nm or less, by vacuum deposition, and a high standard electrode potential metal deposition step of forming the high standard electrode potential metal layer, which is a layer formed of a high standard electrode potential metal that is a metal having a higher standard electrode potential than that of silver, by vacuum deposition; and an alloying step of forming the silver alloy layer by diffusing the high standard electrode potential metal within the silver layer by performing a heating treatment at a temperature of 50° C. or higher and 400° C. or lower, wherein: the film formation step includes an anchor metal deposition step of forming an anchor metal layer, formed of an anchor metal having a lower surface energy than silver at a side closer to the substrate than the silver layer, by vacuum deposition, and an oxidation step of oxidizing at least a part of the anchor metal by performing a heating treatment under an oxygen-containing atmosphere is performed after the anchor metal layer and the silver layer are laminated on the substrate in this order by performing the anchor metal deposition step and the silver deposition step in this order, and after the oxidation step, the high standard electrode potential metal deposition step is performed.

6 . The method for producing a transparent optical film according to claim 5 ,
wherein the alloying step is performed simultaneously with the high standard electrode potential metal deposition step.

7 . The method for producing a transparent optical film according to claim 1 ,
wherein an amount of the high standard electrode potential metal to be deposited in the high standard electrode potential metal deposition step is 10% by atom or less with respect to an amount of silver constituting the silver layer.

8 . The method for producing a transparent optical film according to claim 2 ,
wherein an amount of the high standard electrode potential metal to be deposited in the high standard electrode potential metal deposition step is 10% by atom or less with respect to an amount of silver constituting the silver layer.

9 . The method for producing a transparent optical film according to claim 5 ,
wherein an amount of the high standard electrode potential metal to be deposited in the high standard electrode potential metal deposition step is 10% by atom or less with respect to an amount of silver constituting the silver layer.

10 . The method for producing a transparent optical film according to claim 1 ,
wherein germanium is used as the anchor metal.

11 . The method for producing a transparent optical film according to claim 2 ,
wherein germanium is used as the anchor metal.

12 . The method for producing a transparent optical film according to claim 5 ,
wherein germanium is used as the anchor metal.

13 . The method for producing a transparent optical film according to claim 1 ,
wherein gold, palladium or platinum is used as the high standard electrode potential metal.

14 . The method for producing a transparent optical film according to claim 2 ,
wherein gold, palladium or platinum is used as the high standard electrode potential metal.

15 . The method for producing a transparent optical film according to claim 5 ,
wherein gold, palladium or platinum is used as the high standard electrode potential metal.

16 . The method for producing a transparent optical film according to claim 1 ,
wherein gold is used as the high standard electrode potential me

Assignees

• Fujifilm Corp

Inventors

• Nakamura Seigo
• Umeda Kenichi
• Itai Yuichiro
• Sonoda Shinichiro

Classifications

• C23C8/10

  Oxidising · CPC title

• C23C14/24 Primary

  Vacuum evaporation · CPC title

• C23C8/02

  Pretreatment of the material to be coated (C23C8/04 takes precedence) · CPC title

• C23C10/60

  After-treatment · CPC title

• C23C10/28

  using solids, e.g. powders, pastes · CPC title