What technology area does this patent fall under?

Primary CPC classification H01J37/3211. Mapped technology areas include Electricity.

When was this patent published?

Publication date Thu Dec 19 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.

What related patents are in patentsdb?

We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).

Icp antenna and substrate processing device including the same

US2019385814A1 · US · A1

Patent metadata
Field	Value
Publication number	US-2019385814-A1
Application number	US-201716480355-A
Country	US
Kind code	A1
Filing date	Dec 5, 2017
Priority date	Feb 10, 2017
Publication date	Dec 19, 2019
Grant date	—

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

Title
What the patent document calls the invention.
Abstract
A short plain-language summary of the technical disclosure.
Assignees and inventors
Who owns or filed the patent and who is credited as inventor.
Key dates
Filing, priority, publication, and grant dates set the timeline.
First independent claim
The legal scope of protection — read this for what is actually claimed.
CPC / IPC classifications
Technology tags used to group this patent with similar filings.
Citations and related patents
Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

Provided is an ICP antenna used in a plasma processing device. The ICP antenna includes an antenna coil having one end connected to an RF power source through an impedance matching circuit and the other end that is grounded; and a variable capacitor connected in parallel to a portion of the antenna coil.

First claim

Opening claim text (preview).

1 - 6 . (canceled) 7 . A method for processing substrate using plasma generated by ICP antenna, the ICP antenna comprising a first impedance having a first antenna coil and a second impedance having a second antenna coil and a variable capacitor connected in parallel to the second antenna coil to be a LC circuit, the first impedance and the second impedance are connected in series to each other so that the ICP antenna having one end connected to an RF power source through an impedance matching circuit and the other end that is grounded, the method comprising: adjusting capacitance of the variable capacitor so that the LC circuit approaches a LC resonance condition; increasing impedance of the second impedance and a total impedance of the ICP antenna; and decreasing a total current of the ICP antenna and a density of a first plasma generated by the first antenna coil. 8 . The method of claim 7 , wherein a density of a second plasma generated by the second antenna coil is maintained. 9 . The method of claim 7 , the method further comprising adjusting resistance of a variable resistor connected in parallel to the variable capacitor. 10 . The method of claim 7 , the first antenna coil and the second antenna coil is a cylindrical antenna coil 11 . The method of claim 7 , the first antenna coil and the second antenna coil is a pancake type antenna coil.

Assignees

Eugene Technology Co Ltd

Inventors

Choi Yoon-Seok

Classifications

H01J37/3211Primary
Antennas, e.g. particular shapes of coils · CPC title
H01J37/32183
Matching circuits · CPC title
H03H7/38
Impedance-matching networks · CPC title
H01J37/32
Gas-filled discharge tubes (heating by discharge H05B) · CPC title

Patent family

Related publications grouped by family.

View patent family 63106845

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US2019385814A1 cover?: Provided is an ICP antenna used in a plasma processing device. The ICP antenna includes an antenna coil having one end connected to an RF power source through an impedance matching circuit and the other end that is grounded; and a variable capacitor connected in parallel to a portion of the antenna coil.
Who is the assignee on this patent?: Eugene Technology Co Ltd
What technology area does this patent fall under?: Primary CPC classification H01J37/3211. Mapped technology areas include Electricity.
When was this patent published?: Publication date Thu Dec 19 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?: We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).