Substrate processing apparatus, substrate processing system, and maintenance method
US-2024339306-A1 · Oct 10, 2024 · US
US2020002104A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2020002104-A1 |
| Application number | US-201916426983-A |
| Country | US |
| Kind code | A1 |
| Filing date | May 30, 2019 |
| Priority date | May 31, 2018 |
| Publication date | Jan 2, 2020 |
| Grant date | — |
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A substrate processing apparatus includes a frame and a transport apparatus connected to the frame. The transport apparatus has an upper arm link, a forearm link rotatably coupled to the upper arm link about an elbow axis, at least a third arm link rotatably coupled to the forearm about a wrist axis, and an end effector rotatably coupled to the third arm link about a knuckle axis. A two degree of freedom drive system is operably connected to at least one of the upper arm link, the forearm link, and the third arm link for effecting extension and retraction of the end effector wherein a height of the end effector is within the stack height profile of the wrist axis so that a total stack height of the end effector and wrist axis is sized to conform within a pass through of a slot valve.
Opening claim text (preview).
What is claimed is: 1 . A substrate processing apparatus comprises: a frame; a transport apparatus connected to the frame, the transport apparatus having an upper arm link, a forearm link rotatably coupled to the upper arm link about an elbow axis, at least a third arm link rotatably coupled to the forearm link about a wrist axis, and an end effector rotatably coupled to the third arm link about a knuckle axis; and at least a two degree of freedom drive system operably connected to at least one of the upper arm link, the forearm link, and the third arm link for effecting extension and retraction of the end effector wherein a height of the end effector is within a stack height profile of the wrist axis so that a total stack height of the end effector and wrist axis is sized to conform within a pass through of a slot valve. 2 . The substrate processing apparatus of claim 1 , wherein a length of the third arm link is less than a length of the upper arm link, and the length of the upper arm link is less than a length of the forearm link. 3 . The substrate processing apparatus of claim 1 , wherein rotation of the end effector is slaved to rotation of the forearm link and rotation of the third arm link is slaved to rotation of the upper arm link. 4 . The substrate processing apparatus of claim 1 , wherein: the upper arm link is rotatably coupled to the two degree of freedom drive system at a shoulder axis; the end effector is a double-ended end effector; and the transport apparatus is configured to bi-directionally extend on opposite sides of the shoulder axis without rotation of the transport apparatus as a unit about the shoulder axis. 5 . The substrate processing apparatus of claim 1 , wherein the third arm link comprises a slot configured to receive at least a portion of the end effector so that the end effector is rotatably coupled to the third arm link within the slot. 6 . The substrate processing apparatus of claim 1 , wherein the end effector is disposed above or below the third arm link. 7 . The substrate processing apparatus of claim 1 , wherein: the forearm link is a tapered configuration; and the upper arm link has a mating tapered configuration that is configured to compliment the tapered configuration of the forearm link so that at least a portion of the upper arm link and a portion of the forearm link are coplanar. 8 . The substrate processing apparatus of claim 1 , wherein the third arm link is slaved to the upper arm link through dual sets of forearm pulleys disposed within the forearm link. 9 . The substrate processing apparatus of claim 1 , wherein an axis of extension and retraction of the transport apparatus passes over a center of a shoulder axis of rotation of the transport apparatus. 10 . The substrate processing apparatus of claim 1 , wherein the transport apparatus is configured to bi-directionally extend on opposite sides of a shoulder axis of the transport apparatus, where radial extension of the transport arm is substantially symmetric on the opposite sides of the shoulder axis. 11 . The substrate processing apparatus of claim 1 , wherein the end effector remains aligned with an axis of extension and retraction throughout a range of extension and retraction of the transport apparatus. 12 . The substrate processing apparatus of claim 1 , wherein the third arm link is substantially aligned with the forearm link with the transport apparatus in a home pose. 13 . The substrate processing apparatus of claim 1 , wherein the third arm link is driven by a band transmission having a single band height. 14 . A substrate processing apparatus comprising: a frame; a transport apparatus connected to the frame, the transport apparatus having an upper arm link, a forearm link rotatably coupled to the upper arm link about an elbow axis, at least a third arm link rotatably coupled to the forearm link about a wrist axis, and an end effector rotatably coupled to the third arm link about a knuckle axis; and a drive system operably connected to at least one of the upper arm link, the forearm link, and the third arm link for effecting extension and retraction of the end effector wherein the transport apparatus has a reach that is a maximum reach of the transport apparatus for a predetermined swing diameter of the transport apparatus with the upper arm link, forearm link, third arm link, and end effector in a retracted configuration, which maximum reach extends the end effector, its knuckle axis, and at least part of the third arm link including the wrist axis through a slot valve of the substrate processing apparatus. 15 . The substrate processing apparatus of claim 14 , wherein the drive system is a two degree of freedom drive system. 16 . The substrate processing apparatus of claim 15 , wherein rotation of the end effector is slaved to rotation of the forearm link and rotation of the third arm link is slaved to rotation of the upper arm link. 17 . The substrate processing apparatus of claim 14 , wherein the drive system is a three degree of freedom drive system. 18 . The substrate processing apparatus of claim 14 , wherein the drive system is a four degree of freedom drive system. 19 . The substrate processing apparatus of claim 14 , wherein a length of the third arm link is less than a length of the upper arm link, and the length of the upper arm link is less than a length of the forearm link. 20 . The substrate processing apparatus of claim 14 , wherein: the upper arm link is rotatably coupled to the drive system at a shoulder axis; the end effector is a double-ended end effector; and the transport apparatus is configured to bi-directionally extend on opposite sides of the shoulder axis without rotation of the transport apparatus as a unit about the shoulder axis. 21 . The substrate processing apparatus of claim 14 , wherein the third arm link comprises a slot configured to receive at least a portion of the end effector so that the end effector is rotatably coupled to the third arm link within the slot. 22 . The substrate processing apparatus of claim 14 , wherein the end effector is disposed above or below the third arm link. 23 . The substrate processing apparatus of claim 14 , wherein: the forearm link is a tapered configuration; and the upper arm link has a mating tapered configuration that is configured to compliment the tapered configuration of the forearm link so that at least a portion of the upper arm link and a portion of the forearm link are coplanar. 24 . A method for transporting substrates comprising: providing a transport apparatus connected to a frame, the transport apparatus having an upper arm link, a forearm link rotatably coupled to the upper arm link about an elbow axis, at least a third arm link rotatably coupled to the forearm link about a wrist axis, and an end effector rotatably coupled to the third arm link about a knuckle axis; and effecting extension or retraction of the upper arm link, the forearm link, the third arm link, and the end effector with a two degree of freedom drive system so that the wrist axis extends through a pass through of a slot valve of a substrate processing apparatus; wherein a height of the end effector is within a stack height profile of the wrist axis so that a total stack height of the end effector and wrist axis is sized to conform within the pass through of the slot valve. 25 . The method of
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