Photoexcitable material, photochemical electrode, and method for manufacturing photoexcitable material

US2019296165A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2019296165-A1
Application numberUS-201916437063-A
CountryUS
Kind codeA1
Filing dateJun 11, 2019
Priority dateMay 31, 2016
Publication dateSep 26, 2019
Grant date

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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Abstract

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A photoexcitable material includes: a solid solution of MN (where M is at least one of gallium, aluminum and indium) and ZnO, wherein the photoexcitable material includes 30 to 70 mol % ZnO and has a band gap energy of 2.20 eV or less.

First claim

Opening claim text (preview).

What is claimed is: 1 . A method for manufacturing a photoexcitable material, comprising: preparing an aerosol in which particles of a solid solution of MN (where M is at least one of gallium, aluminum and indium) and ZnO are dispersed in a gas; and forming a photoexcitable material layer including the particles on a substrate or a conductive layer by ejecting the aerosol from a nozzle onto the substrate or the conductive layer in such a manner the particles collide against a surface of the substrate or the conductive layer. 2 . The method according to claim 1 , wherein the photoexcitable material contains 30 to 70 mol % ZnO and has a band gap energy of 2.20 eV or less. 3 . The method according to claim 1 , further comprising annealing the photoexcitable material layer. 4 . The method according to claim 3 , wherein the annealing comprises annealing the photoexcitable material layer at 600° C. to 850° C. 5 . The method according to claim 3 , wherein the annealing comprises annealing the photoexcitable material layer in an ammonia atmosphere.

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Classifications

  • comprising a chamber adapted to a particular process · CPC title

  • Electrolytic production of inorganic compounds or non-metals · CPC title

  • Electricity · mapped topic

  • Chemistry & Metallurgy · mapped topic

  • Chemistry & Metallurgy · mapped topic

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What does patent US2019296165A1 cover?
A photoexcitable material includes: a solid solution of MN (where M is at least one of gallium, aluminum and indium) and ZnO, wherein the photoexcitable material includes 30 to 70 mol % ZnO and has a band gap energy of 2.20 eV or less.
Who is the assignee on this patent?
Fujitsu Ltd
What technology area does this patent fall under?
Primary CPC classification H01L31/022483. Mapped technology areas include Electricity.
When was this patent published?
Publication date Thu Sep 26 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).